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Results: 1-25 | 26-27
Results: 1-25/27
HIGH REACTIVITY OF CH2 RADICAL IN AN AR-CH4 POSTDISCHARGE
Authors: JAUBERTEAU JL THOMAS L AUBRETON J JAUBERTEAU I CATHERINOT A
Citation: Jl. Jauberteau et al., HIGH REACTIVITY OF CH2 RADICAL IN AN AR-CH4 POSTDISCHARGE, Plasma chemistry and plasma processing, 18(1), 1998, pp. 137-151
NITROGEN ION-BEAM-ASSISTED PULSED-LASER DEPOSITION OF BORON-NITRIDE FILMS
Authors: ANGLERAUD B CAHOREAU M JAUBERTEAU I AUBRETON J CATHERINOT A
Citation: B. Angleraud et al., NITROGEN ION-BEAM-ASSISTED PULSED-LASER DEPOSITION OF BORON-NITRIDE FILMS, Journal of applied physics, 83(6), 1998, pp. 3398-3403
MONTE-CARLO SIMULATION OF THE LASER-INDUCED PLASMA PLUME EXPANSION UNDER VACUUM - COMPARISON WITH EXPERIMENTS
Authors: GARRELIE F AUBRETON J CATHERINOT A
Citation: F. Garrelie et al., MONTE-CARLO SIMULATION OF THE LASER-INDUCED PLASMA PLUME EXPANSION UNDER VACUUM - COMPARISON WITH EXPERIMENTS, Journal of applied physics, 83(10), 1998, pp. 5075-5082
THIN-FILMS OF HIGH-T-C SUPERCONDUCTING CUPRATES BY MULTITARGET LASER-ABLATION
Authors: PESSAUD S LICHERON M GERVAIS F CHAMPEAUX C MARCHET P CATHERINOT A
Citation: S. Pessaud et al., THIN-FILMS OF HIGH-T-C SUPERCONDUCTING CUPRATES BY MULTITARGET LASER-ABLATION, Physica. C, Superconductivity, 282, 1997, pp. 1035-1036
CHARACTERIZATION OF AN ARGON-HYDROGEN MICROWAVE-DISCHARGE USED AS AN ATOMIC-HYDROGEN SOURCE - EFFECT OF HYDROGEN DILUTION ON THE ATOMIC-HYDROGEN PRODUCTION
Authors: THOMAS L JAUBERTEAU JL JAUBERTEAU I AUBRETON J CATHERINOT A
Citation: L. Thomas et al., CHARACTERIZATION OF AN ARGON-HYDROGEN MICROWAVE-DISCHARGE USED AS AN ATOMIC-HYDROGEN SOURCE - EFFECT OF HYDROGEN DILUTION ON THE ATOMIC-HYDROGEN PRODUCTION, Plasma chemistry and plasma processing, 17(2), 1997, pp. 193-206
ANALYSIS OF THE EXPANSION OF A PLASMA PLUME FORMED DURING INTERACTIONOF AN ULTRAVIOLET-LASER AND A BORON-NITRIDE TARGET - APPLICATION TO PRODUCTION OF THIN-FILMS
Authors: ANGLERAUD B AUBRETON J CATHERINOT A
Citation: B. Angleraud et al., ANALYSIS OF THE EXPANSION OF A PLASMA PLUME FORMED DURING INTERACTIONOF AN ULTRAVIOLET-LASER AND A BORON-NITRIDE TARGET - APPLICATION TO PRODUCTION OF THIN-FILMS, Annales de physique, 22, 1997, pp. 121-122
LASER-ABLATION AT THE BOTTOM OF A CRATER
Authors: GARRELIE F GIRAULT C ANGLERAUD B CHAMPEAUX C CATHERINOT A
Citation: F. Garrelie et al., LASER-ABLATION AT THE BOTTOM OF A CRATER, Annales de physique, 22, 1997, pp. 123-124
STUDY ON THE ABLATION OF A COPPER TARGET BY AN KRF EXCIMER-LASER
Authors: GARRELIE F GIRAULT C CHAMPEAUX C CATHERINOT A
Citation: F. Garrelie et al., STUDY ON THE ABLATION OF A COPPER TARGET BY AN KRF EXCIMER-LASER, Annales de physique, 22, 1997, pp. 125-126
STUDY OF THE EXPANSION OF THE LASER-ABLATION PLUME ABOVE A BORON-NITRIDE TARGET
Authors: ANGLERAUD B GIRAULT C CHAMPEAUX C GARRELIE F GERMAIN C CATHERINOT A
Citation: B. Angleraud et al., STUDY OF THE EXPANSION OF THE LASER-ABLATION PLUME ABOVE A BORON-NITRIDE TARGET, Applied surface science, 96-8, 1996, pp. 117-121
EPITAXIAL FERROELECTRIC PZT AND BST THIN-FILMS BY PULSED UV LASER DEPOSITION
Authors: CHAMPEAUX C MARCHET P CATHERINOT A
Citation: C. Champeaux et al., EPITAXIAL FERROELECTRIC PZT AND BST THIN-FILMS BY PULSED UV LASER DEPOSITION, Applied surface science, 96-8, 1996, pp. 775-778
PREPARATION OF TIO2 THIN-FILMS BY PULSED-LASER DEPOSITION FOR WAVE-GUIDING APPLICATIONS
Authors: GARAPON C CHAMPEAUX C MUGNIER J PANCZER G MARCHET P CATHERINOT A JACQUIER B
Citation: C. Garapon et al., PREPARATION OF TIO2 THIN-FILMS BY PULSED-LASER DEPOSITION FOR WAVE-GUIDING APPLICATIONS, Applied surface science, 96-8, 1996, pp. 836-841
INITIAL-STAGES IN THE GROWTH OF CARBON-FILMS PRODUCED IN AN AR-CH4-H-2 MICROWAVE-DISCHARGE - COMPOSITION AND SURFACE-LAYERS MORPHOLOGY
Authors: THOMAS L JAUBERTEAU I JAUBERTEAU JL CINELLI MJ AUBRETON J CATHERINOT A
Citation: L. Thomas et al., INITIAL-STAGES IN THE GROWTH OF CARBON-FILMS PRODUCED IN AN AR-CH4-H-2 MICROWAVE-DISCHARGE - COMPOSITION AND SURFACE-LAYERS MORPHOLOGY, Applied physics letters, 68(12), 1996, pp. 1634-1636
PHOTOABLATION OF A GRAPHITE TARGET BY A KRF LASER-BEAM - REALIZATION OF HARD CARBON THIN-FILMS
Authors: GERMAIN C GIRAULT C AUBRETON J CATHERINOT A BEC S TONCK A
Citation: C. Germain et al., PHOTOABLATION OF A GRAPHITE TARGET BY A KRF LASER-BEAM - REALIZATION OF HARD CARBON THIN-FILMS, DIAMOND AND RELATED MATERIALS, 4(4), 1995, pp. 309-313
UNEXPECTED BEHAVIOR OF IR REFLECTIVITY OF A YBA2CU3O7-DELTA ORIENTED FILM
Authors: LOBO RPSM GERVAIS F CHAMPEAUX C MARCHET P CATHERINOT A
Citation: Rpsm. Lobo et al., UNEXPECTED BEHAVIOR OF IR REFLECTIVITY OF A YBA2CU3O7-DELTA ORIENTED FILM, Materials science & engineering. B, Solid-state materials for advanced technology, 34(1), 1995, pp. 74-79
STUDY OF AN AR-CH4-H2 MICROWAVE POSTDISCHARGE UNDER DIAMOND DEPOSITION CONDITIONS - CORRELATIONS BETWEEN ANALYSIS PERFORMED IN THE GAS-PHASE AND IN CARBON THIN-FILMS
Authors: THOMAS L CINELLI MJ JAUBERTEAU JL AUBRETON J CATHERINOT A
Citation: L. Thomas et al., STUDY OF AN AR-CH4-H2 MICROWAVE POSTDISCHARGE UNDER DIAMOND DEPOSITION CONDITIONS - CORRELATIONS BETWEEN ANALYSIS PERFORMED IN THE GAS-PHASE AND IN CARBON THIN-FILMS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 560-563
KRF LASER PHOTOABLATION OF A GRAPHITE TARGET - APPLICATION TO THE DEVELOPMENT OF THIN-FILMS
Authors: GERMAIN C GIRAULT C GISBERT R AUBRETON J CATHERINOT A
Citation: C. Germain et al., KRF LASER PHOTOABLATION OF A GRAPHITE TARGET - APPLICATION TO THE DEVELOPMENT OF THIN-FILMS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 598-601
ANALYSIS OF INFRARED-VISIBLE-NEAR-ULTRAVIOLET REFLECTIVITY OF CONDUCTING AND SUPERCONDUCTING OXIDES
Authors: LOBO RPSM ALLANCON C GOTOR FJ BASSAT JM LOUP JP ODIER P DEMBINSKI K GERVAIS F CHAMPEAUX C MARCHET P CATHERINOT A
Citation: Rpsm. Lobo et al., ANALYSIS OF INFRARED-VISIBLE-NEAR-ULTRAVIOLET REFLECTIVITY OF CONDUCTING AND SUPERCONDUCTING OXIDES, Physica. C, Superconductivity, 235, 1994, pp. 1071-1072
LAYERED BA-K-PB-BI-O SUPERCONDUCTOR FAMILY - CHARACTERIZATION OF LASER-ABLATED FILMS
Authors: LICHERON M REYNAUD I LOBO RPSM GERVAIS F CHAMPEAUX C MARCHET P CATHERINOT A
Citation: M. Licheron et al., LAYERED BA-K-PB-BI-O SUPERCONDUCTOR FAMILY - CHARACTERIZATION OF LASER-ABLATED FILMS, Physica. C, Superconductivity, 235, 1994, pp. 709-710
CHARACTERIZATION OF A MICROWAVE PLASMA-JET CONTAINING AR-CH4 GAS-MIXTURE
Authors: THOMAS L JAUBERTEAU JL AUBRETON J CATHERINOT A DESOUZA AR CINELLI MJ
Citation: L. Thomas et al., CHARACTERIZATION OF A MICROWAVE PLASMA-JET CONTAINING AR-CH4 GAS-MIXTURE, Applied physics letters, 64(20), 1994, pp. 2643-2645
IMAGING OF THE UV LASER-PRODUCED PHOTOABL ATION PLUME OF DIFFERENT TARGET MATERIALS
Authors: ANGLERAUD B GERMAIN C GIRAULT C CHAMPEAUX C AUBRETON J CATHERINOT A
Citation: B. Angleraud et al., IMAGING OF THE UV LASER-PRODUCED PHOTOABL ATION PLUME OF DIFFERENT TARGET MATERIALS, Annales de physique, 19(5), 1994, pp. 37-38
ABLATION OF A GRAPHITE TARGET BY A UV LAS ER - APPLICATION TO FORMATION OF HARD CARBON LAYERS
Authors: GERMAIN C GIRAULT C AUBRETON J CATHERINOT A BEC S TONCK A
Citation: C. Germain et al., ABLATION OF A GRAPHITE TARGET BY A UV LAS ER - APPLICATION TO FORMATION OF HARD CARBON LAYERS, Annales de physique, 19(5), 1994, pp. 183-184
PHOTOABLATION DEPOSITION OF THIN-FILMS
Authors: CATHERINOT A ANGLERAUD B AUBRETON J CHAMPEAUX C GERMAIN C GIRAULT C
Citation: A. Catherinot et al., PHOTOABLATION DEPOSITION OF THIN-FILMS, Annales de physique, 19(5), 1994, pp. 237-244
HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS - CORRELATION BETWEEN PROPERTIES AND DEPOSITION PARAMETERS
Authors: MARCHET P CHAMPEAUX C MERCURIO JP CATHERINOT A
Citation: P. Marchet et al., HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS - CORRELATION BETWEEN PROPERTIES AND DEPOSITION PARAMETERS, Journal de physique. III, 3(4), 1993, pp. 767-774
PULSED-LASER DEPOSITION OF YBA2CU3O7-X SUPERCONDUCTING THIN-FILMS - CORRELATION BETWEEN PREPARATION CONDITIONS AND STRUCTURAL AND ELECTRICAL-PROPERTIES
Authors: MARCHET P CHAMPEAUX C MERCURIO JP FRIT B CATHERINOT A
Citation: P. Marchet et al., PULSED-LASER DEPOSITION OF YBA2CU3O7-X SUPERCONDUCTING THIN-FILMS - CORRELATION BETWEEN PREPARATION CONDITIONS AND STRUCTURAL AND ELECTRICAL-PROPERTIES, Journal of alloys and compounds, 195(1-2), 1993, pp. 207-210
MASS-SPECTROMETRIC INVESTIGATION OF THE KRF LASER-INDUCED PLASMA PLUME CREATED ABOVE AN YBACUO SUPERCONDUCTING TARGET - CORRELATION WITH THICKNESS DISTRIBUTION OF DEPOSITED THIN-FILMS
Authors: CHAMPEAUX C DAMIANI D AUBRETON J CATHERINOT A
Citation: C. Champeaux et al., MASS-SPECTROMETRIC INVESTIGATION OF THE KRF LASER-INDUCED PLASMA PLUME CREATED ABOVE AN YBACUO SUPERCONDUCTING TARGET - CORRELATION WITH THICKNESS DISTRIBUTION OF DEPOSITED THIN-FILMS, Applied surface science, 69(1-4), 1993, pp. 169-173
Risultati: 1-25 | 26-27