AAAAAA
Results: 1-25/29
Authors:
Lee, KK
Lim, DR
Kimerling, LC
Shin, J
Cerrina, F
Citation: Kk. Lee et al., Fabrication of ultralow-loss Si/SiO2 waveguides by roughness reduction, OPTICS LETT, 26(23), 2001, pp. 1888-1890
Authors:
Kim, Y
Shapiro, NA
Feick, H
Armitage, R
Weber, ER
Yang, Y
Cerrina, F
Citation: Y. Kim et al., Elastic strain relief in nitridated Ga metal buffer layers for epitaxial GaN growth, APPL PHYS L, 78(7), 2001, pp. 895-897
Authors:
Yi, SS
Moran, PD
Zhang, X
Cerrina, F
Carter, J
Smith, HI
Kuech, TF
Citation: Ss. Yi et al., Oriented crystallization of GaSb on a patterned, amorphous Si substrate, APPL PHYS L, 78(10), 2001, pp. 1358-1360
Authors:
Han, G
Cerrina, F
Citation: G. Han et F. Cerrina, Energy transfer between electrons and photoresist: Its relation to resolution, J VAC SCI B, 18(6), 2000, pp. 3297-3302
Authors:
Cerrina, F
Bollepalli, S
Khan, M
Solak, H
Li, W
He, D
Citation: F. Cerrina et al., Image formation in EUV lithography: Multilayer and resist properties, MICROEL ENG, 53(1-4), 2000, pp. 13-20
Authors:
Yang, XM
Peters, RD
Nealey, PF
Solak, HH
Cerrina, F
Citation: Xm. Yang et al., Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates, MACROMOLEC, 33(26), 2000, pp. 9575-9582
Authors:
Cerrina, F
Citation: F. Cerrina, X-ray imaging: applications to patterning and lithography, J PHYS D, 33(12), 2000, pp. R103-R116
Authors:
Zhang, X
Solak, H
Cerrina, F
Lai, B
Cai, Z
Ilinski, P
Legnini, D
Rodrigues, W
Citation: X. Zhang et al., X-ray microdiffraction study of Cu interconnects, APPL PHYS L, 76(3), 2000, pp. 315-317
Authors:
Singh-Gasson, S
Green, RD
Yue, YJ
Nelson, C
Blattner, F
Sussman, MR
Cerrina, F
Citation: S. Singh-gasson et al., Maskless fabrication of light-directed oligonucleotide microarrays using adigital micromirror array, NAT BIOTECH, 17(10), 1999, pp. 974-978
Authors:
Que, L
Gianchandani, YB
Cerrina, F
Citation: L. Que et al., Mechanical characterization of electron-beam resist using micromachined structures, J VAC SCI B, 17(6), 1999, pp. 2719-2722
Authors:
Bollepalli, SB
Khan, M
Cerrina, F
Citation: Sb. Bollepalli et al., Image formation in extreme ultraviolet lithography and numerical aperture effects, J VAC SCI B, 17(6), 1999, pp. 2992-2997
Authors:
Solak, HH
He, D
Li, W
Cerrina, F
Citation: Hh. Solak et al., Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces, J VAC SCI B, 17(6), 1999, pp. 3052-3057
Authors:
Lu, B
Taylor, JW
Cerrina, F
See, CP
Bourdillon, AJ
Citation: B. Lu et al., Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique, J VAC SCI B, 17(6), 1999, pp. 3345-3350
Authors:
He, D
Solak, H
Li, W
Cerrina, F
Citation: D. He et al., Extreme ultraviolet and X-ray resist: Comparison study, J VAC SCI B, 17(6), 1999, pp. 3379-3383
Authors:
Khan, M
Han, G
Bollepalli, SB
Cerrina, F
Maldonado, J
Citation: M. Khan et al., Extension of x-ray lithography to 50 nm with a harder spectrum, J VAC SCI B, 17(6), 1999, pp. 3426-3432
Authors:
Khan, M
Cerrina, F
Toyota, E
Citation: M. Khan et al., Pattern resolution of an x-ray beamline with a wide exposure field, J VAC SCI B, 17(6), 1999, pp. 3433-3438
Authors:
Yang, Y
Mishra, S
Cerrina, F
Xu, SH
Cruguel, H
Lapeyre, GJ
Schetzina, JF
Citation: Y. Yang et al., Photoemission spectromicroscopy studies on epitaxial lateral overgrowth GaN surfaces, J VAC SCI B, 17(4), 1999, pp. 1884-1890
Authors:
Zacchigna, M
Berger, H
Sirigu, L
Margaritondo, G
Lorusso, GF
Solak, H
Cerrina, F
Citation: M. Zacchigna et al., A spectromicroscopy study of the Al GaS interface: Evidence of band bending lateral inhomogeneities, J ELEC SPEC, 103, 1999, pp. 671-675
Authors:
Hwu, Y
Tsai, WL
Lai, B
Mancini, DC
Je, JH
Noh, DY
Youn, HS
Hwang, CS
Cerrina, F
Swiech, W
Bertolo, M
Tromba, G
Margaritondo, G
Citation: Y. Hwu et al., Use of photoelectron microscopes as X-ray detectors for imaging and other applications, NUCL INST A, 437(2-3), 1999, pp. 516-520
Authors:
Bollepalli, SB
Cerrina, F
Citation: Sb. Bollepalli et F. Cerrina, Computation of reflected images from EUV masks, MICROEL ENG, 46(1-4), 1999, pp. 443-447
Authors:
Simon, K
Vladimirsky, O
Vladimirsky, Y
Cerrina, F
Citation: K. Simon et al., Overlay budget analysis for the 100 nm device generation, MICROEL ENG, 46(1-4), 1999, pp. 457-460
Authors:
Yun, W
Lai, B
Krasnoperova, AA
Di Fabrizio, E
Cai, Z
Cerrina, F
Chen, Z
Gentili, M
Gluskin, E
Citation: W. Yun et al., Development of zone plates with a blazed profile for hard x-ray applications, REV SCI INS, 70(9), 1999, pp. 3537-3541
Authors:
Yun, W
Lai, B
Cai, Z
Maser, J
Legnini, D
Gluskin, E
Chen, Z
Krasnoperova, AA
Vladimirsky, Y
Cerrina, F
Di Fabrizio, E
Gentili, M
Citation: W. Yun et al., Nanometer focusing of hard x rays by phase zone plates, REV SCI INS, 70(5), 1999, pp. 2238-2241
Authors:
Solak, HH
Vladimirsky, Y
Cerrina, F
Lai, B
Yun, W
Cai, Z
Ilinski, P
Legnini, D
Rodrigues, W
Citation: Hh. Solak et al., Measurement of strain in Al-Cu interconnect lines with x-ray microdiffraction, J APPL PHYS, 86(2), 1999, pp. 884-890
Authors:
Solak, HH
He, D
Li, W
Singh-Gasson, S
Cerrina, F
Sohn, BH
Yang, XM
Nealey, P
Citation: Hh. Solak et al., Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography, APPL PHYS L, 75(15), 1999, pp. 2328-2330