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Results:
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Results: 22
Authors:
YARINA KL
DANDY DS
JENSEN E
BUTLER JE
Citation: Kl. Yarina et al., GROWTH OF DIAMOND FILMS USING AN ENCLOSED METHYL-ACETYLENE AND PROPADIENE COMBUSTION-FLAME, DIAMOND AND RELATED MATERIALS, 7(10), 1998, pp. 1491-1502
Authors:
POFLEE NM
RAKOW AL
RYAN K
DAHL S
DANDY DS
Citation: Nm. Poflee et al., MAXIMIZATION OF RECOVERY OF SPIRULINA-PLATENSIS IN A STAGED PROCESS-BASED ON INERTIAL MIGRATION, Separation science and technology, 33(7), 1998, pp. 915-931
Authors:
MAHALINGAM P
DANDY DS
Citation: P. Mahalingam et Ds. Dandy, A QUASI-EQUILIBRIUM MODEL FOR THE PREDICTION OF INTERLAYER CHEMISTRY DURING DIAMOND CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 322(1-2), 1998, pp. 108-116
Authors:
MAHALINGAM P
DANDY DS
Citation: P. Mahalingam et Ds. Dandy, NONLINEAR STABILITY ANALYSIS OF THE GROWTH SURFACE DURING DIAMOND CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 83(11), 1998, pp. 6061-6071
Authors:
SROLOVITZ DJ
DANDY DS
BUTLER JE
BATTAILE CC",PARITOSH
Citation: Dj. Srolovitz et al., THE INTEGRATED MULTISCALE MODELING OF DIAMOND CHEMICAL-VAPOR-DEPOSITION, JOM, 49(9), 1997, pp. 42-47
Authors:
MAHALINGAM P
DANDY DS
Citation: P. Mahalingam et Ds. Dandy, SIMULATION OF MORPHOLOGICAL INSTABILITIES DURING DIAMOND CHEMICAL-VAPOR-DEPOSITION, DIAMOND AND RELATED MATERIALS, 6(12), 1997, pp. 1759-1771
MOMENTUM AND THERMAL-BOUNDARY-LAYER THICKNESS IN A STAGNATION FLOW CHEMICAL-VAPOR-DEPOSITION REACTOR
Authors:
DANDY DS
YUN J
Citation: Ds. Dandy et J. Yun, MOMENTUM AND THERMAL-BOUNDARY-LAYER THICKNESS IN A STAGNATION FLOW CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of materials research, 12(4), 1997, pp. 1112-1121
Authors:
MAHALINGAM P
LIU HM
DANDY DS
Citation: P. Mahalingam et al., A MODEL FOR THE NUCLEATION OF DIAMOND CLUSTERS ON SI(111) SUBSTRATES, Journal of applied physics, 81(4), 1997, pp. 1966-1977
Authors:
POFLEE NM
RAKOW AL
DANDY DS
CHAPPELL ML
PONS MN
Citation: Nm. Poflee et al., INERTIAL MIGRATION BASED CONCENTRATION FACTORS FOR SUSPENSIONS OF CHLORELLA MICROALGAE IN BRANCHED TUBES, Biorheology, 34(6), 1997, pp. 405-421
Authors:
REEVE SW
WEIMER WA
DANDY DS
Citation: Sw. Reeve et al., ON THE OPTIMIZATION OF A DC ARCJET DIAMOND CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of materials research, 11(3), 1996, pp. 694-702
Authors:
LIU HM
DANDY DS
Citation: Hm. Liu et Ds. Dandy, NUCLEATION KINETICS OF DIAMOND ON CARBIDE-FORMING SUBSTRATES DURING CHEMICAL-VAPOR-DEPOSITION .1. TRANSIENT NUCLEATION STAGE, Journal of the Electrochemical Society, 143(3), 1996, pp. 1104-1109
Authors:
MCMASTER MC
HSU WL
COLTRIN ME
DANDY DS
FOX C
Citation: Mc. Mcmaster et al., DEPENDENCE OF THE GAS-COMPOSITION IN A MICROWAVE PLASMA-ASSISTED DIAMOND CHEMICAL-VAPOR-DEPOSITION REACTOR ON THE INLET CARBON SOURCE - CH4VERSUS C2H2, DIAMOND AND RELATED MATERIALS, 4(7), 1995, pp. 1000-1008
Authors:
LIU HM
DANDY DS
Citation: Hm. Liu et Ds. Dandy, STUDIES ON NUCLEATION PROCESS IN DIAMOND CVD - AN OVERVIEW OF RECENT DEVELOPMENTS, DIAMOND AND RELATED MATERIALS, 4(10), 1995, pp. 1173-1188
Authors:
LIU HM
DANDY DS
Citation: Hm. Liu et Ds. Dandy, MODELING OF LIQUID-METAL FLOW AND HEAT-TRANSFER IN DELIVERY TUBE DURING GAS ATOMIZATION, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 197(2), 1995, pp. 199-208
Authors:
DANDY DS
COLTRIN ME
Citation: Ds. Dandy et Me. Coltrin, A SIMPLIFIED ANALYTICAL MODEL OF DIAMOND GROWTH IN DIRECT-CURRENT ARCJET REACTORS, Journal of materials research, 10(8), 1995, pp. 1993-2010
Authors:
LIU H
DANDY DS
Citation: H. Liu et Ds. Dandy, DEFORMATION AND SOLIDIFICATION OF DROPLETS GENERATED BY A PIEZOELECTRIC TRANSDUCER, Journal of materials science letters, 14(3), 1995, pp. 185-187
Authors:
DANDY DS
COLTRIN ME
Citation: Ds. Dandy et Me. Coltrin, RELATIONSHIP BETWEEN DIAMOND GROWTH-RATE AND HYDROCARBON INJECTOR LOCATION IN DIRECT-CURRENT ARCJET REACTORS, Applied physics letters, 66(3), 1995, pp. 391-393
Authors:
HSU WL
MCMASTER MC
COLTRIN ME
DANDY DS
Citation: Wl. Hsu et al., MOLECULAR-BEAM MASS-SPECTROMETRY STUDIES OF CHEMICAL-VAPOR-DEPOSITIONOF DIAMOND, JPN J A P 1, 33(4B), 1994, pp. 2231-2239
Authors:
DANDY DS
COLTRIN ME
Citation: Ds. Dandy et Me. Coltrin, EFFECTS OF TEMPERATURE AND FILAMENT POISONING ON DIAMOND GROWTH IN HOT-FILAMENT REACTORS, Journal of applied physics, 76(5), 1994, pp. 3102-3113
Authors:
MCMASTER MC
HSU WL
COLTRIN ME
DANDY DS
Citation: Mc. Mcmaster et al., EXPERIMENTAL MEASUREMENTS AND NUMERICAL SIMULATIONS OF THE GAS-COMPOSITION IN A HOT-FILAMENT-ASSISTED DIAMOND CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of applied physics, 76(11), 1994, pp. 7567-7577
Authors:
COLTRIN ME
DANDY DS
Citation: Me. Coltrin et Ds. Dandy, ANALYSIS OF DIAMOND GROWTH IN SUBATMOSPHERIC DC PLASMA-GUN REACTORS, Journal of applied physics, 74(9), 1993, pp. 5803-5820
Authors:
REEVE SW
WEIMER WA
DANDY DS
Citation: Sw. Reeve et al., DIAMOND GROWTH USING REMOTE METHANE INJECTION IN A DIRECT-CURRENT ARCJET CHEMICAL-VAPOR-DEPOSITION REACTOR, Applied physics letters, 63(18), 1993, pp. 2487-2489
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