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Authors: WALTER M HUTTEN HM SCHEER HC ENGEMANN J
Citation: M. Walter et al., COMPUTER-AIDED PROFILE OPTIMIZATION OF ION-MILLED MICROSTRUCTURES, Modelling and simulation in materials science and engineering, 6(3), 1998, pp. 251-260

Authors: ENGEMANN J WALTER M DAHLHAUS R HUTTEN HM KORZEC D
Citation: J. Engemann et al., ELECTROMAGNETIC-FIELDS IN A SLOT ANTENNA MICROWAVE PLASMA SOURCE - NUMERICAL-SIMULATION AND MEASUREMENT, The Journal of microwave power and electromagnetic energy, 33(3), 1998, pp. 195-202

Authors: SPRANG N THEIRICH D ENGEMANN J
Citation: N. Sprang et al., SURFACE MODIFICATION OF FLUOROPOLYMERS BY MICROWAVE PLASMAS - FTIR INVESTIGATIONS, Surface & coatings technology, 98(1-3), 1998, pp. 865-871

Authors: NINGEL KP THEIRICH D ENGEMANN J
Citation: Kp. Ningel et al., CHARACTERIZING THE REMOTE PLASMA POLYMERIZATION OF OCTAFLUOROCYCLOBUTANE INDUCED BY RF-DRIVEN HOLLOW-CATHODE DISCHARGE, Surface & coatings technology, 98(1-3), 1998, pp. 1142-1147

Authors: WALTER M KORZEC D HUTTEN M ENGEMANN J
Citation: M. Walter et al., COMPUTER-AIDED-DESIGN OF MICROWAVE PLASMA SOURCES - POTENTIAL AND APPLICATIONS, JPN J A P 1, 36(7B), 1997, pp. 4777-4783

Authors: KORZEC D SEIBERT C WINTER R ENGEMANN J
Citation: D. Korzec et al., INFLUENCE OF THE SUBSTRATE SURFACE ON ION CONCENTRATIONS IN A LARGE-VOLUME MICROWAVE PLASMA, Surface & coatings technology, 97(1-3), 1997, pp. 122-130

Authors: BEHLE S GEORG A YUAN Y ENGEMANN J BROCKHAUS A
Citation: S. Behle et al., IMAGING OF ATOMIC OXYGEN IN A MICROWAVE EXCITED OXYGEN PLASMA WITH 2-DIMENSIONAL OPTICAL-EMISSION SPECTROSCOPY, Surface & coatings technology, 97(1-3), 1997, pp. 734-741

Authors: KORZEC D MILDNER M HILLEMANN F ENGEMANN J
Citation: D. Korzec et al., 70 CM RADIO-FREQUENCY HOLLOW-CATHODE PLASMA SOURCE FOR MODIFICATION OF FOILS AND MEMBRANES, Surface & coatings technology, 97(1-3), 1997, pp. 759-767

Authors: KORZEC D RAIKO V ENGEMANN J GUNZEL R BRUTSCHER J MOLLER W
Citation: D. Korzec et al., APPLICATION OF THE ECR SLOT ANTENNA PLASMA SOURCE FOR ION-IMPLANTATION, Surface & coatings technology, 93(2-3), 1997, pp. 217-224

Authors: KORZEC D ENGEMANN J MILDNER M NINGEL KP BORGMEIER O THEIRICH D
Citation: D. Korzec et al., MULTI-JET HOLLOW-CATHODE DISCHARGE FOR REMOTE POLYMER DEPOSITION, Surface & coatings technology, 93(1), 1997, pp. 128-133

Authors: WINTER R KORZEC D ENGEMANN J
Citation: R. Winter et al., LARGE-AREA PLASMA CLEANING WITH 26''-MICROWAVE SLOT ANTENNA PLASMA SOURCE SLAN-II, Surface & coatings technology, 93(1), 1997, pp. 134-141

Authors: WINTER R KORZEC D ENGEMANN J
Citation: R. Winter et al., REMOTE AND DIRECT CLEANING BY USE OF MICROWAVE PLASMA SOURCE SLAN-II - COMPARATIVE-STUDY, Surface & coatings technology, 91(1-2), 1997, pp. 101-106

Authors: KORZEC D ENGEMANN J
Citation: D. Korzec et J. Engemann, LARGE-AREA LUBRICANT REMOVAL BY USE OF CAPACITIVELY COUPLED RF AND SLOT ANTENNA MICROWAVE PLASMA SOURCE, Surface & coatings technology, 89(1-2), 1997, pp. 165-176

Authors: RAIKO V SPITZL R ENGEMANN J BORISENKO V BONDARENKO V
Citation: V. Raiko et al., MPCVD DIAMOND DEPOSITION ON POROUS SILICON PRETREATED WITH THE BIAS METHOD, DIAMOND AND RELATED MATERIALS, 5(10), 1996, pp. 1063-1069

Authors: WERNER F KORZEC D ENGEMANN J
Citation: F. Werner et al., SURFACE-WAVE OPERATION MODE OF THE SLOT ANTENNA MICROWAVE PLASMA SOURCE SLAN, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(6), 1996, pp. 3065-3070

Authors: BROCKHAUS A YUAN Y BEHLE S ENGEMANN J
Citation: A. Brockhaus et al., DETERMINATION OF CHEMICALLY ACTIVE SPECIES IN A NOVEL MICROWAVE PLASMA SOURCE BY LASER-INDUCED FLUORESCENCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1882-1887

Authors: THEIRICH D NINGEL KP ENGEMANN J
Citation: D. Theirich et al., A NOVEL REMOTE TECHNIQUE FOR HIGH-RATE PLASMA POLYMERIZATION WITH RADIO-FREQUENCY PLASMAS, Surface & coatings technology, 86-7(1-3), 1996, pp. 628-633

Authors: RAIKO V SPITZL R ASCHERMANN B THEIRICH D ENGEMANN J PUPETER N HABERMANN T MULLER G
Citation: V. Raiko et al., FIELD-EMISSION OBSERVATIONS FROM CVD DIAMOND-COATED SILICON EMITTERS, Thin solid films, 291, 1996, pp. 190-195

Authors: KORZEC D TRAUB K WERNER F ENGEMANN J
Citation: D. Korzec et al., REMOTE DEPOSITION OF SCRATCH RESISTANT FILMS BY USE OF SLOT ANTENNA MICROWAVE PLASMA SOURCE, Thin solid films, 282(1-2), 1996, pp. 143-145

Authors: SPITZL R RAIKO V HEIDERHOFF R GNASER H ENGEMANN J
Citation: R. Spitzl et al., MPCVD DIAMOND DEPOSITION ON BIAS PRETREATED POROUS SILICON, DIAMOND AND RELATED MATERIALS, 4(5-6), 1995, pp. 563-568

Authors: KORZEC D WERNER F BROCKHAUS A ENGEMANN J SCHNEIDER TP NEMANICH RJ
Citation: D. Korzec et al., CHARACTERIZATION OF A SLOT ANTENNA MICROWAVE PLASMA SOURCE FOR HYDROGEN PLASMA CLEANING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(4), 1995, pp. 2074-2085

Authors: KORZEC D SCHOTT M ENGEMANN J
Citation: D. Korzec et al., RADIO-FREQUENCY HOLLOW-CATHODE DISCHARGE FOR LARGE-AREA DOUBLE-SIDED FOIL PROCESSING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 843-848

Authors: ENGEMANN J SCHOTT M WERNER F KORZEC D
Citation: J. Engemann et al., LARGE-VOLUME ELECTRON-CYCLOTRON-RESONANCE PLASMA GENERATION BY USE OFTHE SLOTTED ANTENNA MICROWAVE SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 875-882

Authors: BROCKHAUS A YUAN Y ENGEMANN J
Citation: A. Brockhaus et al., DETERMINATION OF THE ION VELOCITY IN A RADIO-FREQUENCY ION-BEAM BY LASER-INDUCED FLUORESCENCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(2), 1995, pp. 400-405

Authors: KORZEC D THEIRICH D WERNER F TRAUB K ENGEMANN J
Citation: D. Korzec et al., REMOTE AND DIRECT MICROWAVE PLASMA DEPOSITION OF HMDSO FILMS - COMPARATIVE-STUDY, Surface & coatings technology, 74-5(1-3), 1995, pp. 67-74
Risultati: 1-25 | 26-31