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Results: 1-10 |
Results: 10
THE STRUCTURE STUDY OF THIN SEMICONDUCTOR AND DIELECTRIC FILMS BY DIFFRACTION OF SYNCHROTRON-RADIATION
Authors: YURJEV GS FAINER NI MAXIMOVSKIY EA KOSINOVA ML SHEROMOV MA RUMYANTSEV YM
Citation: Gs. Yurjev et al., THE STRUCTURE STUDY OF THIN SEMICONDUCTOR AND DIELECTRIC FILMS BY DIFFRACTION OF SYNCHROTRON-RADIATION, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 405(2-3), 1998, pp. 466-469
THIN COPPER SULFIDE FILMS PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING COPPER DIETHYLDITHIOCARBAMATE
Authors: FAINER NI RUMYANTSEV YM KOSINOVA ML YUREV GS MAKSIMOVSKII EA ZEMSKOVA SM SYSOEV SV KUZNETSOV FA
Citation: Ni. Fainer et al., THIN COPPER SULFIDE FILMS PRODUCED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING COPPER DIETHYLDITHIOCARBAMATE, Inorganic materials, 34(10), 1998, pp. 1049-1052
STRUCTURE OF SILICON-NITRIDE LAYERS GROWN BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
Authors: FAINER NI RUMYANTSEV YM KOSINOVA ML YUREV GS MAKSIMOVSKII EA KUZNETSOV FA
Citation: Ni. Fainer et al., STRUCTURE OF SILICON-NITRIDE LAYERS GROWN BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Inorganic materials, 34(10), 1998, pp. 1053-1056
THE INVESTIGATION OF PROPERTIES OF SILICON-NITRIDE FILMS OBTAINED BY RPECVD FROM HEXAMETHYLDISILAZANE
Authors: FAINER NI RUMYANTSEV YM KOSINOVA ML YURJEV GS MAXIMOVSKII EA KUZNETSOV FA
Citation: Ni. Fainer et al., THE INVESTIGATION OF PROPERTIES OF SILICON-NITRIDE FILMS OBTAINED BY RPECVD FROM HEXAMETHYLDISILAZANE, Applied surface science, 114, 1997, pp. 614-617
PLASMA-DEPOSITED CDS LAYERS FROM (O-PHEN)BIS(DIETHYLDITHIOCARBAMATE) CADMIUM
Authors: FAINER NI RUMYANTSEV YM SALMAN EG KOSINOVA ML YURJEV GS SYSOEVA NP MAXIMOVSKII EA SYSOEV SV GOLUBENKO AN
Citation: Ni. Fainer et al., PLASMA-DEPOSITED CDS LAYERS FROM (O-PHEN)BIS(DIETHYLDITHIOCARBAMATE) CADMIUM, Thin solid films, 286(1-2), 1996, pp. 122-126
GROWTH OF PBS AND CDS THIN-FILMS BY LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION USING DITHIOCARBAMATES
Authors: FAINER NI KOSINOVA ML RUMYANTSEV YM SALMAN EG KUZNETSOV FA
Citation: Ni. Fainer et al., GROWTH OF PBS AND CDS THIN-FILMS BY LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION USING DITHIOCARBAMATES, Thin solid films, 280(1-2), 1996, pp. 16-19
THE STUDY OF THE BORON-NITRIDE THIN-LAYER STRUCTURE
Authors: YURYEV GS MAXIMOVSKIY EA RUMYANTSEV YM FAINER NI KOSINOVA ML
Citation: Gs. Yuryev et al., THE STUDY OF THE BORON-NITRIDE THIN-LAYER STRUCTURE, Journal de physique. IV, 5(C5), 1995, pp. 695-698
CHEMICAL-STABILITY OF HYDROGEN-CONTAINING BORON-NITRIDE FILMS OBTAINED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
Authors: AKKERMAN ZL KOSINOVA ML FAINER NI RUMJANTSEV YM SYSOEVA NP
Citation: Zl. Akkerman et al., CHEMICAL-STABILITY OF HYDROGEN-CONTAINING BORON-NITRIDE FILMS OBTAINED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 260(2), 1995, pp. 156-160
BNX-H DIELECTRIC LAYERS PREPARED BY FIELD-ASSISTED PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
Authors: SALMAN EG KOSINOVA ML KORSHUNOV AN BADALYAN AM POLYAKOV OV RUMYANTSEV YM SYSOEVA NP FAINER NI
Citation: Eg. Salman et al., BNX-H DIELECTRIC LAYERS PREPARED BY FIELD-ASSISTED PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Inorganic materials, 31(12), 1995, pp. 1400-1403
DEHYDROGENATION OF BNX-H THIN-FILMS DURING HIGH-TEMPERATURE ANNEALING
Authors: AKKERMAN ZL KOSINOVA ML RUMYANTSEV YM SYSOEVA NP FAINER NI
Citation: Zl. Akkerman et al., DEHYDROGENATION OF BNX-H THIN-FILMS DURING HIGH-TEMPERATURE ANNEALING, Inorganic materials, 31(1), 1995, pp. 61-64
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