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Results: 1-11 |
Results: 11
MIRAGE-EFFECT-BASED DEPTH PROFILING OF MICROMACHINED SILICON STRUCTURES
Authors: TULI S BHATTACHARYYA AB FORGET BC FOURNIER D
Citation: S. Tuli et al., MIRAGE-EFFECT-BASED DEPTH PROFILING OF MICROMACHINED SILICON STRUCTURES, Sensors and actuators. A, Physical, 64(3), 1998, pp. 203-207
HIGH-RESOLUTION AC TEMPERATURE-FIELD IMAGING
Authors: FORGET BC GRAUBY S FOURNIER D GLEYZES P BOCCARA AC
Citation: Bc. Forget et al., HIGH-RESOLUTION AC TEMPERATURE-FIELD IMAGING, Electronics Letters, 33(20), 1997, pp. 1688-1689
CHARACTERIZATION OF ELECTRONIC TRANSPORT-PROPERTIES IN SEMICONDUCTORSBY SCANNING PHOTOTHERMAL MICROSCOPY
Authors: BARBEREAU I FORGET BC FOURNIER D
Citation: I. Barbereau et al., CHARACTERIZATION OF ELECTRONIC TRANSPORT-PROPERTIES IN SEMICONDUCTORSBY SCANNING PHOTOTHERMAL MICROSCOPY, Progress in Natural Science, 6, 1996, pp. 479-482
PHOTOTHERMAL INVESTIGATION OF IMPLANTED SI WAFERS - INFLUENCE OF THERMAL-DIFFUSIVITY
Authors: BARBEREAU I FORGET BC FOURNIER D
Citation: I. Barbereau et al., PHOTOTHERMAL INVESTIGATION OF IMPLANTED SI WAFERS - INFLUENCE OF THERMAL-DIFFUSIVITY, Progress in Natural Science, 6, 1996, pp. 503-506
PHOTOTHERMAL REFLECTION SIGNAL VERSUS TEMPERATURE - STUDY OF IMPLANTED SI WAFERS
Authors: NESTOROS M FORGET BC SEAS A CHRISTOFIDES C
Citation: M. Nestoros et al., PHOTOTHERMAL REFLECTION SIGNAL VERSUS TEMPERATURE - STUDY OF IMPLANTED SI WAFERS, Progress in Natural Science, 6, 1996, pp. 507-510
MICROSCOPIC MEASUREMENTS OF THE LOCAL HEAT-CONDUCTION IN POLYCRYSTALLINE DIAMOND FILMS
Authors: PLAMANN K FOURNIER D FORGET BC BOCCARA AC
Citation: K. Plamann et al., MICROSCOPIC MEASUREMENTS OF THE LOCAL HEAT-CONDUCTION IN POLYCRYSTALLINE DIAMOND FILMS, DIAMOND AND RELATED MATERIALS, 5(6-8), 1996, pp. 699-705
ELECTRONIC DIFFUSIVITY MEASUREMENT IN SILICON BY PHOTOTHERMAL MICROSCOPY
Authors: FORGET BC BARBEREAU I FOURNIER D TULI S BATTACHARYYA AB
Citation: Bc. Forget et al., ELECTRONIC DIFFUSIVITY MEASUREMENT IN SILICON BY PHOTOTHERMAL MICROSCOPY, Applied physics letters, 69(8), 1996, pp. 1107-1109
PHOTOTHERMAL REFLECTION VERSUS TEMPERATURE - QUANTITATIVE-ANALYSIS
Authors: NESTOROS M FORGET BC CHRISTOFIDES C SEAS A
Citation: M. Nestoros et al., PHOTOTHERMAL REFLECTION VERSUS TEMPERATURE - QUANTITATIVE-ANALYSIS, Physical review. B, Condensed matter, 51(20), 1995, pp. 14115-14123
SPECIAL EFFECTS OF 3D DIFFUSION OF PLASMA-WAVES - NON-LINEAR PHOTOREFLECTANCE SIGNAL
Authors: FORGET BC FOURNIER D GUSEV VE
Citation: Bc. Forget et al., SPECIAL EFFECTS OF 3D DIFFUSION OF PLASMA-WAVES - NON-LINEAR PHOTOREFLECTANCE SIGNAL, Journal de physique. IV, 4(C7), 1994, pp. 151-154
NON-LINEAR RECOMBINATION PROCESSES - APPLICATION TO QUANTITATIVE IMPLANTATION CHARACTERIZATION
Authors: FORGET BC FOURNIER D GUSEV VE
Citation: Bc. Forget et al., NON-LINEAR RECOMBINATION PROCESSES - APPLICATION TO QUANTITATIVE IMPLANTATION CHARACTERIZATION, Journal de physique. IV, 4(C7), 1994, pp. 155-158
CHARACTERIZATION OF IMPLANTED SILICON-WAFERS BY THE NONLINEAR PHOTOREFLECTANCE TECHNIQUE
Authors: FORGET BC FOURNIER D
Citation: Bc. Forget et D. Fournier, CHARACTERIZATION OF IMPLANTED SILICON-WAFERS BY THE NONLINEAR PHOTOREFLECTANCE TECHNIQUE, Materials science & engineering. B, Solid-state materials for advanced technology, 24(1-3), 1994, pp. 199-202
Risultati: 1-11 |