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Results:
1-9
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Results: 9
Authors:
DOUGHTY C
GORBATKIN SM
TSUI TY
PHARR GM
MEDLIN DL
Citation: C. Doughty et al., HARD BORON SUBOXIDE-BASED FILMS DEPOSITED IN A SPUTTER-SOURCED, HIGH-DENSITY PLASMA DEPOSITION SYSTEM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(5), 1997, pp. 2623-2626
Authors:
DOUGHTY C
GORBATKIN SM
BERRY LA
Citation: C. Doughty et al., SPATIAL-DISTRIBUTION OF CU SPUTTER EJECTED BY VERY-LOW ENERGY ION-BOMBARDMENT, Journal of applied physics, 82(4), 1997, pp. 1868-1875
Authors:
GORBATKIN SM
POKER DB
RHOADES RL
DOUGHTY C
BERRY LA
ROSSNAGEL SM
Citation: Sm. Gorbatkin et al., CU METALLIZATION USING A PERMANENT-MAGNET ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA SPUTTERING HYBRID SYSTEM/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 1853-1859
Authors:
RHOADES RL
GORBATKIN SM
Citation: Rl. Rhoades et Sm. Gorbatkin, CHARACTERIZATION OF AR CU ELECTRON-CYCLOTRON-RESONANCE PLASMAS USING OPTICAL-EMISSION SPECTROSCOPY/, Journal of applied physics, 80(5), 1996, pp. 2605-2613
Authors:
BERRY LA
GORBATKIN SM
Citation: La. Berry et Sm. Gorbatkin, PERMANENT-MAGNET ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE WITH REMOTE WINDOW, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(2), 1995, pp. 343-348
Authors:
BERRY LA
GORBATKIN SM
RHOADES RL
Citation: La. Berry et al., CU DEPOSITION USING A PERMANENT-MAGNET ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA SOURCE, Thin solid films, 253(1-2), 1994, pp. 382-385
Authors:
GORBATKIN SM
RHOADES RL
TSUI TY
OLIVER WC
Citation: Sm. Gorbatkin et al., HARD BORON-OXIDE THIN-FILM DEPOSITION USING ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMAS, Applied physics letters, 65(21), 1994, pp. 2672-2674
Authors:
RHOADES RL
GORBATKIN SM
Citation: Rl. Rhoades et Sm. Gorbatkin, SPATIAL PROFILING OF ION AND NEUTRAL EXCITATION IN NOBLE-GAS ELECTRON-CYCLOTRON-RESONANCE PLASMAS, Applied physics letters, 65(16), 1994, pp. 2004-2006
Authors:
JELLISON GE
CHISHOLM MF
GORBATKIN SM
Citation: Ge. Jellison et al., OPTICAL FUNCTIONS OF CHEMICAL-VAPOR-DEPOSITED THIN-FILM SILICON DETERMINED BY SPECTROSCOPIC ELLIPSOMETRY, Applied physics letters, 62(25), 1993, pp. 3348-3350
Risultati:
1-9
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