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Results:
1-15
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Results: 15
Authors:
WANG JJ
LAMBERS ES
PEARTON SJ
OSTLING M
ZETTERLING CM
GROW JM
REN F
SHUL RJ
Citation: Jj. Wang et al., INDUCTIVELY-COUPLED PLASMA-ETCHING OF BULK 6H-SIC AND THIN-FILM SICN IN NF3 CHEMISTRIES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2204-2209
Authors:
WANG JJ
LAMBERS ES
PEARTON SJ
OSTLING M
ZETTERLING CM
GROW JM
REN F
Citation: Jj. Wang et al., HIGH-RATE ETCHING OF SIC AND SICN IN NF3 INDUCTIVELY-COUPLED PLASMAS, Solid-state electronics, 42(5), 1998, pp. 743-747
Authors:
NARH KA
DWIVEDI VP
GROW JM
STANA A
SHIH WY
Citation: Ka. Narh et al., THE EFFECT OF LIQUID GALLIUM ON THE STRENGTHS OF STAINLESS-STEEL AND THERMOPLASTICS, Journal of Materials Science, 33(2), 1998, pp. 329-337
Authors:
MCDANIEL G
LEE JW
LAMBERS ES
PEARTON SJ
HOLLOWAY PH
REN F
GROW JM
BHASKARAN M
WILSON RG
Citation: G. Mcdaniel et al., COMPARISON OF DRY ETCH CHEMISTRIES FOR SIC, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 885-889
Authors:
REN F
GROW JM
BHASKARAN M
WILSON RG
PEARTON SJ
Citation: F. Ren et al., HYDROGEN PASSIVATION IN N-TYPE AND P-TYPE 6H-SIC, Journal of electronic materials, 26(3), 1997, pp. 198-202
Authors:
LEVY RA
LIN X
GROW JM
BOEGLIN HJ
SHALVOY R
Citation: Ra. Levy et al., LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF SILICON-NITRIDE USING THE ENVIRONMENTALLY FRIENDLY TRIS(DIMETHYLAMINO)SILANE PRECURSOR, Journal of materials research, 11(6), 1996, pp. 1483-1488
Authors:
LEVY RA
RAMOS ES
KRASNOPEROV LN
DATTA A
GROW JM
Citation: Ra. Levy et al., MICROPOROUS SIO2 VYCOR MEMBRANES FOR GAS SEPARATION/, Journal of materials research, 11(12), 1996, pp. 3164-3173
Authors:
PEARTON SJ
LEE JW
GROW JM
BHASKARAN M
REN F
Citation: Sj. Pearton et al., THERMAL-STABILITY OF DRY ETCH DAMAGE IN SIC, Applied physics letters, 68(21), 1996, pp. 2987-2989
Authors:
LEVY RA
MASTROMATTEO E
GROW JM
PATURI V
KUO WP
BOEGLIN HJ
SHALVOY R
Citation: Ra. Levy et al., LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF B-N-C-H FILMS FROM TRIETHYLAMINE BORANE COMPLEX, Journal of materials research, 10(2), 1995, pp. 320-327
Authors:
GAO YM
LIU M
GROW JM
KNOX DE
Citation: Ym. Gao et al., EVALUATION OF THE HOMOGENEITY OF STABILIZED SOLIDIFIED WASTES BY A VIDEO IMAGING TECHNIQUE, Waste management and research, 13(4), 1995, pp. 335-342
Authors:
LEVY RA
GROW JM
YU Y
SHIH KT
Citation: Ra. Levy et al., PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SI-N-C-H FILMS FROM ENVIRONMENTALLY BENIGN ORGANOSILANES, Materials letters, 24(1-3), 1995, pp. 47-52
Authors:
GROW JM
LEVY RA
FAN X
BHASKARAN M
Citation: Jm. Grow et al., GROWTH-KINETICS AND CHARACTERIZATION OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED SI3N4 FILMS FROM (C4H9)(2)SIH2 AND NH3, Materials letters, 23(4-6), 1995, pp. 187-193
Authors:
GROW JM
LEVY RA
Citation: Jm. Grow et Ra. Levy, MICROMECHANICAL CHARACTERIZATION OF CHEMICALLY VAPOR-DEPOSITED CERAMIC FILMS, Journal of materials research, 9(8), 1994, pp. 2072-2078
Authors:
LEVY RA
GROW JM
CHAKRAVARTHY GS
Citation: Ra. Levy et al., LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF SILICON DIOXIDE USING DIETHYLSILANE, Chemistry of materials, 5(12), 1993, pp. 1710-1714
Authors:
GROW JM
LEVY RA
BHASKARAN M
BOEGLIN HJ
SHALVOY R
Citation: Jm. Grow et al., LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF SILICON-CARBIDE FROM DITERTIARYBUTYLSILANE, Journal of the Electrochemical Society, 140(10), 1993, pp. 3001-3007
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