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Results: 1-7 |
Results: 7
X-RAY MICROFABRICATION AND NANOFABRICATION USING A LASER-PLASMA SOURCE AT 1 NM WAVELENGTH
Authors: TURCU ICE ALLOT RM MANN CM REEVES C ROSS IN LISI N MADDISON BJ MOON SW PREWETT P STEVENSON JTM ROSS AWS GUNDLACH AM KOEK B MITCHELL P ANASTASI P MCCOARD C KIM NS
Citation: Ice. Turcu et al., X-RAY MICROFABRICATION AND NANOFABRICATION USING A LASER-PLASMA SOURCE AT 1 NM WAVELENGTH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2495-2502
AN ELECTRICAL TEST STRUCTURE FOR THE MEASUREMENT OF PLANARIZATION
Authors: ELLIOTT JP FALLON M WALTON AJ STEVENSON JTM OHARA A GUNDLACH AM
Citation: Jp. Elliott et al., AN ELECTRICAL TEST STRUCTURE FOR THE MEASUREMENT OF PLANARIZATION, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 242-249
ROLE OF TOPOGRAPHY SENSING FOR INFECTION-STRUCTURE DIFFERENTIATION INCEREAL RUST FUNGI
Authors: READ ND KELLOCK LJ COLLINS TJ GUNDLACH AM
Citation: Nd. Read et al., ROLE OF TOPOGRAPHY SENSING FOR INFECTION-STRUCTURE DIFFERENTIATION INCEREAL RUST FUNGI, Planta, 202(2), 1997, pp. 163-170
A STUDY OF THE MECHANISM OF REACTIVE STRIPPING OF PHOTORESIST
Authors: PORFIRIS N NEWBY J GUNDLACH AM PETHRICK RA AFFROSMANN S TANNAHILL A
Citation: N. Porfiris et al., A STUDY OF THE MECHANISM OF REACTIVE STRIPPING OF PHOTORESIST, Journal of the Electrochemical Society, 144(8), 1997, pp. 2913-2919
FABRICATION OF 200NM FIELD-EFFECT TRANSISTORS BY X-RAY-LITHOGRAPHY USING A LASER-PLASMA X-RAY SOURCE
Authors: REEVES CM TURCU ICE STEVENSON JTM ROSS AWS GUNDLACH AM PREWETT P LAWES RA ANASTASI P BURGE R MICHELL P
Citation: Cm. Reeves et al., FABRICATION OF 200NM FIELD-EFFECT TRANSISTORS BY X-RAY-LITHOGRAPHY USING A LASER-PLASMA X-RAY SOURCE, Microelectronic engineering, 30(1-4), 1996, pp. 187-190
180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE
Authors: TURCU ICE REEVES CM STEVENSON JTM ROSS AWS GUNDLACH AM PREWETT P ANASTASI P KOEK B MITCHELL P LAKE P
Citation: Ice. Turcu et al., 180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE, Microelectronic engineering, 27(1-4), 1995, pp. 295-298
FABRICATION OF 200 NM FIELD-EFFECT TRANSISTOR BY X-RAY-LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE
Authors: REEVES CM TURCU ICE PREWETT PD GUNDLACH AM STEVENSON JT WALTON AJ ROSS AWS LAWES RA ANASTASI P BURGE R MITCHELL P
Citation: Cm. Reeves et al., FABRICATION OF 200 NM FIELD-EFFECT TRANSISTOR BY X-RAY-LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE, Electronics Letters, 31(25), 1995, pp. 2218-2219
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