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Results: 1-25 |
Results: 25

Authors: Lau, KKS Gleason, KK
Citation: Kks. Lau et Kk. Gleason, Thermal annealing of fluorocarbon films grown by hot filament chemical vapor deposition, J PHYS CH B, 105(12), 2001, pp. 2303-2307

Authors: Lee, LS Gleason, KK
Citation: Ls. Lee et Kk. Gleason, Hot filament chemical vapor deposition of polyoxymethylene as a sacrificial layer for fabricating air gaps, EL SOLID ST, 4(11), 2001, pp. G81-G84

Authors: Lewis, HGP Weibel, GL Ober, CK Gleason, KK
Citation: Hgp. Lewis et al., E-beam patterning of hot-filament CVD fluorocarbon films using supercritical CO2 as a developer, CHEM VAPOR, 7(5), 2001, pp. 195

Authors: Lewis, HGP Caulfield, JA Gleason, KK
Citation: Hgp. Lewis et al., Perfluorooctane sulfonyl fluoride as an initiator in hot-filament chemicalvapor deposition of fluorocarbon thin films, LANGMUIR, 17(24), 2001, pp. 7652-7655

Authors: Lau, KKS Lewis, HGP Limb, SJ Kwan, MC Gleason, KK
Citation: Kks. Lau et al., Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films, THIN SOL FI, 395(1-2), 2001, pp. 288-291

Authors: Labelle, CB Gleason, KK
Citation: Cb. Labelle et Kk. Gleason, Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition, J APPL POLY, 80(11), 2001, pp. 2084-2092

Authors: Cruden, BA Gleason, KK Sawin, HH
Citation: Ba. Cruden et al., Time resolved ultraviolet absorption spectroscopy of pulsed fluorocarbon plasmas, J APPL PHYS, 89(2), 2001, pp. 915-922

Authors: Lewis, HGP Casserly, TB Gleason, KK
Citation: Hgp. Lewis et al., Hot-filament chemical vapor deposition of organosilicon thin films from hexamethylcyclotrisiloxane and octamethylcyclotetrasiloxane, J ELCHEM SO, 148(12), 2001, pp. F212-F220

Authors: Labelle, CB Gleason, KK
Citation: Cb. Labelle et Kk. Gleason, Overhang test structure deposition profiles of pulsed plasma fluorocarbon films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane, CHEM VAPOR, 6(1), 2000, pp. 27-32

Authors: Lewis, HGP Edell, DJ Gleason, KK
Citation: Hgp. Lewis et al., Pulsed-PECVD films from hexamethylcyclotrisiloxane for use as insulating biomaterials, CHEM MATER, 12(11), 2000, pp. 3488-3494

Authors: Lau, KKS Caulfield, JA Gleason, KK
Citation: Kks. Lau et al., Structure and morphology of fluorocarbon films grown by hot filament chemical vapor deposition, CHEM MATER, 12(10), 2000, pp. 3032-3037

Authors: Lau, KKS Caulfield, JA Gleason, KK
Citation: Kks. Lau et al., Variable angle spectroscopic ellipsometry of fluorocarbon films from hot filament chemical vapor deposition, J VAC SCI A, 18(5), 2000, pp. 2404-2411

Authors: Loo, LS Cohen, RE Gleason, KK
Citation: Ls. Loo et al., Chain mobility in the amorphous region of nylon 6 observed under active uniaxial deformation, SCIENCE, 288(5463), 2000, pp. 116-119

Authors: Loo, LS Cohen, RE Gleason, KK
Citation: Ls. Loo et al., Deuterium nuclear magnetic resonance of deuterium oxide in nylon 6 under active uniaxial deformation, POLYMER, 41(21), 2000, pp. 7699-7704

Authors: Lau, KKS Gleason, KK
Citation: Kks. Lau et Kk. Gleason, Pulsed plasma enhanced and hot filament chemical vapor deposition of fluorocarbon films, J FLUORINE, 104(1), 2000, pp. 119-126

Authors: Lau, KKS Gleason, KK Trout, BL
Citation: Kks. Lau et al., Thermochemistry of gas phase CF2 reactions: A density functional theory study, J CHEM PHYS, 113(10), 2000, pp. 4103-4108

Authors: Winder, EJ Gleason, KK
Citation: Ej. Winder et Kk. Gleason, Growth and characterization of fluorocarbon thin films grown from trifluoromethane (CHF3) using pulsed-plasma enhanced CVD, J APPL POLY, 78(4), 2000, pp. 842-849

Authors: Labelle, CB Gleason, KK
Citation: Cb. Labelle et Kk. Gleason, Fourier transform infrared spectroscopy study of thermal annealing behavior of ECR pulsed plasma deposited fluorocarbon thin films from 1,1,2,2-tetrafluoroethane, J ELCHEM SO, 147(2), 2000, pp. 678-681

Authors: Labelle, CB Karecki, SM Reif, R Gleason, KK
Citation: Cb. Labelle et al., Fourier transform infrared spectroscopy of effluents from pulsed plasmas of 1,1,2,2-tetrafluoroethane, hexafluoropropylene oxide, and difluoromethane, J VAC SCI A, 17(6), 1999, pp. 3419-3428

Authors: Labelle, CB Gleason, KK
Citation: Cb. Labelle et Kk. Gleason, Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHCIF2, J VAC SCI A, 17(2), 1999, pp. 445-452

Authors: Loo, LS Cohen, RE Gleason, KK
Citation: Ls. Loo et al., Deuterium nuclear magnetic resonance of Phenol-d(5) in nylon 6 under active uniaxial deformation, MACROMOLEC, 32(13), 1999, pp. 4359-4364

Authors: Labelle, CB Gleason, KK
Citation: Cb. Labelle et Kk. Gleason, Surface morphology of PECVD fluorocarbon thin films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane, J APPL POLY, 74(10), 1999, pp. 2439-2447

Authors: Lau, KKS Gleason, KK
Citation: Kks. Lau et Kk. Gleason, Solid-state nuclear magnetic resonance spectroscopy of low dielectric constant films from pulsed hydrofluorocarbon plasmas, J ELCHEM SO, 146(7), 1999, pp. 2652-2658

Authors: Banerjee, I Harker, M Wong, L Coon, PA Gleason, KK
Citation: I. Banerjee et al., Characterization of chemical vapor deposited amorphous fluorocarbons for low dielectric constant interlayer dielectrics, J ELCHEM SO, 146(6), 1999, pp. 2219-2224

Authors: Loo, LS Cohen, RE Gleason, KK
Citation: Ls. Loo et al., Correlation times of motion of deuterium oxide in polyamide 6 rods, MACROMOLEC, 31(25), 1998, pp. 8907-8911
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