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Results: 1-10 |
Results: 10
THE DEPOSITION OF TIN THIN-FILMS BY FILTERED CATHODIC ARC TECHNIQUES
Authors: MARTIN PJ BENDAVID A KINDER TJ
Citation: Pj. Martin et al., THE DEPOSITION OF TIN THIN-FILMS BY FILTERED CATHODIC ARC TECHNIQUES, IEEE transactions on plasma science, 25(4), 1997, pp. 675-679
THE DEPOSITION OF TIN THIN-FILMS BY NITROGEN ION-ASSISTED DEPOSITION OF TI FROM A FILTERED CATHODIC ARC SOURCE
Authors: MARTIN PJ BENDAVID A KINDER TJ WIELUNSKI L
Citation: Pj. Martin et al., THE DEPOSITION OF TIN THIN-FILMS BY NITROGEN ION-ASSISTED DEPOSITION OF TI FROM A FILTERED CATHODIC ARC SOURCE, Surface & coatings technology, 87-8(1-3), 1996, pp. 271-278
CONTROL OF FILM PROPERTIES DURING FILTERED ARC DEPOSITION
Authors: MARTIN PJ BENDAVID A KINDER TJ
Citation: Pj. Martin et al., CONTROL OF FILM PROPERTIES DURING FILTERED ARC DEPOSITION, Surface & coatings technology, 81(1), 1996, pp. 36-41
CHARACTERISTICS OF TIB2 FILMS PREPARED BY ION-BEAM SPUTTERING
Authors: WANG X MARTIN PJ KINDER TJ
Citation: X. Wang et al., CHARACTERISTICS OF TIB2 FILMS PREPARED BY ION-BEAM SPUTTERING, Surface & coatings technology, 78(1-3), 1996, pp. 37-41
CHARACTERIZATION OF THE OPTICAL-PROPERTIES AND COMPOSITION OF TINX THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY AND X-RAY PHOTOELECTRON-SPECTROSCOPY
Authors: BENDAVID A MARTIN PJ NETTERFIELD RP KINDER TJ
Citation: A. Bendavid et al., CHARACTERIZATION OF THE OPTICAL-PROPERTIES AND COMPOSITION OF TINX THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY AND X-RAY PHOTOELECTRON-SPECTROSCOPY, Surface and interface analysis, 24(9), 1996, pp. 627-633
THE MECHANICAL AND STRUCTURAL-PROPERTIES OF TI FILMS PREPARED BY FILTERED ARC DEPOSITION
Authors: BENDAVID A MARTIN PJ SMITH GB WIELUNSKI L KINDER TJ
Citation: A. Bendavid et al., THE MECHANICAL AND STRUCTURAL-PROPERTIES OF TI FILMS PREPARED BY FILTERED ARC DEPOSITION, Vacuum, 47(10), 1996, pp. 1179-1188
DEPOSITION AND MODIFICATION OF TITANIUM NITRIDE BY ION-ASSISTED ARE DEPOSITION
Authors: BENDAVID A MARTIN PJ WANG X WITTLING M KINDER TJ
Citation: A. Bendavid et al., DEPOSITION AND MODIFICATION OF TITANIUM NITRIDE BY ION-ASSISTED ARE DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 1658-1664
OPTICAL AND MECHANICAL-PROPERTIES OF CARBON NITRIDE FILMS PREPARED BYION-ASSISTED ARE DEPOSITION AND MAGNETRON SPUTTERING
Authors: WANG X MARTIN PJ KINDER TJ
Citation: X. Wang et al., OPTICAL AND MECHANICAL-PROPERTIES OF CARBON NITRIDE FILMS PREPARED BYION-ASSISTED ARE DEPOSITION AND MAGNETRON SPUTTERING, Thin solid films, 256(1-2), 1995, pp. 148-154
THE PROPERTIES OF TIN FILMS DEPOSITED BY FILTERED ARC EVAPORATION
Authors: BENDAVID A MARTIN PJ NETTERFIELD RP KINDER TJ
Citation: A. Bendavid et al., THE PROPERTIES OF TIN FILMS DEPOSITED BY FILTERED ARC EVAPORATION, Surface & coatings technology, 70(1), 1994, pp. 97-106
PROPERTIES OF THIN-FILMS OF TANTALUM OXIDE DEPOSITED BY ION-ASSISTED DEPOSITION
Authors: MARTIN PJ BENDAVID A SWAIN M NETTERFIELD RP KINDER TJ SAINTY WG DRAGE D WIELUNSKI L
Citation: Pj. Martin et al., PROPERTIES OF THIN-FILMS OF TANTALUM OXIDE DEPOSITED BY ION-ASSISTED DEPOSITION, Thin solid films, 239(2), 1994, pp. 181-185
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