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Results:
1-19
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Results: 19
Authors:
Rahtu, A
Kukli, K
Ritala, M
Citation: A. Rahtu et al., In situ mass spectrometry study on atomic layer deposition from metal (Ti,Ta, and Nb) ethoxides and water, CHEM MATER, 13(3), 2001, pp. 817-823
Authors:
Kukli, K
Aarik, J
Aidla, A
Forsgren, K
Sundqvist, J
Harsta, A
Uustare, T
Mandar, H
Kiisler, AA
Citation: K. Kukli et al., Atomic layer deposition of tantalum oxide thin films from iodide precursor, CHEM MATER, 13(1), 2001, pp. 122-128
Authors:
Schuisky, M
Aarik, J
Kukli, K
Aidla, A
Harsta, A
Citation: M. Schuisky et al., Atomic layer deposition of thin films using O-2 as oxygen source, LANGMUIR, 17(18), 2001, pp. 5508-5512
Authors:
Aarik, J
Aidla, A
Mandar, H
Uustare, T
Kukli, K
Schuisky, M
Citation: J. Aarik et al., Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures, APPL SURF S, 173(1-2), 2001, pp. 15-21
Authors:
Kukli, K
Forsgren, K
Aarik, J
Uustare, T
Aidla, A
Niskanen, A
Ritala, M
Leskela, M
Harsta, A
Citation: K. Kukli et al., Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide, J CRYST GR, 231(1-2), 2001, pp. 262-272
Authors:
Stromme, M
Niklasson, GA
Ritala, M
Leskela, M
Kukli, K
Citation: M. Stromme et al., (Ta1-xNbx)(2)O-5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I-V characteristics, J APPL PHYS, 90(9), 2001, pp. 4532-4542
Authors:
Kukli, K
Ritala, M
Leskela, M
Citation: K. Kukli et al., Development of dielectric properties of niobium oxide, tantalum oxide, andaluminum oxide based nanolayered materials, J ELCHEM SO, 148(2), 2001, pp. F35-F41
Authors:
Kukli, K
Forsgren, K
Ritala, M
Leskela, M
Aarik, J
Harsta, A
Citation: K. Kukli et al., Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor, J ELCHEM SO, 148(12), 2001, pp. F227-F232
Authors:
Kukli, K
Ritala, M
Leskela, M
Citation: K. Kukli et al., Low-temperature deposition of zirconium oxide-based nanocrystalline films by alternate supply of Zr[OC(CH3)(3)](4) and H2O, CHEM VAPOR, 6(6), 2000, pp. 297-302
Authors:
Kukli, K
Ritala, M
Schuisky, M
Leskela, M
Sajavaara, T
Keinonen, J
Uustare, T
Harsta, A
Citation: K. Kukli et al., Atomic layer deposition of titanium oxide from TiI4 and H2O2, CHEM VAPOR, 6(6), 2000, pp. 303-310
Authors:
Schuisky, M
Kukli, K
Ritala, M
Harsta, A
Leskela, M
Citation: M. Schuisky et al., Atomic layer CVD in the Bi-Ti-O system, CHEM VAPOR, 6(3), 2000, pp. 139-145
Authors:
Kukli, K
Ritala, M
Leskela, M
Citation: K. Kukli et al., Atomic layer deposition and chemical vapor deposition of tantalum oxide bysuccessive and simultaneous pulsing of tantalum ethoxide and tantalum chloride, CHEM MATER, 12(7), 2000, pp. 1914-1920
Authors:
Kukli, K
Aidla, A
Aarik, J
Schuisky, M
Harsta, A
Ritala, M
Leskela, M
Citation: K. Kukli et al., Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2, LANGMUIR, 16(21), 2000, pp. 8122-8128
Authors:
Ritala, M
Kukli, K
Rahtu, A
Raisanen, PI
Leskela, M
Sajavaara, T
Keinonen, J
Citation: M. Ritala et al., Atomic layer deposition of oxide thin films with metal alkoxides as oxygensources, SCIENCE, 288(5464), 2000, pp. 319-321
Authors:
Kukli, K
Ritala, M
Matero, R
Leskela, M
Citation: K. Kukli et al., Influence of atomic layer deposition parameters on the phase content of Ta2O5 films, J CRYST GR, 212(3-4), 2000, pp. 459-468
Authors:
Schuisky, M
Harsta, A
Aidla, A
Kukli, K
Kiisler, AA
Aarik, J
Citation: M. Schuisky et al., Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase, J ELCHEM SO, 147(9), 2000, pp. 3319-3325
Authors:
Ritala, M
Juppo, M
Kukli, K
Rahtu, A
Leskela, M
Citation: M. Ritala et al., In situ characterization of atomic layer deposition processes by a mass spectrometer, J PHYS IV, 9(P8), 1999, pp. 1021-1028
Authors:
Ritala, M
Kalsi, P
Riihela, D
Kukli, K
Leskela, M
Jokinen, J
Citation: M. Ritala et al., Controlled growth of TaN, Ta3N5, and TaOxNy thin films by atomic layer deposition, CHEM MATER, 11(7), 1999, pp. 1712-1718
Authors:
Kukli, K
Ritala, M
Leskela, M
Citation: K. Kukli et al., Properties of atomic layer deposited (Ta1-xNbx)(2)O-5 solid solution filmsand Ta2O5-Nb2O5 nanolaminates, J APPL PHYS, 86(10), 1999, pp. 5656-5662
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