AAAAAA
Results:
1-25
|
Results: 25
Authors:
LIDDLE JA
BLAKEY MI
KNUREK CS
MKRTCHYAN MM
NOVEMBRE AE
OCOLA L
SAUNDERS T
WASKIEWICZ WK
Citation: Ja. Liddle et al., SPACE-CHARGE LIMITATIONS TO THROUGHPUT IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL), Microelectronic engineering, 42, 1998, pp. 155-158
Authors:
WASKIEWICZ WK
HARRIOTT LR
LIDDLE JA
STANTON ST
BERGER SD
MUNRO E
ZHU X
Citation: Wk. Waskiewicz et al., ELECTRON-OPTICS METHOD FOR HIGH-THROUGHPUT IN A SCALPEL SYSTEM - PRELIMINARY-ANALYSIS, Microelectronic engineering, 42, 1998, pp. 215-218
Authors:
DICKS GA
ENGELSTAD RL
LOVELL EG
LIDDLE JA
Citation: Ga. Dicks et al., MECHANICAL MODELING OF PROJECTION ELECTRON-BEAM LITHOGRAPHY MASKS, JPN J A P 1, 36(12B), 1997, pp. 7564-7569
Authors:
ROSS FM
OSKAM G
SEARSON PC
MACAULAY JM
LIDDLE JA
Citation: Fm. Ross et al., CRYSTALLOGRAPHIC ASPECTS OF PORE FORMATION IN GALLIUM-ARSENIDE AND SILICON, Philosophical magazine. A. Physics of condensed matter. Structure, defects and mechanical properties, 75(2), 1997, pp. 525-539
Authors:
LIDDLE JA
FERNANDEZ AT
CIRELLI R
MKRTCHYAN MM
NOVEMBRE AE
PEABODY ML
WATSON GP
Citation: Ja. Liddle et al., PHOTON TUNNELING MICROSCOPY OF LATENT RESIST IMAGES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2162-2166
Authors:
FARROW RC
POSTEK MT
KEERY WJ
JONES SN
LOWNEY JR
BLAKEY M
FETTER LA
GRIFFITH JE
LIDDLE JA
HOPKINS LC
HUGGINS HA
PEABODY M
NOVEMBRE A
Citation: Rc. Farrow et al., APPLICATION OF TRANSMISSION ELECTRON DETECTION TO SCALPEL MASK METROLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2167-2172
Authors:
LIDDLE JA
BLAKEY MI
SAUNDERS T
FARROW RC
FETTER LA
KNUREK CS
KASICA R
NOVEMBRE AE
PEABODY ML
TENNANT DM
WINDT DL
POSTEK M
Citation: Ja. Liddle et al., METROLOGY OF SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2197-2203
Authors:
WATSON GP
FETTER LA
LIDDLE JA
Citation: Gp. Watson et al., DOSE MODIFICATION PROXIMITY EFFECT CORRECTION SCHEME WITH INHERENT FORWARD SCATTERING CORRECTIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2309-2312
Authors:
HARRIOTT LR
BERGER SD
BIDDICK C
BLAKEY MI
BOWLER SW
BRADY K
CAMARDA RM
CONNELLY WF
CRORKEN A
CUSTY J
DEMARCO R
FARROW RC
FELKER JA
FETTER L
FREEMAN R
HOPKINS L
HUGGINS HA
KNUREK CS
KRAUS JS
LIDDLE JA
MKRTYCHAN M
NOVEMBRE AE
PEABODY ML
TARASCON RG
WADE HH
WASKIEWICZ WK
WATSON GP
WERDER KS
WINDT D
Citation: Lr. Harriott et al., THE SCALPEL PROOF-OF-CONCEPT SYSTEM, Microelectronic engineering, 35(1-4), 1997, pp. 477-480
Authors:
HARRIOTT LR
BERGER SD
BIDDICK C
BLAKEY MI
BOWLER SW
BRADY K
CAMARDA RM
CONNELLY WF
CRORKEN A
CUSTY J
DIMARCO R
FARROW RC
FELKER JA
FETTER L
FREEMAN R
HOPKINS L
HUGGINS HA
KNUREK CS
KRAUS JS
LIDDLE JA
MKRTYCHAN M
NOVEMBRE AE
PEABODY ML
TARASCON RG
WADE HH
WASKIEWICZ WK
WATSON GP
WERDER KS
WINDT D
Citation: Lr. Harriott et al., PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3825-3828
Authors:
LIDDLE JA
BERGER SD
BIDDICK CJ
BLAKEY MI
BOLAN KJ
BOWLER SW
BRADY K
CAMARDA RM
CONNELLY WF
CRORKEN A
CUSTY J
FARROW RC
FELKER JA
FETTER LA
FREEMAN B
HARRIOTT LR
HOPKINS L
HUGGINS HA
KNUREK CS
KRAUS JS
MIXON DA
MKRTCHYAN MM
NOVEMBRE AE
PEABODY ML
SIMPSON WM
TARASCON RG
WADE HH
WASKIEWICZ WK
WATSON GP
WILLIAMS JK
WINDT DL
Citation: Ja. Liddle et al., THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM, JPN J A P 1, 34(12B), 1995, pp. 6663-6671
Authors:
LIDDLE JA
WATSON GP
BERGER SD
MILLER PD
Citation: Ja. Liddle et al., PROXIMITY EFFECT CORRECTION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY), JPN J A P 1, 34(12B), 1995, pp. 6672-6678
Authors:
HARRIOTT LR
BERGER SD
LIDDLE JA
WATSON GP
MKRTCHYAN MM
Citation: Lr. Harriott et al., SPACE-CHARGE EFFECTS IN PROJECTION CHARGED-PARTICLE LITHOGRAPHY SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2404-2408
Authors:
LIDDLE JA
HUGGINS HA
WATSON GP
Citation: Ja. Liddle et al., ERROR BUDGET ANALYSIS OF THE SCALPEL(R) MASK FOR SUB-0.2 MU-M LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2483-2487
Authors:
WATSON GP
BERGER SD
LIDDLE JA
WASKIEWICZ WK
Citation: Gp. Watson et al., A BACKGROUND DOSE PROXIMITY EFFECT CORRECTION TECHNIQUE FOR SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY IMPLEMENTED IN HARDWARE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2504-2507
Authors:
WATSON GP
BERGER SD
LIDDLE JA
FETTER LA
FARROW RC
TARASCON RG
MKRTCHYAN M
NOVEMBRE AE
BLAKEY MI
BOLAN KJ
POLI L
Citation: Gp. Watson et al., PRECISE MEASUREMENT OF THE EFFECTIVE BACKSCATTER COEFFICIENT FOR 100-KEV ELECTRON-BEAM LITHOGRAPHY ON SI, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2535-2538
Authors:
TARASCON RG
NOVEMBRE AE
BOLAN K
BLAKEY M
KNUREK C
FETTER L
HUGGINS HA
LIDDLE JA
NALAMASU O
Citation: Rg. Tarascon et al., LITHOGRAPHIC EVALUATION OF A POSITIVE-ACTING CHEMICALLY AMPLIFIED RESIST SYSTEM UNDER CONVENTIONAL AND PROJECTION ELECTRON-BEAM EXPOSURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2975-2979
Authors:
MKRTCHYAN MM
LIDDLE JA
BERGER SD
HARRIOTT LR
GIBSON JM
SCHWARTZ AM
Citation: Mm. Mkrtchyan et al., STOCHASTIC SCATTERING IN CHARGED-PARTICLE PROJECTION SYSTEMS - A NEAREST-NEIGHBOR APPROACH, Journal of applied physics, 78(12), 1995, pp. 6888-6902
Authors:
TARASCON RG
BOLAN K
BLAKEY M
CAMARDA RM
FARROW RC
FETTER LA
HUGGINS HA
KRAUS JS
LIDDLE JA
MIXON DA
NOVEMBRE AE
WATSON GP
BERGER SD
Citation: Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448
Authors:
MKRTCHYAN MM
LIDDLE JA
BERGER SD
HARRIOTT LR
SCHWARTZ AM
GIBSON JM
Citation: Mm. Mkrtchyan et al., AN ANALYTICAL MODEL OF STOCHASTIC INTERACTION EFFECTS IN PROJECTION SYSTEMS USING A NEAREST-NEIGHBOR APPROACH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3508-3512
Authors:
LIDDLE JA
VOLKERT CA
Citation: Ja. Liddle et Ca. Volkert, STRESS-INDUCED PATTERN-PLACEMENT ERRORS IN THIN MEMBRANE MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3528-3532
Authors:
FARROW RC
LIDDLE JA
BERGER SD
HUGGINS HA
KRAUS JS
CAMARDA RM
TARASCON RG
JURGENSEN CW
KOLA RR
FETTER L
Citation: Rc. Farrow et al., MARKS FOR ALIGNMENT AND REGISTRATION IN PROJECTION ELECTRON LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2175-2178
Authors:
BERGER SD
EAGLESHAM DJ
FARROW RC
FREEMAN RR
KRAUS JS
LIDDLE JA
Citation: Sd. Berger et al., PARTICLE-PARTICLE INTERACTION EFFECTS IN IMAGE PROJECTION LITHOGRAPHYSYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2294-2298
Authors:
MILLER PD
GIBSON JM
BIEEKER AJ
LIDDLE JA
Citation: Pd. Miller et al., LABORATORY SETUP FOR PROJECTION ELECTRON LITHOGRAPHY AND A MONTE-CARLO SIMULATION OF SCATTERING MASK TRANSMISSION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2352-2356
Authors:
SMITH SJ
LIDDLE JA
Citation: Sj. Smith et Ja. Liddle, QUALITY ASSURANCE CRITERIA FOR CHEMICAL-AGENT MONITORING AT MUNITIONSDEMILITARIZATION SITES, Journal of safety research, 24(4), 1993, pp. 243-254
Risultati:
1-25
|