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Results: 1-17 |
Results: 17
USE OF ATTENUATED PHASE MASKS IN EXTREME-ULTRAVIOLET LITHOGRAPHY
Authors: WOOD OR WHITE DL BJORKHOLM JE FETTER LE TENNANT DM MACDOWELL AA LAFONTAINE B KUBIAK GD
Citation: Or. Wood et al., USE OF ATTENUATED PHASE MASKS IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2448-2451
AT-WAVELENGTH INTERFEROMETRY FOR EXTREME-ULTRAVIOLET LITHOGRAPHY
Authors: TEJNIL E GOLDBERG KA LEE SH MEDECKI H BATSON PJ DENHAM PE MACDOWELL AA BOKOR J ATTWOOD D
Citation: E. Tejnil et al., AT-WAVELENGTH INTERFEROMETRY FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2455-2461
INITIAL RESULTS FROM AN EXTREME-ULTRAVIOLET INTERFEROMETER OPERATING WITH A COMPACT LASER-PLASMA SOURCE
Authors: RAYCHAUDHURI AK KRENZ KD NISSEN RP HANEY SJ FIELDS CH SWEATT WC MACDOWELL AA
Citation: Ak. Raychaudhuri et al., INITIAL RESULTS FROM AN EXTREME-ULTRAVIOLET INTERFEROMETER OPERATING WITH A COMPACT LASER-PLASMA SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3964-3968
PHASE-MEASURING INTERFEROMETRY USING EXTREME-ULTRAVIOLET RADIATION
Authors: BJORKHOLM JE MACDOWELL AA WOOD OR TAN Z LAFONTAINE B TENNANT DM
Citation: Je. Bjorkholm et al., PHASE-MEASURING INTERFEROMETRY USING EXTREME-ULTRAVIOLET RADIATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2919-2922
MODIFICATION OF THE COHERENCE OF UNDULATOR RADIATION
Authors: WHITE DL WOOD OR BJORKHOLM JE SPECTOR S MACDOWELL AA LAFONTAINE B
Citation: Dl. White et al., MODIFICATION OF THE COHERENCE OF UNDULATOR RADIATION, Review of scientific instruments, 66(2), 1995, pp. 1930-1933
AT-WAVELENGTH METROLOGY OF 13-NM LITHOGRAPHY IMAGING OPTICS
Authors: TAN ZQ MACDOWELL AA LAFONTAINE B BJORKHOLM JE TENNANT D TAYLOR D HIMEL M FREEMAN RR WASKIEWICZ WK WINDT DL SPECTOR S RAYCHAUDHURI AK STULEN RH NG W CERRINA F
Citation: Zq. Tan et al., AT-WAVELENGTH METROLOGY OF 13-NM LITHOGRAPHY IMAGING OPTICS, Review of scientific instruments, 66(2), 1995, pp. 2241-2243
SUBMICRON, SOFT-X-RAY FLUORESCENCE IMAGING
Authors: LAFONTAINE B MACDOWELL AA TAN ZQ WHITE DL TAYLOR GN WOOD OR BJORKHOLM JE TENNANT DM HULBERT SL
Citation: B. Lafontaine et al., SUBMICRON, SOFT-X-RAY FLUORESCENCE IMAGING, Applied physics letters, 66(3), 1995, pp. 282-284
REAL-TIME OBSERVATIONS OF EXTREME-ULTRAVIOLET AERIAL IMAGES BY FLUORESCENCE MICROIMAGING
Authors: LAFONTAINE B WHITE DL WOOD OR MACDOWELL AA TAN ZQ TAYLOR GN TENNANT DM HULBERT SL
Citation: B. Lafontaine et al., REAL-TIME OBSERVATIONS OF EXTREME-ULTRAVIOLET AERIAL IMAGES BY FLUORESCENCE MICROIMAGING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3576-3579
CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY
Authors: KUBIAK GD TICHENOR DA RAYCHAUDHURI AK MALINOWSKI ME STULEN RH HANEY SJ BERGER KW NISSEN RP WILKERSON GA PAUL PH BJORKHOLM JE FETTER LA FREEMAN RR HIMEL MD MACDOWELL AA TENNANT DM WOOD OR WASKIEWICZ WK WHITE DL WINDT DL JEWELL TE
Citation: Gd. Kubiak et al., CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3820-3825
WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY
Authors: WOOD OR BJORKHOLM JE FETTER L HIMEL MD TENNANT DM MACDOWELL AA LAFONTAINE B GRIFFITH JE TAYLOR GN WASKIEWICZ WK WINDT DL KORTRIGHT JB GULLIKSON EK NGUYEN K
Citation: Or. Wood et al., WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3841-3845
FIXED-FREQUENCY AND THRESHOLD PHOTOELECTRON-SPECTROSCOPY OF MOLECULARCORE LEVELS USING SYNCHROTRON-RADIATION
Authors: POTTS AW FHADIL HF BENSON JM HILLIER IH MACDOWELL AA JONES S
Citation: Aw. Potts et al., FIXED-FREQUENCY AND THRESHOLD PHOTOELECTRON-SPECTROSCOPY OF MOLECULARCORE LEVELS USING SYNCHROTRON-RADIATION, Journal of physics. B, Atomic molecular and optical physics, 27(3), 1994, pp. 473-480
PROJECTION X-RAY-LITHOGRAPHY WITH ULTRATHIN IMAGING LAYERS AND SELECTIVE ELECTROLESS METALLIZATION
Authors: CALVERT JM KOLOSKI TS DRESSICK WJ DULCEY CS PECKERAR MC CERRINA F TAYLOR JW SUH DW WOOD OR MACDOWELL AA DSOUZA R
Citation: Jm. Calvert et al., PROJECTION X-RAY-LITHOGRAPHY WITH ULTRATHIN IMAGING LAYERS AND SELECTIVE ELECTROLESS METALLIZATION, Optical engineering, 32(10), 1993, pp. 2437-2445
SYNCHROTRON-RADIATION SOURCES AND CONDENSERS FOR PROJECTION X-RAY-LITHOGRAPHY
Authors: MURPHY JB WHITE DL MACDOWELL AA WOOD OR
Citation: Jb. Murphy et al., SYNCHROTRON-RADIATION SOURCES AND CONDENSERS FOR PROJECTION X-RAY-LITHOGRAPHY, Applied optics, 32(34), 1993, pp. 6920-6929
MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM
Authors: TENNANT DM FETTER LA HARRIOTT LR MACDOWELL AA MULGREW PP PASTALAN JZ WASKIEWICZ WK WINDT DL WOOD OR
Citation: Dm. Tennant et al., MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM, Applied optics, 32(34), 1993, pp. 7007-7011
CHARACTERIZATION OF AZ PN114 RESIST FOR SOFT-X-RAY PROJECTION LITHOGRAPHY
Authors: EARLY K TENNANT DM JEON DY MULGREW PP MACDOWELL AA WOOD OR KUBIAK GD TICHENOR DA
Citation: K. Early et al., CHARACTERIZATION OF AZ PN114 RESIST FOR SOFT-X-RAY PROJECTION LITHOGRAPHY, Applied optics, 32(34), 1993, pp. 7044-7049
SOFT-X-RAY PROJECTION LITHOGRAPHY EXPERIMENTS USING SCHWARZSCHILD IMAGING OPTICS
Authors: TICHENOR DA KUBIAK GD MALINOWSKI ME STULEN RH HANEY SJ BERGER KW BROWN LA SWEATT WC BJORKHOLM JE FREEMAN RR HIMEL MD MACDOWELL AA TENNANT DM WOOD OR BOKOR J JEWELL TE MANSFIELD WM WASKIEWICZ WK WHITE DL WINDT DL
Citation: Da. Tichenor et al., SOFT-X-RAY PROJECTION LITHOGRAPHY EXPERIMENTS USING SCHWARZSCHILD IMAGING OPTICS, Applied optics, 32(34), 1993, pp. 7068-7071
SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/
Authors: MACDOWELL AA BJORKHOLM JE EARLY K FREEMAN RR HIMEL MD MULGREW PP SZETO LH TAYLOR DW TENNANT DM WOOD OR BOKOR J EICHNER L JEWELL TE WASKIEWICZ WK WHITE DL WINDT DL DSOUZA RM SILFVAST WT ZERNIKE F
Citation: Aa. Macdowell et al., SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/, Applied optics, 32(34), 1993, pp. 7072-7078
Risultati: 1-17 |