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Results: 1-9 |
Results: 9
INTERELECTRODE SEPARATION EFFECTS ON A-SIGE-H FILMS PREPARED BY PLASMA CHEMICAL-VAPOR-DEPOSITION
Authors: SALI JV RASHAD A MARATHE BR TAKWALE MG GANGURDE KD SHALIGRAM AD
Citation: Jv. Sali et al., INTERELECTRODE SEPARATION EFFECTS ON A-SIGE-H FILMS PREPARED BY PLASMA CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 322(1-2), 1998, pp. 1-5
PREPARATION OF HIGHLY CONDUCTIVE P-TYPE MU-C-SI-H WINDOW LAYER USING LOWER CONCENTRATION OF HYDROGEN IN THE RF GLOW-DISCHARGE PLASMA
Authors: SALI JV PANASKAR VD TAKWALE MG MARATHE BR BHIDE VG
Citation: Jv. Sali et al., PREPARATION OF HIGHLY CONDUCTIVE P-TYPE MU-C-SI-H WINDOW LAYER USING LOWER CONCENTRATION OF HYDROGEN IN THE RF GLOW-DISCHARGE PLASMA, Solar energy materials and solar cells, 45(4), 1997, pp. 413-421
INFLUENCE OF ANNEALING ON EVAPORATED INDIUM OXIDE THIN-FILMS
Authors: ROZATI SM MIRZAPOUR S TAKWALE MG MARATHE BR BHIDE VG
Citation: Sm. Rozati et al., INFLUENCE OF ANNEALING ON EVAPORATED INDIUM OXIDE THIN-FILMS, Materials chemistry and physics, 36(3-4), 1994, pp. 252-255
INFLUENCE OF DIFFERENT PROCESS PARAMETERS ON PHYSICAL-PROPERTIES OF FLUORINE-DOPED INDIUM OXIDE THIN-FILMS
Authors: MIRZAPOUR S ROZATI SM TAKWALE MG MARATHE BR BHIDE VG
Citation: S. Mirzapour et al., INFLUENCE OF DIFFERENT PROCESS PARAMETERS ON PHYSICAL-PROPERTIES OF FLUORINE-DOPED INDIUM OXIDE THIN-FILMS, Journal of Materials Science, 29(3), 1994, pp. 700-707
EFFECT OF POSTDEPOSITION HEAT-TREATMENT ON PHYSICAL-PROPERTIES OF TINOXIDE THIN-FILMS PREPARED BY AN ELECTRON-BEAM EVAPORATION TECHNIQUE
Authors: ROZATI SM MIRZAPOUR S TAKWALE MG MARATHE BR BHIDE VG
Citation: Sm. Rozati et al., EFFECT OF POSTDEPOSITION HEAT-TREATMENT ON PHYSICAL-PROPERTIES OF TINOXIDE THIN-FILMS PREPARED BY AN ELECTRON-BEAM EVAPORATION TECHNIQUE, Journal of materials science letters, 12(12), 1993, pp. 949-951
CHARACTERIZATION OF AS-DEPOSITED AND ANNEALED INDIUM OXIDE THIN-FILMS
Authors: ROZATI SM MIRZAPOUR S TAKWALE MG MARATHE BR BHIDE VG
Citation: Sm. Rozati et al., CHARACTERIZATION OF AS-DEPOSITED AND ANNEALED INDIUM OXIDE THIN-FILMS, Materials chemistry and physics, 34(2), 1993, pp. 119-122
INFLUENCE OF AIR-FLOW RATE ON STRUCTURAL AND ELECTRICAL-PROPERTIES OFUNDOPED INDIUM OXIDE THIN-FILMS
Authors: MIRZAPOUR S ROZATI SM TAKWALE MG MARATHE BR BHIDE VG
Citation: S. Mirzapour et al., INFLUENCE OF AIR-FLOW RATE ON STRUCTURAL AND ELECTRICAL-PROPERTIES OFUNDOPED INDIUM OXIDE THIN-FILMS, Materials chemistry and physics, 33(3-4), 1993, pp. 204-207
INFLUENCE OF FILM THICKNESS AND SUBSTRATE ON THE GROWTH OF SPRAYED SNO(2) - F FILMS
Authors: AGASHE C MARATHE BR
Citation: C. Agashe et Br. Marathe, INFLUENCE OF FILM THICKNESS AND SUBSTRATE ON THE GROWTH OF SPRAYED SNO(2) - F FILMS, Journal of physics. D, Applied physics, 26(11), 1993, pp. 2049-2054
EFFECT OF DOPANT INCORPORATION ON STRUCTURAL AND ELECTRICAL-PROPERTIES OF SPRAYED SNO2-SB FILMS
Authors: GOYAL DJ AGASHE C MARATHE BR TAKWALE MG BHIDE VG
Citation: Dj. Goyal et al., EFFECT OF DOPANT INCORPORATION ON STRUCTURAL AND ELECTRICAL-PROPERTIES OF SPRAYED SNO2-SB FILMS, Journal of applied physics, 73(11), 1993, pp. 7520-7523
Risultati: 1-9 |