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Results:
1-7
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Results: 7
Authors:
ANGERMEIER D
MONNA R
BOURDAIS S
SLAOUI A
MULLER JC
Citation: D. Angermeier et al., THIN-FILM SILICON FORMATION ON FOREIGN SUBSTRATES BY RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION FOR PHOTOVOLTAIC APPLICATION, Progress in photovoltaics, 6(4), 1998, pp. 219-231
Authors:
SLAOUI A
MONNA R
POORTMANS J
VERMEULEN T
EVRARD O
SAID K
NIJS J
Citation: A. Slaoui et al., CRYSTALLINE SILICON THIN-FILMS - A PROMISING APPROACH FOR PHOTOVOLTAICS, Journal of materials research, 13(10), 1998, pp. 2763-2774
Authors:
PAILLOUX F
MATHE EL
GAREM H
GABORIAUD RJ
MONNA R
MULLER JC
Citation: F. Pailloux et al., OPTICAL AND DIGITAL PROCESSING OF HRTEM IMAGES OF SI THIN-FILMS DEPOSITED BY RTCVD, Thin solid films, 319(1-2), 1998, pp. 177-181
Authors:
ANGERMEIER D
MONNA R
SLAOUI A
MULLER JC
Citation: D. Angermeier et al., ANALYSIS OF THIN-FILM POLYSILICON ON GRAPHITE SUBSTRATES DEPOSITED INA THERMAL CVD SYSTEM, Journal of crystal growth, 191(3), 1998, pp. 386-392
Authors:
ANGERMEIER D
MONNA R
SLAOUI A
MULLER JC
Citation: D. Angermeier et al., MODELING AND ANALYSIS OF THE SILICON EPITAXIAL-GROWTH WITH SIHCL3 IN A HORIZONTAL RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of the Electrochemical Society, 144(9), 1997, pp. 3256-3261
Authors:
LACHIQ A
SLAOUI A
GEORGOPOULOS L
VENTURA L
MONNA R
MULLER JC
Citation: A. Lachiq et al., SIMULTANEOUS DOPANT DIFFUSION AND SURFACE PASSIVATION IN A SINGLE RAPID THERMAL CYCLE, Progress in photovoltaics, 4(5), 1996, pp. 329-339
Authors:
MONNA R
SLAOUI A
LACHIQ A
MULLER JC
Citation: R. Monna et al., SILICON THIN-FILMS OBTAINED BY RAPID THERMAL ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION, Materials science & engineering. B, Solid-state materials for advanced technology, 39(1), 1996, pp. 48-51
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