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Results: 1-25 | 26-28
Results: 1-25/28

Authors: Pons, M Meziere, J Dedulle, JM Kuan, SWT Blanquet, E Bernard, C Ferret, P Di Cioccio, L Billon, T Madar, R
Citation: M. Pons et al., Simulation of the large-area growth of homoepitaxial 4H-SiC by chemical vapor deposition, J PHYS IV, 11(PR3), 2001, pp. 1079-1086

Authors: Hassen, F M'Ghaieth, R Maaref, H Madar, R
Citation: F. Hassen et al., Morphological and optical characterization of porous silicon carbide, MAT SCI E C, 15(1-2), 2001, pp. 113-115

Authors: Chenevier, B Chaix-Pluchery, O Matko, I Madar, R La Via, F
Citation: B. Chenevier et al., Structural investigations of the C49-C54 transformation in TiSi2 thin films, MICROEL ENG, 55(1-4), 2001, pp. 115-122

Authors: Proust, M Judong, F Gilet, JM Liauzu, L Madar, R
Citation: M. Proust et al., CVD and PVD copper integration for dual damascene metallization in a 0.18 mu m process, MICROEL ENG, 55(1-4), 2001, pp. 269-275

Authors: Pernot, E Pernot-Rejmankova, P Anikin, M Pelissier, B Moulin, C Madar, R
Citation: E. Pernot et al., Structural defects in SiC ingots investigated by synchrotron diffraction imaging, J PHYS D, 34(10A), 2001, pp. A136-A139

Authors: Chenevier, B Chaix-Pluchery, O Matko, I Senateur, JP Madar, R La Via, F
Citation: B. Chenevier et al., In situ investigations of the metal/silicon reaction in Ti/Si thin films capped with TiN: Volumetric analysis of the C49-C54 transformation, APPL PHYS L, 79(14), 2001, pp. 2184-2186

Authors: Madar, R Pons, M
Citation: R. Madar et M. Pons, Crystallogenesis of silicon carbide: Principles, development, characterization and modeling, VIDE, 55(298), 2000, pp. 325

Authors: Ramberg, CE Blanquet, E Pons, M Bernard, C Madar, R
Citation: Ce. Ramberg et al., Application of equilibrium thermodynamics to the development of diffusion barriers for copper metallization - (invited), MICROEL ENG, 50(1-4), 2000, pp. 357-368

Authors: Pons, M Bernard, C Branquet, E Madar, R
Citation: M. Pons et al., Combined thermodynamic and mass transport modeling for material processingfrom the vapor phase, THIN SOL FI, 365(2), 2000, pp. 264-274

Authors: Grabarnik, M Lemcoff, NG Madar, R Abramson, S Weinman, S Fuchs, B
Citation: M. Grabarnik et al., On five- vs six-membered diacetal formation from threitol and the intermediacy of unusually stable protonated species, J ORG CHEM, 65(6), 2000, pp. 1636-1642

Authors: Jimenez, C Paillous, M Madar, R Senateur, JP Jones, AC
Citation: C. Jimenez et al., Deposition of Ta2O5 and (TiO2)-(Ta2O5) films from Ta(OEt)(4)(DMAE) and Ti(OEt)(2)(DMAE)(2), by IMOCVD, J PHYS IV, 9(P8), 1999, pp. 569-573

Authors: de Caro, D Brissonneau, L Boursier, D Madar, R Vahlas, C
Citation: D. De Caro et al., Composition and magnetic properties of MOCVD processed thin films from nickelocene, J PHYS IV, 9(P8), 1999, pp. 1099-1106

Authors: Pisch, A Blanquet, E Pons, M Bernard, C Anikin, M Dedulle, JM Madar, R
Citation: A. Pisch et al., Modelling of SiC sublimation growth process: Influence of experimental parameters on crystal shape, J PHYS IV, 9(P8), 1999, pp. 213-219

Authors: Brissonneau, L de Caro, D Boursier, D Madar, R Vahlas, C
Citation: L. Brissonneau et al., MOCVD-processed Ni films from nickelocene. Part II: Carbon content of the deposits, CHEM VAPOR, 5(4), 1999, pp. 143-149

Authors: Anderbouhr, S Gilles, S Blanquet, E Bernard, C Madar, R
Citation: S. Anderbouhr et al., Thermodynamic modeling of the Ti-Al-N system and application to the simulation of CVD processes of the (Ti,Al)N metastable phase, CHEM VAPOR, 5(3), 1999, pp. 109-115

Authors: Pons, M Anikin, M Chourou, K Dedulle, JM Madar, R Blanquet, E Pisch, A Bernard, C Grosse, P Faure, C Basset, G Grange, Y
Citation: M. Pons et al., State of the art in the modelling of SiC sublimation growth, MAT SCI E B, 61-2, 1999, pp. 18-28

Authors: Grosse, P Basset, G Calvat, C Couchaud, M Faure, C Ferrand, B Grange, Y Anikin, M Bluet, JM Chourou, K Madar, R
Citation: P. Grosse et al., Influence of reactor cleanness and process conditions on the growth by PVTand the purity of 4H and 6H SiC crystals, MAT SCI E B, 61-2, 1999, pp. 58-62

Authors: Milita, S Madar, R Baruchel, J Anikin, M Argunova, T
Citation: S. Milita et al., Coherent X-ray imaging investigation of macrodefects and micropipes on SiC, MAT SCI E B, 61-2, 1999, pp. 63-67

Authors: Anikin, M Chourou, K Pons, M Bluet, JM Madar, R Grosse, P Faure, C Basset, G Grange, Y
Citation: M. Anikin et al., Influence of growth conditions on the defect formation in SiC ingots, MAT SCI E B, 61-2, 1999, pp. 73-76

Authors: Chourou, K Anikin, M Bluet, JM Dedulle, JM Madar, R Pons, M Blanquet, E Bernard, C Grosse, P Faure, C Basset, G Grange, Y
Citation: K. Chourou et al., Modelling of SiC sublimation growth process: analyses of macrodefects formation, MAT SCI E B, 61-2, 1999, pp. 82-85

Authors: Bluet, JM Chourou, K Anikin, M Madar, R
Citation: Jm. Bluet et al., Weak phonon modes observation using infrared reflectivity for 4H, 6H and 15R polytypes, MAT SCI E B, 61-2, 1999, pp. 212-216

Authors: Lauer, V Bremond, G Souifi, A Guillot, G Chourou, K Anikin, M Madar, R Clerjaud, B Naud, C
Citation: V. Lauer et al., Electrical and optical characterisation of vanadium in 4H and 6H-SiC, MAT SCI E B, 61-2, 1999, pp. 248-252

Authors: Camassel, J Juillaguet, S Planes, N Raymond, A Grosse, P Basset, G Faure, C Couchaud, M Bluet, JM Chourou, K Anikin, M Madar, R
Citation: J. Camassel et al., Optical assessment of purity improvement effects in bulk 6H and 4H-SiC wafers grown by physical vapor transport, MAT SCI E B, 61-2, 1999, pp. 258-264

Authors: Bernard, C Pons, M Blanquet, E Madar, R
Citation: C. Bernard et al., Thermodynamic calculations as the basis for CVD production of silicide coatings, MRS BULL, 24(4), 1999, pp. 27-31

Authors: Kreisel, J Chaix-Pluchery, O Perrier, C Vincent, H Lucazeau, G Madar, R
Citation: J. Kreisel et al., Vibrational spectra of transition metal phosphosilicides MSi4P4 (M = Fe, Ru, Os), J RAMAN SP, 30(5), 1999, pp. 417-420
Risultati: 1-25 | 26-28