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Results: 1-17 |
Results: 17
Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system
Authors: Liddle, JA Blakey, MI Bolan, K Farrow, RC Gallatin, GM Kasica, R Katsap, V Knurek, CS Li, J Mkrtchyan, M Novembre, AE Ocola, L Orphanos, PA Peabody, ML Stanton, ST Teffeau, K Waskiewicz, WK Munro, E
Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481
Roughness study of a positive tone high performance SCALPEL resist
Authors: Ocola, LE Orphanos, PA Li, WY Waskiewicz, W Novembre, AE Sato, M
Citation: Le. Ocola et al., Roughness study of a positive tone high performance SCALPEL resist, J VAC SCI B, 18(6), 2000, pp. 3435-3440
SCALPEL aerial image monitoring: Principles and application to space charge
Authors: Gallatin, GM Farrow, RC Liddle, JA Waskiewicz, WK Mkrtchyan, MM Orphanos, P Felker, J Kraus, J Biddick, CJ Stanton, S Novembre, AE Blakey, M
Citation: Gm. Gallatin et al., SCALPEL aerial image monitoring: Principles and application to space charge, J VAC SCI B, 18(5), 2000, pp. 2560-2564
Monte Carlo study of High performance resists for SCALPEL nanolithography
Authors: Ocola, LE Li, WY Kasica, RJ Blakey, MI Orphanos, PA Waskiewicz, WK Novembre, AE Sato, M
Citation: Le. Ocola et al., Monte Carlo study of High performance resists for SCALPEL nanolithography, MICROEL ENG, 53(1-4), 2000, pp. 433-436
Thin film stress mapping using an integrated sensor
Authors: Schlax, MP Jachim, AF Engelsad, RL Lovell, EG Liddle, JA Novembre, AE
Citation: Mp. Schlax et al., Thin film stress mapping using an integrated sensor, J VAC SCI B, 17(6), 1999, pp. 2714-2718
Characteristics for negative and positive tone resists with direct write electron beam and SCALPEL exposure systems
Authors: Sato, M Ocala, LE Novembre, AE Ohmori, K Ishikawa, K Katsumata, K Nakayama, T
Citation: M. Sato et al., Characteristics for negative and positive tone resists with direct write electron beam and SCALPEL exposure systems, J VAC SCI B, 17(6), 1999, pp. 2873-2877
Mechanical and thermal modeling of the SCALPEL mask
Authors: Martin, CJ Semke, WH Dicks, GA Engelstad, RL Lovell, EG Liddle, JA Novembre, AE
Citation: Cj. Martin et al., Mechanical and thermal modeling of the SCALPEL mask, J VAC SCI B, 17(6), 1999, pp. 2878-2882
Determination of the possible magnitude of the charging effect in a SCALPEL mask membrane
Authors: Mkrtchyan, MM Gasparyan, AS Mkhoyan, KA Liddle, JA Novembre, AE
Citation: Mm. Mkrtchyan et al., Determination of the possible magnitude of the charging effect in a SCALPEL mask membrane, J VAC SCI B, 17(6), 1999, pp. 2888-2892
Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks
Authors: Spector, SJ White, DL Tennant, DM Ocola, LE Novembre, AE Peabody, ML Wood, OR
Citation: Sj. Spector et al., Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks, J VAC SCI B, 17(6), 1999, pp. 3003-3008
Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography
Authors: Reichmanis, E Nalamasu, O Houlihan, FM Novembre, AE
Citation: E. Reichmanis et al., Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography, POLYM INT, 48(10), 1999, pp. 1053-1059
SCALPEL mask defect imaging analysis
Authors: Stanton, ST Liddle, JA Novembre, AE Mkrtchyan, MM
Citation: St. Stanton et al., SCALPEL mask defect imaging analysis, MICROEL ENG, 46(1-4), 1999, pp. 227-230
Pattern processing results and characteristics for SCALPEL masks
Authors: Novembre, AE Blakey, MI Farrow, RC Kasica, RJ Knurek, CS Liddle, JA Peabody, ML
Citation: Ae. Novembre et al., Pattern processing results and characteristics for SCALPEL masks, MICROEL ENG, 46(1-4), 1999, pp. 271-274
Critical dimension control at stitched subfield boundaries in a high-throughput SCALPEL((R)) system
Authors: Stanton, ST Liddle, JA Waskiewicz, WK Novembre, AE
Citation: St. Stanton et al., Critical dimension control at stitched subfield boundaries in a high-throughput SCALPEL((R)) system, J VAC SCI B, 16(6), 1998, pp. 3197-3201
Electron scattering and transmission through SCALPEL masks
Authors: Mkrtchyan, MM Liddle, JA Novembre, AE Waskiewicz, WK Watson, GP Harriott, LR Muller, DA
Citation: Mm. Mkrtchyan et al., Electron scattering and transmission through SCALPEL masks, J VAC SCI B, 16(6), 1998, pp. 3385-3391
Commercialization of SCALPEL masks
Authors: Farrow, RC Novembre, AE Peabody, M Kasica, R Blakey, M Liddle, JA Werder, K DeMarco, R Ocola, L Rutberg, L Saunders, T Unruh, J Qian, F Smith, M
Citation: Rc. Farrow et al., Commercialization of SCALPEL masks, J VAC SCI B, 16(6), 1998, pp. 3582-3586
Quantitation of latent resist images using photon tunneling microscopy
Authors: Liddle, JA Johnson, JA Cirelli, R Mkrtchyan, MM Novembre, AE Peabody, ML
Citation: Ja. Liddle et al., Quantitation of latent resist images using photon tunneling microscopy, J VAC SCI B, 16(6), 1998, pp. 3651-3654
Negative chemically amplified resist characterization for direct write andSCALPEL nanolithography
Authors: Ocola, LE Biddick, CJ Tennant, DM Waskiewicz, WK Novembre, AE
Citation: Le. Ocola et al., Negative chemically amplified resist characterization for direct write andSCALPEL nanolithography, J VAC SCI B, 16(6), 1998, pp. 3705-3708
Risultati: 1-17 |