Authors:
Chung, GY
Tin, CC
Williams, JR
McDonald, K
Chanana, RK
Weller, RA
Pantelides, ST
Feldman, LC
Holland, OW
Das, MK
Palmour, JW
Citation: Gy. Chung et al., Improved inversion channel mobility for 4H-SiC MOSFETs following high temperature anneals in nitric oxide, IEEE ELEC D, 22(4), 2001, pp. 176-178
Authors:
Dyakonova, NV
Ivanov, PA
Kozlov, VA
Levinshtein, ME
Palmour, JW
Rumyantsev, SL
Singh, R
Citation: Nv. Dyakonova et al., Steady-state and transient forward current-voltage characteristics of 4H-silicon carbide 5.5 kV diodes at high and superhigh current densities, IEEE DEVICE, 46(11), 1999, pp. 2188-2194