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Results: 5

Authors: REEVES CM TURCU ICE STEVENSON JTM ROSS AWS GUNDLACH AM PREWETT P LAWES RA ANASTASI P BURGE R MICHELL P
Citation: Cm. Reeves et al., FABRICATION OF 200NM FIELD-EFFECT TRANSISTORS BY X-RAY-LITHOGRAPHY USING A LASER-PLASMA X-RAY SOURCE, Microelectronic engineering, 30(1-4), 1996, pp. 187-190

Authors: TURCU ICE REEVES CM STEVENSON JTM ROSS AWS GUNDLACH AM PREWETT P ANASTASI P KOEK B MITCHELL P LAKE P
Citation: Ice. Turcu et al., 180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE, Microelectronic engineering, 27(1-4), 1995, pp. 295-298

Authors: REEVES CM TURCU ICE PREWETT PD GUNDLACH AM STEVENSON JT WALTON AJ ROSS AWS LAWES RA ANASTASI P BURGE R MITCHELL P
Citation: Cm. Reeves et al., FABRICATION OF 200 NM FIELD-EFFECT TRANSISTOR BY X-RAY-LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE, Electronics Letters, 31(25), 1995, pp. 2218-2219

Authors: REEVES CM WIND SJ HOHN FJ BUCCHIGNANO JJ LII YT KLAUS DP
Citation: Cm. Reeves et al., FABRICATION AND CHARACTERIZATION OF COMPACT 100NM SCALE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS, Microelectronic engineering, 21(1-4), 1993, pp. 409-418

Authors: WALTON AJ FALLON M STEVENSON JTM ROSS AWS REEVES CM
Citation: Aj. Walton et al., IMPROVED STRUCTURE FOR OPTIMIZATION OF FOCUS AND EXPOSURE FOR IC PRODUCTION, Electronics Letters, 29(17), 1993, pp. 1573-1574
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