Citation: Pm. Rousseau et al., ARSENIC DEACTIVATION ENHANCED DIFFUSION - A TIME, TEMPERATURE, AND CONCENTRATION STUDY, Journal of applied physics, 84(7), 1998, pp. 3593-3601
Authors:
MYLER U
SIMPSON PJ
LAWTHER DW
ROUSSEAU PM
Citation: U. Myler et al., ON THE ELECTRICAL DEACTIVATION OF ARSENIC IN SILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(3), 1997, pp. 757-759
Citation: Pm. Rousseau et al., ARSENIC DEACTIVATION ENHANCED DIFFUSION AND THE REVERSE SHORT-CHANNELEFFECT, IEEE electron device letters, 18(2), 1997, pp. 42-44
Citation: Pm. Rousseau et al., ENHANCED DIFFUSION BY ELECTRICAL DEACTIVATION OF ARSENIC AND ITS IMPLICATIONS FOR BIPOLAR-DEVICES, I.E.E.E. transactions on electron devices, 43(4), 1996, pp. 547-553
Authors:
ROUSSEAU PM
GRIFFIN PB
LUNING S
PLUMMER JD
Citation: Pm. Rousseau et al., A MODEL FOR MOBILITY DEGRADATION IN HIGHLY DOPED ARSENIC LAYERS, I.E.E.E. transactions on electron devices, 43(11), 1996, pp. 2025-2027
Authors:
HERRERAGOMEZ A
ROUSSEAU PM
MATERLIK G
KENDELEWICZ T
WOICIK JC
GRIFFIN PB
PLUMMER J
SPICER WE
Citation: A. Herreragomez et al., EVOLUTION OF THE CRYSTALLOGRAPHIC POSITION OF AS IMPURITIES IN HEAVILY-DOPED SI CRYSTALS AS THEIR ELECTRICAL-ACTIVITY CHANGES, Applied physics letters, 68(22), 1996, pp. 3090-3092
Citation: Dw. Lawther et al., VACANCY GENERATION RESULTING FROM ELECTRICAL DEACTIVATION OF ARSENIC, Applied physics letters, 67(24), 1995, pp. 3575-3577