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Results: 1-11 |
Results: 11
GROWTH AND CHARACTERIZATION OF ORGANIC MULTILAYERS ON GOLD GROWN BY ORGANIC MOLECULAR-BEAM DEPOSITION
Authors: ROSINK JJWM BLAUW MA GEERLIGS LJ VANDERDRIFT E ROUSSEEUW BAC RADELAAR S
Citation: Jjwm. Rosink et al., GROWTH AND CHARACTERIZATION OF ORGANIC MULTILAYERS ON GOLD GROWN BY ORGANIC MOLECULAR-BEAM DEPOSITION, Optical materials, 9(1-4), 1998, pp. 416-422
FABRICATION AND ANALYSIS OF EXTREME-ULTRAVIOLET REFLECTION MASKS WITHPATTERNED W C ABSORBER BILAYERS/
Authors: VOORMA HJ LOUIS E KOSTER NB BIJKERK F ZIJLSTRA T DEGROOT LEM ROUSSEEUW BAC ROMIJN J VANDERDRIFT EWJM FRIEDRICH J
Citation: Hj. Voorma et al., FABRICATION AND ANALYSIS OF EXTREME-ULTRAVIOLET REFLECTION MASKS WITHPATTERNED W C ABSORBER BILAYERS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(2), 1997, pp. 293-298
EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS
Authors: BIJKERK F SHMAENOK LA LOUIS E VOORMA HJ KOSTER NB BRUINEMAN C BASTIAENSEN RKFJ VANDERDRIFT EWJM ROMIJN J DEGROOT LEM ROUSSEEUW BAC ZIJLSTRA T PLATONOV YY SALASHCHENKO NN
Citation: F. Bijkerk et al., EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS, Microelectronic engineering, 30(1-4), 1996, pp. 183-186
TEMPLATE PATTERNING OF YBA2CU3O7
Authors: VANDERHARG AJM ROUSSEEUW BAC VANDERDRIFT E
Citation: Ajm. Vanderharg et al., TEMPLATE PATTERNING OF YBA2CU3O7, Microelectronic engineering, 30(1-4), 1996, pp. 369-372
SYNTHESIS OF SILOXANES CONTAINING ACID-SENSITIVE SIDE-GROUPS
Authors: PUYENBROEK R JANSEMA JJ VANDEGRAMPEL JC ROUSSEEUW BAC VANDERDRIFT EWJM
Citation: R. Puyenbroek et al., SYNTHESIS OF SILOXANES CONTAINING ACID-SENSITIVE SIDE-GROUPS, Polymer, 37(5), 1996, pp. 847-854
SILICON-CONTAINING RESISTS WITH POSITIVE AND NEGATIVE TONE
Authors: ROUSSEEUW BAC PUYENBROEK R VANDERDRIFT E VANDEGRAMPEL JC
Citation: Bac. Rousseeuw et al., SILICON-CONTAINING RESISTS WITH POSITIVE AND NEGATIVE TONE, Microelectronic engineering, 27(1-4), 1995, pp. 375-379
THE APPLICATION OF PHOSPHAZENE CONTAINING POLYMERS AS NEGATIVE RESISTS IN MICROLITHOGRAPHY
Authors: PUYENBROEK R BOSSCHER G VANDEGRAMPEL JC ROUSSEEUW BAC VANDERDRIFT EWJM
Citation: R. Puyenbroek et al., THE APPLICATION OF PHOSPHAZENE CONTAINING POLYMERS AS NEGATIVE RESISTS IN MICROLITHOGRAPHY, Phosphorus, sulfur and silicon and the related elements, 93(1-4), 1994, pp. 277-280
MESOSCOPIC SILICON COUPLED SUPERCONDUCTING JUNCTIONS OF COSI2 FORMED IN A SELF-ALIGNED PROCESS
Authors: HILBRANDIE GR BAKKER SJM VANDERDRIFT E ROUSSEEUW BAC KLAPWIJK TM RADELAAR S
Citation: Gr. Hilbrandie et al., MESOSCOPIC SILICON COUPLED SUPERCONDUCTING JUNCTIONS OF COSI2 FORMED IN A SELF-ALIGNED PROCESS, Microelectronic engineering, 23(1-4), 1994, pp. 445-448
FUNCTIONALIZATION OF POLYSILSESQUIOXANES
Authors: PUYENBROEK R VANDEGRAMPEL JC ROUSSEEUW BAC VANDERDRIFT EWJM
Citation: R. Puyenbroek et al., FUNCTIONALIZATION OF POLYSILSESQUIOXANES, Polymer, 35(14), 1994, pp. 3131-3132
SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES
Authors: LOUIS E BIJKERK F SHMAENOK L VOORMA HJ VANDERWIEL MJ SCHLATMANN R VERHOEVEN J VANDERDRIFT EWJM ROMIJN J ROUSSEEUW BAC VOSS F DESOR R NIKOLAUS B
Citation: E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70
FABRICATION OF SI-COUPLED 3 TERMINAL SUPERCONDUCTING DEVICE USING SELECTIVE DEPOSITION OF BETA-W
Authors: BAKKER SJM ROUSSEEUW BAC VANDERDRIFT E KLAPWIJK TM RADELAAR S
Citation: Sjm. Bakker et al., FABRICATION OF SI-COUPLED 3 TERMINAL SUPERCONDUCTING DEVICE USING SELECTIVE DEPOSITION OF BETA-W, Microelectronic engineering, 21(1-4), 1993, pp. 435-438
Risultati: 1-11 |