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Results: 1-25/32
Authors:
Rangelow, IW
Biehl, S
Citation: Iw. Rangelow et S. Biehl, Fabrication and electrical characterization of high aspect ratio silicon field emitter arrays, J VAC SCI B, 19(3), 2001, pp. 916-919
Authors:
Abedinov, N
Grabiec, P
Gotszalk, T
Ivanov, T
Voigt, J
Rangelow, IW
Citation: N. Abedinov et al., Micromachined piezoresistive cantilever array with integrated resistive microheater for calorimetry and mass detection, J VAC SCI A, 19(6), 2001, pp. 2884-2888
Authors:
Stephan, A
Meijer, J
Weidenmuller, U
Rocken, H
Bukow, HH
Burchard, M
Zaitsev, A
Volland, B
Rangelow, IW
Citation: A. Stephan et al., The heavy ion micro-projection setup at Bochum, NUCL INST B, 181, 2001, pp. 39-43
Authors:
Degen, A
Abedinov, N
Gotszalk, T
Sossna, E
Kratzenberg, M
Rangelow, IW
Citation: A. Degen et al., Stress analysis in Si membranes for open stencil masks and mini-reticles using double bulging and resonance methods, MICROEL ENG, 57-8, 2001, pp. 425-432
Authors:
Weiss, B
Klein, M
Sossna, E
Volland, B
Rangelow, IW
Citation: B. Weiss et al., Noncontacting laser-based techniques for the determination of elastic constants of thin silicon membranes, MICROEL ENG, 57-8, 2001, pp. 475-479
Authors:
Rangelow, IW
Biehl, S
Citation: Iw. Rangelow et S. Biehl, High aspect ratio silicon tips field emitter array, MICROEL ENG, 57-8, 2001, pp. 613-619
Authors:
Volland, BE
Heerlein, H
Kostic, I
Rangelow, IW
Citation: Be. Volland et al., The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS, MICROEL ENG, 57-8, 2001, pp. 641-650
Authors:
Rangelow, IW
Gotszalk, T
Abedinov, N
Grabiec, P
Edinger, K
Citation: Iw. Rangelow et al., Thermal nano-probe, MICROEL ENG, 57-8, 2001, pp. 737-748
Authors:
Zaborowski, M
Grabiec, P
Gotszalk, T
Romanowska, E
Rangelow, IW
Citation: M. Zaborowski et al., A temperature microsensor for biological investigations, MICROEL ENG, 57-8, 2001, pp. 787-792
Authors:
Debski, T
Barth, W
Rangelow, IW
Biehl, S
Grabiec, P
Bekh, II
Lushkin, AE
Il'chenko, LG
Kostic, I
Hudek, P
Mitura, S
Citation: T. Debski et al., Gated field emitter arrays, MICROEL ENG, 57-8, 2001, pp. 813-818
Authors:
Barth, W
Debski, T
Abedinov, N
Ivanov, T
Heerlein, H
Volland, B
Gotszalk, T
Rangelow, IW
Torkar, K
Fritzenwallner, K
Grabiec, P
Studzinska, K
Kostic, I
Hudek, P
Citation: W. Barth et al., Evaluation and fabrication of AFM array for ESA-Midas /Rosetta space mission, MICROEL ENG, 57-8, 2001, pp. 825-831
Authors:
Voigt, J
Shi, F
Edinger, K
Guthner, P
Rangelow, IW
Citation: J. Voigt et al., Nanofabrication with scanning nanonozzle 'Nanojet', MICROEL ENG, 57-8, 2001, pp. 1035-1042
Authors:
Rangelow, IW
Citation: Iw. Rangelow, Dry etching-based silicon micro-machining for MEMS, VACUUM, 62(2-3), 2001, pp. 279-291
Authors:
Volland, B
Shi, F
Heerlein, H
Rangelow, IW
Hudek, P
Kostic, I
Cekan, E
Vonach, H
Loeschner, H
Horner, C
Stengl, G
Buschbeck, H
Zeininger, M
Bleeker, A
Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206
Authors:
Sossna, E
Kassing, R
Rangelow, IW
Herzinger, CM
Tiwald, TE
Woollam, JA
Wagner, T
Citation: E. Sossna et al., Thickness analysis of silicon membranes for stencil masks, J VAC SCI B, 18(6), 2000, pp. 3259-3263
Authors:
Voigt, J
Shi, F
Hudek, P
Rangelow, IW
Edinger, K
Citation: J. Voigt et al., Progress on nanostructuring with Nanojet, J VAC SCI B, 18(6), 2000, pp. 3525-3529
Authors:
Barth, W
Debski, T
Shi, F
Hudek, P
Kostic, I
Rangelow, IW
Biehl, S
Iwert, T
Grabiec, P
Studzinska, K
Mitura, S
Bekh, II
Lushkin, AE
Il'chenko, LG
Il'chenko, VV
Haindl, G
Citation: W. Barth et al., Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining, J VAC SCI B, 18(6), 2000, pp. 3544-3548
Authors:
Debski, T
Volland, B
Barth, W
Shi, F
Hudek, P
Rangelow, IW
Grabiec, P
Studzinska, K
Zaborowski, M
Mitura, S
Citation: T. Debski et al., Field emission arrays by silicon micromachining, J VAC SCI B, 18(2), 2000, pp. 896-899
Authors:
Zambov, LM
Popov, C
Abedinov, N
Plass, MF
Kulisch, W
Gotszalk, T
Grabiec, P
Rangelow, IW
Kassing, R
Citation: Lm. Zambov et al., Gas-sensitive properties of nitrogen-rich carbon nitride films, ADVAN MATER, 12(9), 2000, pp. 656
Authors:
Gotszalk, T
Grabiec, P
Rangelow, IW
Citation: T. Gotszalk et al., Piezoresistive sensors for scanning probe microscopy, ULTRAMICROS, 82(1-4), 2000, pp. 39-48
Authors:
Givargizov, EI
Stepanova, AN
Obolenskaya, LN
Mashkova, ES
Molchanov, VA
Givargizov, ME
Rangelow, IW
Citation: Ei. Givargizov et al., Whisker probes, ULTRAMICROS, 82(1-4), 2000, pp. 57-61
Authors:
Voigt, J
Reinker, B
Rangelow, IW
Mariotto, G
Shvets, I
Guethner, P
Loschner, H
Citation: J. Voigt et al., NANOJET: Nanostructuring via a downstream plasmajet, J VAC SCI B, 17(6), 1999, pp. 2764-2767
Authors:
Volland, B
Hudek, FS
Heerlein, H
Rangelow, IW
Citation: B. Volland et al., Dry etching with gas chopping without rippled sidewalls, J VAC SCI B, 17(6), 1999, pp. 2768-2771
Authors:
de Jager, PWH
Derksen, G
Mertens, B
Cekan, E
Lammer, G
Vonach, H
Buschbeck, H
Zeininger, M
Horner, C
Loschner, H
Stengl, G
Bleeker, AJ
Benschop, J
Shi, F
Volland, B
Hudek, P
Heerlein, H
Rangelow, IW
Kaesmaier, R
Citation: Pwh. De Jager et al., Experimental results of the stochastic Coulomb interaction in ion projection lithography, J VAC SCI B, 17(6), 1999, pp. 3098-3106
Authors:
Ehrmann, A
Struck, T
Chalupka, A
Haugeneder, E
Loschner, H
Butschke, J
Irmscher, M
Letzkus, F
Springer, R
Degen, A
Rangelow, IW
Shi, F
Sossna, E
Volland, B
Engelstad, R
Lovell, E
Tejeda, R
Citation: A. Ehrmann et al., Comparison of silicon stencil mask distortion measurements with finite element analysis, J VAC SCI B, 17(6), 1999, pp. 3107-3111