Authors:
Flandre, D
Adriaensen, S
Akheyar, A
Crahay, A
Demeus, L
Delatte, P
Dessard, V
Iniguez, B
Neve, A
Katschmarskyj, B
Loumaye, P
Laconte, J
Martinez, I
Picun, G
Rauly, E
Renaux, C
Spote, D
Zitout, M
Dehan, M
Parvais, B
Simon, P
Vanhoenacker, D
Raskin, JP
Citation: D. Flandre et al., Fully depleted SOICMOS technology for heterogeneous micropower, high-temperature or RF microsystems, SOL ST ELEC, 45(4), 2001, pp. 541-549
Authors:
Raskin, JP
Gilon, R
Dambrine, G
Chen, J
Vanhoenacker, D
Colinge, JP
Citation: Jp. Raskin et al., Accurate characterization of silicon-on-insulator MOSFETs for the design of low-voltage, low-power RF integrated circuits, ANALOG IN C, 25(2), 2000, pp. 133-155
Authors:
Flandre, D
Colinge, JP
Chen, J
De Ceuster, D
Eggermont, JP
Ferreira, L
Gentinne, B
Jespers, PGA
Viviani, A
Gillon, R
Raskin, JP
Vander Vorst, A
Vanhoenacker-Janvier, D
Silveira, F
Citation: D. Flandre et al., Fully-depleted SOICMOS technology for low-voltage low-power mixed digital/analog/microwave circuits, ANALOG IN C, 21(3), 1999, pp. 213-228
Authors:
Dambrine, G
Raskin, JP
Danneville, F
Vanhoenacker-Janvier, D
Colinge, JP
Cappy, A
Citation: G. Dambrine et al., High-frequency four noise parameters of silicon-on-insulator-based technology MOSFET for the design of low-noise RF integrated circuits, IEEE DEVICE, 46(8), 1999, pp. 1733-1741