Authors:
Michel, B
Bernard, A
Bietsch, A
Delamarche, E
Geissler, M
Juncker, D
Kind, H
Renault, JP
Rothuizen, H
Schmid, H
SchmidtWinkel, P
Stutz, R
Wolf, H
Citation: B. Michel et al., Printing meets lithography: Soft approaches to high-resolution patterning (vol 45, pg 697, 2001), IBM J RES, 45(6), 2001, pp. 870-870
Authors:
Michel, B
Bernard, A
Bietsch, A
Delamarche, E
Geissler, M
Juncker, D
Kind, H
Renault, JP
Rothuizen, H
Schmid, H
Schmidt-Winkel, P
Stutz, R
Wolf, H
Citation: B. Michel et al., Printing meets lithography: Soft approaches to high-resolution printing, IBM J RES, 45(5), 2001, pp. 697-719
Authors:
King, WP
Kenny, TW
Goodson, KE
Cross, G
Despont, M
Durig, U
Rothuizen, H
Binnig, GK
Vettiger, P
Citation: Wp. King et al., Atomic force microscope cantilevers for combined thermomechanical data writing and reading, APPL PHYS L, 78(9), 2001, pp. 1300-1302
Authors:
Baller, MK
Lang, HP
Fritz, J
Gerber, C
Gimzewski, JK
Drechsler, U
Rothuizen, H
Despont, M
Vettiger, P
Battiston, FM
Ramseyer, JP
Fornaro, P
Meyer, E
Guntherodt, HJ
Citation: Mk. Baller et al., A cantilever array-based artificial nose, ULTRAMICROS, 82(1-4), 2000, pp. 1-9
Authors:
Rothuizen, H
Drechsler, U
Genolet, G
Haberle, W
Lutwyche, M
Stutz, R
Widmer, R
Vettiger, P
Citation: H. Rothuizen et al., Fabrication of a micromachined magnetic X/Y/Z scanner for parallel scanning probe applications, MICROEL ENG, 53(1-4), 2000, pp. 509-512
Authors:
Brugger, J
Andreoli, C
Despont, M
Drechsler, U
Rothuizen, H
Vettiger, P
Citation: J. Brugger et al., Self-aligned 3D shadow mask technique for patterning deeply recessed surfaces of micro-electro-mechanical systems devices, SENS ACTU-A, 76(1-3), 1999, pp. 329-334