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Results: 1-10 |
Results: 10
EVOLUTION OF SURFACE-MORPHOLOGY DURING GROWTH AND ION EROSION OF THIN-FILMS
Authors: SCHLATMANN R SHINDLER JD VERHOEVEN J
Citation: R. Schlatmann et al., EVOLUTION OF SURFACE-MORPHOLOGY DURING GROWTH AND ION EROSION OF THIN-FILMS, Physical review. B, Condensed matter, 54(15), 1996, pp. 10880-10889
ENHANCED X-RAY OPTICAL CONTRAST OF MO SI MULTILAYERS BY H-IMPLANTATION OF SI/
Authors: SCHLATMANN R KEPPEL A XUE Y VERHOEVEN J MAREE CHM HABRAKEN FHPM
Citation: R. Schlatmann et al., ENHANCED X-RAY OPTICAL CONTRAST OF MO SI MULTILAYERS BY H-IMPLANTATION OF SI/, Journal of applied physics, 80(4), 1996, pp. 2121-2126
LOW-ENERGY ION-BEAM MIXING AS A TOOL FOR MULTILAYER X-RAY MIRROR FABRICATION
Authors: SCHLATMANN R KEPPEL A BULTMAN S WEBER T VERHOEVEN J
Citation: R. Schlatmann et al., LOW-ENERGY ION-BEAM MIXING AS A TOOL FOR MULTILAYER X-RAY MIRROR FABRICATION, Applied physics letters, 68(21), 1996, pp. 2948-2950
NUMERICAL AND EXPERIMENTAL-STUDY OF DISORDERED MULTILAYERS FOR BROAD-BAND X-RAY REFLECTION
Authors: VANLOEVEZIJN P SCHLATMANN R VERHOEVEN J VANTIGGELEN BA GULLIKSON EM
Citation: P. Vanloevezijn et al., NUMERICAL AND EXPERIMENTAL-STUDY OF DISORDERED MULTILAYERS FOR BROAD-BAND X-RAY REFLECTION, Applied optics, 35(19), 1996, pp. 3614-3619
DIFFUSE-X-RAY-SCATTERING MEASUREMENTS OF ROUGHNESS ON ION-ETCHED MULTILAYER INTERFACES
Authors: SCHLATMANN R SHINDLER JD VERHOEVEN J
Citation: R. Schlatmann et al., DIFFUSE-X-RAY-SCATTERING MEASUREMENTS OF ROUGHNESS ON ION-ETCHED MULTILAYER INTERFACES, Physical review. B, Condensed matter, 51(8), 1995, pp. 5345-5351
MODIFICATION BY AR AND KR ION-BOMBARDMENT OF MO SI X-RAY MULTILAYERS/
Authors: SCHLATMANN R LU C VERHOEVEN J PUIK EJ VANDERWIEL MJ
Citation: R. Schlatmann et al., MODIFICATION BY AR AND KR ION-BOMBARDMENT OF MO SI X-RAY MULTILAYERS/, Applied surface science, 78(2), 1994, pp. 147-157
X-RAY REFLECTION, A TECHNIQUE FOR MEASURING SPUTTERING YIELDS OF THIN-FILMS
Authors: VERHOEVEN J KEPPEL A SCHLATMANN R XUE Y KATARDJIEV IV
Citation: J. Verhoeven et al., X-RAY REFLECTION, A TECHNIQUE FOR MEASURING SPUTTERING YIELDS OF THIN-FILMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 94(4), 1994, pp. 395-403
ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT
Authors: LOUIS E VOORMA HJ KOSTER NB SHMAENOK L BIJKERK F SCHLATMANN R VERHOEVEN J PLATONOV YY VANDORSSEN GE PADMORE HA
Citation: E. Louis et al., ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT, Microelectronic engineering, 23(1-4), 1994, pp. 215-218
SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES
Authors: LOUIS E BIJKERK F SHMAENOK L VOORMA HJ VANDERWIEL MJ SCHLATMANN R VERHOEVEN J VANDERDRIFT EWJM ROMIJN J ROUSSEEUW BAC VOSS F DESOR R NIKOLAUS B
Citation: E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70
ENHANCED REFLECTIVITY OF SOFT-X-RAY MULTILAYER MIRRORS BY REDUCTION OF SI ATOMIC DENSITY
Authors: SCHLATMANN R KEPPEL A XUE Y VERHOEVEN J VANDERWIEL MJ
Citation: R. Schlatmann et al., ENHANCED REFLECTIVITY OF SOFT-X-RAY MULTILAYER MIRRORS BY REDUCTION OF SI ATOMIC DENSITY, Applied physics letters, 63(24), 1993, pp. 3297-3299
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