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Results: 1-14 |
Results: 14
USE OF CL-2-DISCHARGE CONDITIONS(AR MIXTURES IN ETCHING SILICON ON THE CATHODE UNDER DC GLOW)
Authors: OVCHINNIKOV NL SVETTSOV VI EFREMOV AM
Citation: Nl. Ovchinnikov et al., USE OF CL-2-DISCHARGE CONDITIONS(AR MIXTURES IN ETCHING SILICON ON THE CATHODE UNDER DC GLOW), Inorganic materials, 34(5), 1998, pp. 417-418
FORMATION AND DECAY OF ACTIVE SPECIES IN A CHLORINE-OXYGEN PLASMA
Authors: EFREMOV AM SVETTSOV VI SITANOV DV MIKHALKIN VP
Citation: Am. Efremov et al., FORMATION AND DECAY OF ACTIVE SPECIES IN A CHLORINE-OXYGEN PLASMA, High energy chemistry, 32(3), 1998, pp. 193-196
DISSOCIATION OF CHLORINE MOLECULES IN A GLOW-DISCHARGE PLASMA IN MIXTURES WITH ARGON, OXYGEN, AND NITROGEN
Authors: SITANOV DV EFREMOV AM SVETTSOV VI
Citation: Dv. Sitanov et al., DISSOCIATION OF CHLORINE MOLECULES IN A GLOW-DISCHARGE PLASMA IN MIXTURES WITH ARGON, OXYGEN, AND NITROGEN, High energy chemistry, 32(2), 1998, pp. 123-126
SILICON ETCHING ON THE CATHODE IN A CHLORINE GLOW-DISCHARGE
Authors: OVCHINNIKOV NL SVETTSOV VI EFREMOV AM
Citation: Nl. Ovchinnikov et al., SILICON ETCHING ON THE CATHODE IN A CHLORINE GLOW-DISCHARGE, High energy chemistry, 31(6), 1997, pp. 404-406
REFINEMENT OF EXCITATION CROSS-SECTIONS FOR ELECTRONIC STATES OF MOLECULES IN MATHEMATICAL-MODELING OF CHLORINE PLASMA
Authors: EFREMOV AM SVETTSOV VI MIKHALKIN VP
Citation: Am. Efremov et al., REFINEMENT OF EXCITATION CROSS-SECTIONS FOR ELECTRONIC STATES OF MOLECULES IN MATHEMATICAL-MODELING OF CHLORINE PLASMA, High energy chemistry, 29(6), 1995, pp. 433-434
PLASMA EMISSION FEATURES IN CHLORINE-ARGON MIXTURES
Authors: EFREMOV AM SVETTSOV VI
Citation: Am. Efremov et Vi. Svettsov, PLASMA EMISSION FEATURES IN CHLORINE-ARGON MIXTURES, High energy chemistry, 29(5), 1995, pp. 358-360
ON THE ACTINOMETRIC DETERMINATION OF THE CONCENTRATION OF CHLORINE ATOMS IN A DISCHARGE
Authors: KUPRIYANOVSKAYA AP SVETTSOV VI SITANOV DV
Citation: Ap. Kupriyanovskaya et al., ON THE ACTINOMETRIC DETERMINATION OF THE CONCENTRATION OF CHLORINE ATOMS IN A DISCHARGE, High energy chemistry, 29(4), 1995, pp. 284-287
FEATURES OF COPPER ETCHING IN CHLORINE-ARGON PLASMA
Authors: EFREMOV AM SVETTSOV VI
Citation: Am. Efremov et Vi. Svettsov, FEATURES OF COPPER ETCHING IN CHLORINE-ARGON PLASMA, High energy chemistry, 29(4), 1995, pp. 293-294
THE INFLUENCE OF PRODUCTS OF COPPER ETCHING IN CHLORINE PLASMA ON ELECTRON-ENERGY DISTRIBUTION AND RATE COEFFICIENTS OF PROCESSES INVOLVINGELECTRONS
Authors: EFREMOV AM SVETTSOV VI MIKHALKIN VP
Citation: Am. Efremov et al., THE INFLUENCE OF PRODUCTS OF COPPER ETCHING IN CHLORINE PLASMA ON ELECTRON-ENERGY DISTRIBUTION AND RATE COEFFICIENTS OF PROCESSES INVOLVINGELECTRONS, High energy chemistry, 29(2), 1995, pp. 137-138
MATHEMATICAL-MODELING OF GLOW-DISCHARGE P LASMA IN CHLORINE-OXYGEN MIXTURE
Authors: EFREMOV AM SVETTSOV VI MIKHALKIN VP
Citation: Am. Efremov et al., MATHEMATICAL-MODELING OF GLOW-DISCHARGE P LASMA IN CHLORINE-OXYGEN MIXTURE, Izvestia vyssih ucebnyh zavedenij. Himia i himiceskaa tehnologia, 37(4-6), 1994, pp. 63-67
INFLUENCE OF CARBON AND OXIDE-FILMS ON SP UTTERING OF METALS IN GLOWING DISCHARGES IN ARGON, OXYGEN AND CARBONIC-ACID GAS INVESTIGATED BY OPTICAL SPECTROSCOPY METHODS
Authors: MALANOV KA SVETTSOV VI
Citation: Ka. Malanov et Vi. Svettsov, INFLUENCE OF CARBON AND OXIDE-FILMS ON SP UTTERING OF METALS IN GLOWING DISCHARGES IN ARGON, OXYGEN AND CARBONIC-ACID GAS INVESTIGATED BY OPTICAL SPECTROSCOPY METHODS, Izvestia Akademii nauk SSSR. Seria fiziceskaa, 58(3), 1994, pp. 77-81
MATHEMATICAL-MODELING OF THE EFFECT OF H2 -H-N2 MIXTURE COMPOSITION ON KINETICS OF HYDROGEN MOLECULE DISSOCIATION IN GLOW-DISCHARGE
Authors: ABRAMOV VL GALIASKAROV EG SVETTSOV VI
Citation: Vl. Abramov et al., MATHEMATICAL-MODELING OF THE EFFECT OF H2 -H-N2 MIXTURE COMPOSITION ON KINETICS OF HYDROGEN MOLECULE DISSOCIATION IN GLOW-DISCHARGE, Izvestia vyssih ucebnyh zavedenij. Himia i himiceskaa tehnologia, 36(4), 1993, pp. 65-68
KINETICS OF HYDROGEN-ATOM FORMATION DURIN G AMMONIA DISCHARGE
Authors: GALIASKAROV EG ABRAMOV VL SVETTSOV VI
Citation: Eg. Galiaskarov et al., KINETICS OF HYDROGEN-ATOM FORMATION DURIN G AMMONIA DISCHARGE, Izvestia vyssih ucebnyh zavedenij. Himia i himiceskaa tehnologia, 36(3), 1993, pp. 115-117
MECHANISMS FOR THE EFFECT OF ARGON ON THE RATE OF PLASMA CHEMICAL ETCHING OF METALS AND SEMICONDUCTORS IN CHLORINE PLASMAS
Authors: EFREMOV AM KUPRIYANOVSKAYA AP SVETTSOV VI
Citation: Am. Efremov et al., MECHANISMS FOR THE EFFECT OF ARGON ON THE RATE OF PLASMA CHEMICAL ETCHING OF METALS AND SEMICONDUCTORS IN CHLORINE PLASMAS, High energy chemistry, 27(1), 1993, pp. 83-86
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