AAAAAA

   
Results: 1-15 |
Results: 15
PERFORMANCE OF ZR O/W SCHOTTKY EMITTERS AT REDUCED TEMPERATURES/
Authors: KIM HS YU ML THOMSON MGR KRATSCHMER E CHANG THP
Citation: Hs. Kim et al., PERFORMANCE OF ZR O/W SCHOTTKY EMITTERS AT REDUCED TEMPERATURES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2284-2288
ENERGY-DISTRIBUTIONS OF ZR O/W SCHOTTKY ELECTRON-EMISSION/
Authors: KIM HS YU ML THOMSON MGR KRATSCHMER E CHANG THP
Citation: Hs. Kim et al., ENERGY-DISTRIBUTIONS OF ZR O/W SCHOTTKY ELECTRON-EMISSION/, Journal of applied physics, 81(1), 1997, pp. 461-465
ELECTRON-BEAM MICROCOLUMNS FOR LITHOGRAPHY AND RELATED APPLICATIONS
Authors: CHANG THP THOMSON MGR KRATSCHMER E KIM HS YU ML LEE KY RISHTON SA HUSSEY BW ZOLGHARNAIN S
Citation: Thp. Chang et al., ELECTRON-BEAM MICROCOLUMNS FOR LITHOGRAPHY AND RELATED APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3774-3781
EXPERIMENTAL EVALUATION OF A 20X20 MM FOOTPRINT MICROCOLUMN
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML ZOLGHARNAIN S HUSSEY BW CHANG THP
Citation: E. Kratschmer et al., EXPERIMENTAL EVALUATION OF A 20X20 MM FOOTPRINT MICROCOLUMN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3792-3796
THE ELECTROSTATIC MOVING OBJECTIVE LENS AND OPTIMIZED DEFLECTION SYSTEMS FOR MICROCOLUMNS
Authors: THOMSON MGR
Citation: Mgr. Thomson, THE ELECTROSTATIC MOVING OBJECTIVE LENS AND OPTIMIZED DEFLECTION SYSTEMS FOR MICROCOLUMNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3802-3807
ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN
Authors: CHANG THP THOMSON MGR YU ML KRATSCHMER E KIM HS LEE KY RISHTON SA ZOLGHARNAIN S
Citation: Thp. Chang et al., ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN, Microelectronic engineering, 32(1-4), 1996, pp. 113-130
LENS AND DEFLECTOR DESIGN FOR MICROCOLUMNS
Authors: THOMSON MGR CHANG THP
Citation: Mgr. Thomson et Thp. Chang, LENS AND DEFLECTOR DESIGN FOR MICROCOLUMNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2445-2449
COMPRESSION OF FIELD-EMISSION ANGULAR-DISTRIBUTION USING A CATHODE SHIELD
Authors: THOMSON MGR
Citation: Mgr. Thomson, COMPRESSION OF FIELD-EMISSION ANGULAR-DISTRIBUTION USING A CATHODE SHIELD, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2455-2458
MINIATURE SCHOTTKY ELECTRON SOURCE
Authors: KIM HS YU ML KRATSCHMER E HUSSEY BW THOMSON MGR CHANG THP
Citation: Hs. Kim et al., MINIATURE SCHOTTKY ELECTRON SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2468-2472
AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML CHANG THP
Citation: E. Kratschmer et al., AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2498-2503
EVALUATION OF ZR O/W SCHOTTKY EMITTERS FOR MICROCOLUMN APPLICATIONS/
Authors: KIM HS KRATSCHMER E YU ML THOMSON MGR CHANG THP
Citation: Hs. Kim et al., EVALUATION OF ZR O/W SCHOTTKY EMITTERS FOR MICROCOLUMN APPLICATIONS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3413-3417
ELECTRON-ELECTRON SCATTERING IN MICROCOLUMNS
Authors: THOMSON MGR
Citation: Mgr. Thomson, ELECTRON-ELECTRON SCATTERING IN MICROCOLUMNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3498-3502
SUB-40 NM RESOLUTION 1 KEV SCANNING TUNNELING MICROSCOPE FIELD-EMISSION MICROCOLUMN
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML CHANG THP
Citation: E. Kratschmer et al., SUB-40 NM RESOLUTION 1 KEV SCANNING TUNNELING MICROSCOPE FIELD-EMISSION MICROCOLUMN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3503-3507
ELECTRON-BEAM LITHOGRAPHY FOR ADVANCED DEVICE PROTOTYPING - PROCESS TOOL METROLOGY
Authors: ROSENFIELD MG THOMSON MGR COANE PJ KWIETNIAK KT KELLER J KLAUS DP VOLANT RP BLAIR CR TREMAINE KS NEWMAN TH HOHN FJ
Citation: Mg. Rosenfield et al., ELECTRON-BEAM LITHOGRAPHY FOR ADVANCED DEVICE PROTOTYPING - PROCESS TOOL METROLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2615-2620
INCIDENT DOSE MODIFICATION FOR PROXIMITY EFFECT CORRECTION
Authors: THOMSON MGR
Citation: Mgr. Thomson, INCIDENT DOSE MODIFICATION FOR PROXIMITY EFFECT CORRECTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2768-2772
Risultati: 1-15 |