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Results: 1-25 | 26-41 |
Results: 26-41/41
Direct temperature monitoring for semiconductors in plasma immersion ion implantation
Authors: Tian, XB Chu, PK
Citation: Xb. Tian et Pk. Chu, Direct temperature monitoring for semiconductors in plasma immersion ion implantation, REV SCI INS, 71(7), 2000, pp. 2839-2842
Characteristics and design of metal vacuum arc plasma source power supply for pulsed-mode plasma immersion ion implantation
Authors: Wang, LP Gan, KY Tian, XB Tang, BY Chu, PK
Citation: Lp. Wang et al., Characteristics and design of metal vacuum arc plasma source power supply for pulsed-mode plasma immersion ion implantation, REV SCI INS, 71(12), 2000, pp. 4435-4437
Modeling of incident particle energy distribution in plasma immersion ion implantation
Authors: Tian, XB Kwok, DTK Chu, PK
Citation: Xb. Tian et al., Modeling of incident particle energy distribution in plasma immersion ion implantation, J APPL PHYS, 88(9), 2000, pp. 4961-4966
Efficacy of high-frequency, low-voltage plasma immersion ion implantation of a bar-shaped target
Authors: Tian, XB Zeng, ZM Zeng, XC Tang, BY Chu, PK
Citation: Xb. Tian et al., Efficacy of high-frequency, low-voltage plasma immersion ion implantation of a bar-shaped target, J APPL PHYS, 88(5), 2000, pp. 2221-2225
Process window and mechanism of surface property enhancement of 9Cr18 steel using plasma immersion ion implantation
Authors: Zeng, ZM Tang, BY Chu, PK Tian, XB Wang, SY Wang, XF
Citation: Zm. Zeng et al., Process window and mechanism of surface property enhancement of 9Cr18 steel using plasma immersion ion implantation, J VAC SCI B, 17(2), 1999, pp. 851-854
Simulation of dose uniformity for different pulse durations during inner surface plasma immersion ion implantation
Authors: Liu, AG Wang, XF Wang, SY Tang, BY Chu, PK Zeng, ZM Tian, XB
Citation: Ag. Liu et al., Simulation of dose uniformity for different pulse durations during inner surface plasma immersion ion implantation, J VAC SCI B, 17(2), 1999, pp. 875-878
Dynamic mixing deposition/implantation in a plasma immersion configuration
Authors: Tian, XB Zhang, T Zeng, ZM Tang, BY Chu, PK
Citation: Xb. Tian et al., Dynamic mixing deposition/implantation in a plasma immersion configuration, J VAC SCI A, 17(6), 1999, pp. 3255-3259
Mechanism of enhanced plasma transport of vacuum arc plasma through curvedmagnetic ducts
Authors: Zhang, T Zeng, ZM Tian, XB Tang, BY Chu, PK Brown, IG Zhang, HX
Citation: T. Zhang et al., Mechanism of enhanced plasma transport of vacuum arc plasma through curvedmagnetic ducts, J VAC SCI A, 17(5), 1999, pp. 3074-3076
Surface modification of steel by metal plasma immersion ion implantation using vacuum are plasma source
Authors: Zeng, ZM Zhang, T Tang, BY Tian, XB Chu, PK
Citation: Zm. Zeng et al., Surface modification of steel by metal plasma immersion ion implantation using vacuum are plasma source, SURF COAT, 121, 1999, pp. 659-662
Plasma immersion ion implantation into inner and outer races of industrialbearings
Authors: Zeng, ZM Kwok, TK Tian, XB Tang, BY Chu, PK
Citation: Zm. Zeng et al., Plasma immersion ion implantation into inner and outer races of industrialbearings, SURF COAT, 121, 1999, pp. 663-667
Improvement of tribological properties of 9Cr18 bearing steel using metal and nitrogen plasma-immersion ion implantation
Authors: Zeng, ZM Zhang, T Tang, BY Tian, XB Chu, PK
Citation: Zm. Zeng et al., Improvement of tribological properties of 9Cr18 bearing steel using metal and nitrogen plasma-immersion ion implantation, SURF COAT, 115(2-3), 1999, pp. 234-238
Influence of sample placement on the dose uniformity in plasma immersion ion implantation of industrial ball bearings
Authors: Zeng, ZM Tian, XB Kwok, DTK Tang, BY Chu, PK
Citation: Zm. Zeng et al., Influence of sample placement on the dose uniformity in plasma immersion ion implantation of industrial ball bearings, IEEE PLAS S, 27(4), 1999, pp. 1203-1209
In situ sample temperature measurement in plasma immersion ion implantation
Authors: Tian, XB Fan, ZN Zeng, XC Zeng, ZM Tang, BY Chu, PK
Citation: Xb. Tian et al., In situ sample temperature measurement in plasma immersion ion implantation, REV SCI INS, 70(6), 1999, pp. 2818-2821
Special modulator for high frequency, low-voltage plasma immersion ion implantation
Authors: Tian, XB Wang, XF Tang, BY Chu, PK Ko, PK Cheng, YC
Citation: Xb. Tian et al., Special modulator for high frequency, low-voltage plasma immersion ion implantation, REV SCI INS, 70(3), 1999, pp. 1824-1828
Accurate determination of pulsed current waveform in plasma immersion ion implantation processes
Authors: Tian, XB Tang, BY Chu, PK
Citation: Xb. Tian et al., Accurate determination of pulsed current waveform in plasma immersion ion implantation processes, J APPL PHYS, 86(7), 1999, pp. 3567-3570
Investigation of dose uniformity on the inner races of bearings treated byplasma immersion ion implantation
Authors: Zeng, ZM Kwok, TK Tian, XB Tang, BY Chu, PK
Citation: Zm. Zeng et al., Investigation of dose uniformity on the inner races of bearings treated byplasma immersion ion implantation, J APPL PHYS, 86(1), 1999, pp. 120-123
Risultati: 1-25 | 26-41 |