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Results:
1-14
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Results: 14
Authors:
HALL IW
VAHLAS C
NI CY
Citation: Iw. Hall et al., EXPERIMENTAL APPROACHES TO SIMULATING INTERFACIAL REACTIONS IN METAL-MATRIX COMPOSITES, Metallurgical and materials transactions. A, Physical metallurgy andmaterials science, 29(4), 1998, pp. 1347-1355
Authors:
VAHLAS C
HWANG NM
GUEROUDJI L
MAURY F
Citation: C. Vahlas et al., DRIVING-FORCE FOR FREE-CARBON INCORPORATION IN CHROMIUM CARBIDE FILMSPROCESSED BY MOCVD, CHEMICAL VAPOR DEPOSITION, 4(3), 1998, pp. 96
Authors:
VAHLAS C
MAURY F
GUEROUDJI L
Citation: C. Vahlas et al., A THERMODYNAMIC APPROACH TO THE CVD OF CHROMIUM AND OF CHROMIUM CARBIDES STARTING FROM CR(C6H6)(2), CHEMICAL VAPOR DEPOSITION, 4(2), 1998, pp. 69-76
Authors:
MAURY F
ABISSET S
PELLETIER L
LAGARDE L
GUEROUDJI L
VAHLAS C
REYNES A
Citation: F. Maury et al., LOW-TEMPERATURE MOCVD OF CR THIN-FILMS - INHIBITION OF THE CARBON INCORPORATION, Annales de chimie, 23(5-6), 1998, pp. 681-693
Authors:
VAMVAKAS VE
DAVAZOGLOU D
VAHLAS C
Citation: Ve. Vamvakas et al., THERMODYNAMIC STUDY, COMPOSITIONAL AND ELECTRICAL CHARACTERIZATION OFLPCVD SIO2-FILMS GROWN FROM TEOS N2O MIXTURES/, Microelectronics and reliability, 38(2), 1998, pp. 265-269
Authors:
DAVAZOGLOU D
VAMVAKAS VE
VAHLAS C
Citation: D. Davazoglou et al., THERMODYNAMIC STUDY, COMPOSITION, AND MICROSTRUCTURE OF LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED SILICON DIOXIDE FILMS GROWN FROM TEOS N2O MIXTURES/, Journal of the Electrochemical Society, 145(4), 1998, pp. 1310-1317
Authors:
MAURY F
GUEROUDJI L
VAHLAS C
Citation: F. Maury et al., SELECTION OF METALORGANIC PRECURSORS FOR MOCVD OF METALLURGICAL COATINGS - APPLICATION TO CR-BASED COATINGS, Surface & coatings technology, 87-8(1-3), 1996, pp. 316-324
Authors:
FAUCANILLAC F
CARRERE F
REYNES A
VAHLAS C
MAURY F
Citation: F. Faucanillac et al., MASS-SPECTROMETRIC STUDY OF THE GAS-PHASE DURING CHEMICAL-VAPOR-DEPOSITION OF PYROLYTIC CARBON, Journal de physique. IV, 5(C5), 1995, pp. 89-96
Authors:
FAUCANILLAC F
CARRERE F
REYNES A
VAHLAS C
MAURY F
Citation: F. Faucanillac et al., MASS-SPECTROMETRIC STUDY OF THE GAS-PHASE DURING CHEMICAL-VAPOR-DEPOSITION OF PYROLYTIC CARBON, Journal de physique. IV, 5(C5), 1995, pp. 89-96
Authors:
VAHLAS C
MONTHIOUX M
Citation: C. Vahlas et M. Monthioux, ON THE THERMAL-DEGRADATION OF LOX-M TYRANNO(R) FIBERS, Journal of the European Ceramic Society, 15(5), 1995, pp. 445-453
Authors:
VAHLAS C
LAANANI F
Citation: C. Vahlas et F. Laanani, THERMODYNAMIC STUDY OF THE THERMAL-DEGRADATION OF SIC-BASED FIBERS - INFLUENCE OF SIC GRAIN-SIZE, Journal of materials science letters, 14(22), 1995, pp. 1558-1561
Authors:
THOMAS N
DUTRON AM
VAHLAS C
BERNARD C
MADAR R
Citation: N. Thomas et al., INFLUENCE OF HYDROGEN PRESSURE ON THE PROPERTIES OF CVD TUNGSTEN SILICIDE FILMS, Journal of the Electrochemical Society, 142(5), 1995, pp. 1608-1614
Authors:
VAHLAS C
ROCABOIS P
BERNARD C
Citation: C. Vahlas et al., THERMAL-DEGRADATION MECHANISMS OF NICALON FIBER - A THERMODYNAMIC SIMULATION, Journal of Materials Science, 29(22), 1994, pp. 5839-5846
Authors:
DESPRES JF
VAHLAS C
OBERLIN A
Citation: Jf. Despres et al., CHEMICAL-VAPOR-DEPOSITION OF PYROLYTIC CARBON ON POLISHED SUBSTRATES, Journal de physique. IV, 3(C3), 1993, pp. 563-570
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