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Results:
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Results: 18
Authors:
Vamvakas, VE
Berjoan, R
Schamm, S
Davazoglou, D
Vahlas, C
Citation: Ve. Vamvakas et al., Low pressure chemical vapor deposition of silicon oxynitride films using tetraethylorthosilicate, dichlorosilane and ammonia mixtures, J PHYS IV, 11(PR3), 2001, pp. 231-238
Authors:
Juarez, F
Castillo, A
Pieraggi, B
Vahlas, C
Citation: F. Juarez et al., Spouted bed metallorganic chemical vapor deposition of ruthenium on NiCoCrAlYTa powders, J PHYS IV, 11(PR3), 2001, pp. 1117-1123
Authors:
Davazoglou, D
Vahlas, C
Citation: D. Davazoglou et C. Vahlas, EUROCVD 13 - Thirteenth European Conference on Chemical Vapor Deposition -Glyfada, Athens, Greece - August 26-31, 2001, J PHYS IV, 11(PR3), 2001, pp. V-VII
Toward the improvement of the microstructure of chemical vapor deposited aluminum on silicon carbide
Authors:
Vahlas, C
Ortiz, P
Oquab, D
Hall, IW
Citation: C. Vahlas et al., Toward the improvement of the microstructure of chemical vapor deposited aluminum on silicon carbide, J ELCHEM SO, 148(9), 2001, pp. C583-C589
Authors:
Marangoni, R
Serp, P
Feurer, R
Kihn, Y
Kalck, P
Vahlas, C
Citation: R. Marangoni et al., Carbon nanotubes produced by substrate free metalorganic chemical vapor deposition of iron catalysts and ethylene, CARBON, 39(3), 2001, pp. 443-449
Authors:
Brissonneau, L
Vahlas, C
Citation: L. Brissonneau et C. Vahlas, Precursors and operating conditions for the metal-organic chemical vapor deposition of nickel films, ANN CHIM-SC, 25(2), 2000, pp. 81-90
Authors:
Brissonneau, L
Sahnoun, R
Mijoule, C
Vahlas, C
Citation: L. Brissonneau et al., Investigation of nickelocene decomposition during chemical vapor deposition of nickel, J ELCHEM SO, 147(4), 2000, pp. 1443-1448
Authors:
Brissonneau, L
Kacheva, A
Senocq, F
Kang, JK
Rhee, SW
Gleizes, A
Vahlas, C
Citation: L. Brissonneau et al., MOCVD of Ni and Ni3C films from Ni(dmen)(2)(tfa)(2), J PHYS IV, 9(P8), 1999, pp. 597-604
Authors:
de Caro, D
Brissonneau, L
Boursier, D
Madar, R
Vahlas, C
Citation: D. De Caro et al., Composition and magnetic properties of MOCVD processed thin films from nickelocene, J PHYS IV, 9(P8), 1999, pp. 1099-1106
Authors:
Brissonneau, L
Reynes, A
Vahlas, C
Citation: L. Brissonneau et al., Growth mechanisms of MOCVD processed Ni thin films, J PHYS IV, 9(P8), 1999, pp. 57-64
Authors:
Brissonneau, L
Reynes, A
Vahlas, C
Citation: L. Brissonneau et al., MOCVD processed ni films from nickelocene. Part III: Gas phase study and deposition mechanisms, CHEM VAPOR, 5(6), 1999, pp. 281-290
Authors:
Brissonneau, L
Vahlas, C
Citation: L. Brissonneau et C. Vahlas, MOCVD-processed Ni films from nickelocene. Part I: Growth rate and morphology, CHEM VAPOR, 5(4), 1999, pp. 135-142
Authors:
Brissonneau, L
de Caro, D
Boursier, D
Madar, R
Vahlas, C
Citation: L. Brissonneau et al., MOCVD-processed Ni films from nickelocene. Part II: Carbon content of the deposits, CHEM VAPOR, 5(4), 1999, pp. 143-149
Authors:
Vahlas, C
Hall, IW
Haurie, I
Citation: C. Vahlas et al., Investigation of interfacial reactivity in composite materials, MAT SCI E A, 259(2), 1999, pp. 269-278
Authors:
Vahlas, C
Vamvakas, VE
Davazoglou, D
Citation: C. Vahlas et al., Low pressure chemical vapor deposition from TEOS-NH3 mixtures: thermochemical study of the process considering kinetic data, MICROEL REL, 39(2), 1999, pp. 303-309
Authors:
Vahlas, C
Kacheva, A
Hitchman, ML
Rocabois, P
Citation: C. Vahlas et al., Thermodynamic study of the formation of C-60 and C-70 by combustion or pyrolysis, J ELCHEM SO, 146(7), 1999, pp. 2752-2761
Authors:
Maury, F
Vahlas, C
Abisset, S
Gueroudji, L
Citation: F. Maury et al., Low temperature metallorganic chemical vapor deposition routes to chromiummetal thin films using bis(benzene)chromium, J ELCHEM SO, 146(10), 1999, pp. 3716-3723
Authors:
Vahlas, C
Laanani, F
Monthioux, M
Citation: C. Vahlas et al., Thermodynamic approach to the oxidation of Hi-Nicalon (TM) fiber, J AM CERAM, 82(9), 1999, pp. 2514-2516
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