Citation: I. Schmidt et C. Benndorf, MECHANISMS OF LOW-TEMPERATURE GROWTH OF DIAMOND USING HALOGENATED PRECURSOR-GASES, DIAMOND AND RELATED MATERIALS, 7(2-5), 1998, pp. 266-271
Citation: I. Schmidt et C. Benndorf, INVESTIGATIONS CONCERNING THE ROLE OF FLUORINE AND CHLORINE IN THE LOW-TEMPERATURE GROWTH OF DIAMOND, DIAMOND AND RELATED MATERIALS, 6(8), 1997, pp. 964-969
Citation: W. Luithardt et C. Benndorf, SINGLE-SOURCE DEPOSITION OF ME-C-H FILMS USING METAL-ORGANIC PRECURSORS, DIAMOND AND RELATED MATERIALS, 6(5-7), 1997, pp. 533-536
Citation: W. Luithardt et C. Benndorf, METAL INCORPORATION INTO DIAMOND-LIKE CARBON-FILMS FROM SINGLE-SOURCEMETALORGANIC PRECURSORS, Solid state ionics, 101, 1997, pp. 91-96
Citation: W. Hoffmann et C. Benndorf, INVESTIGATIONS ON THE INFLUENCE OF SUBSTRATE GEOMETRY OF FLAT AND STEPPED RUTHENIUM SURFACES RU(0001) AND RU(10(1)OVER-BAR8) ON THE ADSORPTION-KINETICS OF H2O AND D2O, Surface science, 377(1-3), 1997, pp. 681-686
Authors:
BENNDORF C
HADENFELDT S
LUITHARDT W
ZHUKOV A
Citation: C. Benndorf et al., PHOTOELECTRON SPECTROSCOPIC INVESTIGATIONS AND EXOELECTRON EMISSION OF CVD DIAMOND SURFACES MODIFIED WITH OXYGEN AND POTASSIUM, DIAMOND AND RELATED MATERIALS, 5(6-8), 1996, pp. 784-789
Citation: W. Luithardt et al., DEPOSITION OF METAL-CONTAINING DIAMOND-LIKE CARBON-FILMS FROM METAL-ORGANIC PRECURSORS USING A PLASMA ACTIVATED RF PROCESS, DIAMOND AND RELATED MATERIALS, 5(3-5), 1996, pp. 415-419
Citation: F. Hentschel et al., CHEMICAL-VAPOR-DEPOSITION OF DIAMOND AT LOW SUBSTRATE TEMPERATURES USING FLUORINATED PRECURSORS, Thin solid films, 291, 1996, pp. 196-199
Citation: W. Luithardt et C. Benndorf, FE-C-H-FILM GROWTH BY PLASMA-ASSISTED CVD FROM ORGANOMETALLIC PRECURSORS, Thin solid films, 291, 1996, pp. 200-205
Citation: C. Benndorf et al., FUNDAMENTAL GAS PROCESSES FOR THE CVD DIAMOND GROWTH FROM H-2 C2H2/O-2 AND AR/C2H2/O-2 MIXTURES/, Physica status solidi. a, Applied research, 154(1), 1996, pp. 5-21
Citation: I. Schmidt et al., GAS-PHASE COMPOSITION AND FILM PROPERTIES OF HOT-FILAMENT DIAMOND SYNTHESIS FROM CH4-H-2-O-2 GAS-MIXTURES, DIAMOND AND RELATED MATERIALS, 4(5-6), 1995, pp. 725-729
Citation: W. Luithardt et C. Benndorf, DEPOSITION OF FE-C-H COATINGS FROM A FERROCENE PRECURSOR IN A PLASMA-ACTIVATED RF PROCESS, DIAMOND AND RELATED MATERIALS, 4(4), 1995, pp. 346-349
Citation: C. Benndorf et al., MASS AND OPTICAL-EMISSION SPECTROSCOPY OF PLASMAS FOR DIAMOND-SYNTHESIS, Pure and applied chemistry, 66(6), 1994, pp. 1195-1205
Citation: P. Joeris et al., INVESTIGATIONS CONCERNING THE ROLE OF HYDROGEN IN THE DEPOSITION OF DIAMOND FILMS, Surface & coatings technology, 59(1-3), 1993, pp. 310-315
Citation: C. Benndorf et al., DEPOSITION OF ME C-H COATINGS FROM METAL-ORGANIC PRECURSORS USING A PLASMA-ACTIVATED RF PROCESS, Surface & coatings technology, 59(1-3), 1993, pp. 345-349