Citation: Br. Chalamala et Rh. Reuss, Development of thin-film metal hydrides for integration into field emission displays, APPL PHYS L, 78(19), 2001, pp. 2967-2969
Citation: Br. Chalamala et Rh. Reuss, Argon inclusion in sputtered films and the effect of the gas on molybdenumfield emitter arrays, APPL PHYS L, 78(15), 2001, pp. 2151-2153
Citation: Br. Chalamala et Rh. Reuss, Studies on the interaction between thin film materials and Mo field emitter arrays, J VAC SCI B, 18(4), 2000, pp. 1825-1832
Authors:
Chalamala, BR
Wei, Y
Reuss, RH
Aggarwal, S
Perusse, SR
Gnade, BE
Ramesh, R
Citation: Br. Chalamala et al., Stability and chemical composition of thermally grown iridium-oxide thin films, J VAC SCI B, 18(4), 2000, pp. 1919-1922
Citation: Br. Chalamala et al., Apparatus for quantitative analysis of residual gases in flat panel vacuumpackages, J VAC SCI A, 18(2), 2000, pp. 343-348
Citation: Ka. Dean et al., Three behavioral states observed in field emission from single-walled carbon nanotubes, J VAC SCI B, 17(5), 1999, pp. 1959-1969
Authors:
Bernhard, JM
Rouse, AA
Sosa, ED
Gnade, BE
Golden, DE
Chalamala, BR
Citation: Jm. Bernhard et al., A compact electron energy analyzer for measuring field emission energy distributions, REV SCI INS, 70(8), 1999, pp. 3299-3302
Citation: Ka. Dean et Br. Chalamala, The environmental stability of field emission from single-walled carbon nanotubes, APPL PHYS L, 75(19), 1999, pp. 3017-3019
Authors:
Chalamala, BR
Wei, Y
Reuss, RH
Aggarwal, S
Gnade, BE
Ramesh, R
Bernhard, JM
Sosa, ED
Golden, DE
Citation: Br. Chalamala et al., Effect of growth conditions on surface morphology and photoelectric work function characteristics of iridium oxide thin films, APPL PHYS L, 74(10), 1999, pp. 1394-1396
Citation: Br. Chalamala et al., Effect of CH4 on the electron emission characteristics of active molybdenum field emitter arrays, J VAC SCI B, 16(6), 1998, pp. 3073-3076