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Results: 1-9 |
Results: 9

Authors: KALKA T PREINESBERGER C VANDRE S DAHNEPRIETSCH M
Citation: T. Kalka et al., STM STUDY OF EPITAXIAL DY SILICIDES ON SI(111) AND SI(001) USING ULTRA-SHARP TIPS PREPARED BY ION-BOMBARDMENT, Applied physics A: Materials science & processing, 66, 1998, pp. 1073-1075

Authors: MANKE I PAHLKE D LORBACHER J BUSSE W KALKA T RICHTER W DAHNEPRIETSCH M
Citation: I. Manke et al., A LOW-TEMPERATURE SCANNING NEAR-FIELD OPTICAL MICROSCOPE FOR PHOTOLUMINESCENCE AT SEMICONDUCTOR STRUCTURES, Applied physics A: Materials science & processing, 66, 1998, pp. 381-384

Authors: VANDRE S KALKA T PREINESBERGER C MANKE I EISELE H DAHNEPRIETSCH M MEIER R WESCHKE E KAINDL G
Citation: S. Vandre et al., GROWTH AND ELECTRONIC-STRUCTURE OF DY SILICIDE ON SI(111), Applied surface science, 123, 1998, pp. 100-103

Authors: PAHLKE D MANKE I HEINRICHSDORFF F DAHNEPRIETSCH M RICHTER W
Citation: D. Pahlke et al., PHOTOLUMINESCENCE OF BURIED INGAAS GAAS QUANTUM DOTS SPECTRALLY IMAGED BY SCANNING NEAR-FIELD OPTICAL MICROSCOPY/, Applied surface science, 123, 1998, pp. 400-404

Authors: PREINESBERGER C VANDRE S KALKA T DAHNEPRIETSCH M
Citation: C. Preinesberger et al., FORMATION OF DYSPROSIUM SILICIDE WIRES ON SI(001), Journal of physics. D, Applied physics, 31(12), 1998, pp. 43-45

Authors: DAHNEPRIETSCH M MANKE I KALKA T WEN HJ KAINDL G
Citation: M. Dahneprietsch et al., LOW-DENSITY OF STATES AT THE EPITAXIAL CAF2-SI(111) INTERFACE, Journal of physics. D, Applied physics, 30(12), 1997, pp. 48-50

Authors: WEN HJ DAHNEPRIETSCH M BAUER A MANKE I KAINDL G
Citation: Hj. Wen et al., STABILITY OF CAF2 SI(111) AND AL/CAF2/SI(111) INTERFACE SYSTEMS STUDIED WITH PHOTOELECTRON-SPECTROSCOPY AND SCANNING-TUNNELING-MICROSCOPY/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1645-1652

Authors: MANKE I WEN HJ HOHR A BAUER A DAHNEPRIETSCH M KAINDL G
Citation: I. Manke et al., FORMATION OF THE CESIX SI(111) INTERFACE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1657-1665

Authors: WEN HJ DAHNEPRIETSCH M BAUER A CUBERES MT MANKE I KAINDL G
Citation: Hj. Wen et al., THERMAL ANNEALING OF THE EPITAXIAL AL SI(111)7X7 INTERFACE - AL CLUSTERING, INTERFACIAL REACTION, AND AL-INDUCED P(+) DOPING/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(5), 1995, pp. 2399-2406
Risultati: 1-9 |