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Results: 1-25 | 26-27
Results: 1-25/27
DETECTION OF MOVEMENT WITH LASER SPECKLE PATTERNS - STATISTICAL PROPERTIES
Authors: SCHNELL U PIOT J DANDLIKER R
Citation: U. Schnell et al., DETECTION OF MOVEMENT WITH LASER SPECKLE PATTERNS - STATISTICAL PROPERTIES, Journal of the Optical Society of America. A, Optics, image science,and vision., 15(1), 1998, pp. 207-216
HOLOGRAPHIC MEMORY WITH CORRELATOR BASED READOUT
Authors: DUELLI M POURZAND AR COLLINGS N DANDLIKER R
Citation: M. Duelli et al., HOLOGRAPHIC MEMORY WITH CORRELATOR BASED READOUT, IEEE journal of selected topics in quantum electronics, 4(5), 1998, pp. 849-855
SPECIAL ISSUE ON OPTOELECTRONIC DISTANCE DISPLACEMENT MEASUREMENTS AND APPLICATIONS/
Authors: BOSCH T DANDLIKER R DONATI S HAUSLER G LESCURE M MYLLYLA R
Citation: T. Bosch et al., SPECIAL ISSUE ON OPTOELECTRONIC DISTANCE DISPLACEMENT MEASUREMENTS AND APPLICATIONS/, Journal of optics, 29(3), 1998, pp. 3-3
DISTANCE MEASUREMENT BY MULTIPLE-WAVELENGTH INTERFEROMETRY
Authors: DANDLIKER R SALVADE Y ZIMMERMANN E
Citation: R. Dandliker et al., DISTANCE MEASUREMENT BY MULTIPLE-WAVELENGTH INTERFEROMETRY, Journal of optics, 29(3), 1998, pp. 105-114
SCANNING NEAR-FIELD OPTICAL MICROSCOPY - TRANSFER-FUNCTION AND RESOLUTION LIMIT
Authors: BLATTNER P HERZIG HP DANDLIKER R
Citation: P. Blattner et al., SCANNING NEAR-FIELD OPTICAL MICROSCOPY - TRANSFER-FUNCTION AND RESOLUTION LIMIT, Optics communications, 155(4-6), 1998, pp. 245-250
EXCITED-STATE ABSORPTION AND GAIN MEASUREMENT AT 1.3 MU-M IN ND3- EFFECT OF CESIUM ON ESA CROSS-SECTION( DOPED SILICA FIBERS WITH DIFFERENTCODOPANTS )
Authors: ROCHAT E WOODTLI A DANDLIKER R
Citation: E. Rochat et al., EXCITED-STATE ABSORPTION AND GAIN MEASUREMENT AT 1.3 MU-M IN ND3- EFFECT OF CESIUM ON ESA CROSS-SECTION( DOPED SILICA FIBERS WITH DIFFERENTCODOPANTS ), Journal of lightwave technology, 15(8), 1997, pp. 1573-1577
OPTICAL DISPLACEMENT MEASUREMENT WITH GAAS ALCAAS-BASED MONOLITHICALLY INTEGRATED MICHELSON INTERFEROMETERS/
Authors: HOFSTETTER D ZAPPE HP DANDLIKER R
Citation: D. Hofstetter et al., OPTICAL DISPLACEMENT MEASUREMENT WITH GAAS ALCAAS-BASED MONOLITHICALLY INTEGRATED MICHELSON INTERFEROMETERS/, Journal of lightwave technology, 15(4), 1997, pp. 663-670
MICROLENS LITHOGRAPHY AND SMART MASKS
Authors: VOLKEL R HERZIG HP NUSSBAUM P BLATTNER P DANDLIKER R CULLMANN E HUGLE WB
Citation: R. Volkel et al., MICROLENS LITHOGRAPHY AND SMART MASKS, Microelectronic engineering, 35(1-4), 1997, pp. 513-516
PURE PHASE CORRELATOR WITH PHOTOREFRACTIVE FILTER MEMORY
Authors: DUELLI M POURZAND AR COLLINGS N DANDLIKER R
Citation: M. Duelli et al., PURE PHASE CORRELATOR WITH PHOTOREFRACTIVE FILTER MEMORY, Optics letters, 22(2), 1997, pp. 87-89
A MONOLITHICALLY INTEGRATED DOUBLE MICHELSON INTERFEROMETER FOR OPTICAL DISPLACEMENT MEASUREMENT WITH DIRECTION DETERMINATION
Authors: HOFSTETTER D ZAPPE HP DANDLIKER R
Citation: D. Hofstetter et al., A MONOLITHICALLY INTEGRATED DOUBLE MICHELSON INTERFEROMETER FOR OPTICAL DISPLACEMENT MEASUREMENT WITH DIRECTION DETERMINATION, IEEE photonics technology letters, 8(10), 1996, pp. 1370-1372
CHARACTERIZATION OF THE FLUORESCENT LIFETIME OF DOPED FIBERS BY MEASURING THE FREQUENCY TRANSFER-FUNCTION
Authors: MOREL J WOODTLI A DANDLIKER R
Citation: J. Morel et al., CHARACTERIZATION OF THE FLUORESCENT LIFETIME OF DOPED FIBERS BY MEASURING THE FREQUENCY TRANSFER-FUNCTION, Journal of lightwave technology, 14(5), 1996, pp. 739-742
MICROLENS LITHOGRAPHY - A NEW APPROACH FOR LARGE DISPLAY FABRICATION
Authors: VOLKEL R HERZIG HP NUSSBAUM P SINGER W DANDLIKER R HUGLE WB
Citation: R. Volkel et al., MICROLENS LITHOGRAPHY - A NEW APPROACH FOR LARGE DISPLAY FABRICATION, Microelectronic engineering, 30(1-4), 1996, pp. 107-110
DISPERSIVE WHITE-LIGHT INTERFEROMETRY FOR ABSOLUTE DISTANCE MEASUREMENT WITH DIELECTRIC MULTILAYER SYSTEMS ON THE TARGET
Authors: SCHNELL U DANDLIKER R GRAY S
Citation: U. Schnell et al., DISPERSIVE WHITE-LIGHT INTERFEROMETRY FOR ABSOLUTE DISTANCE MEASUREMENT WITH DIELECTRIC MULTILAYER SYSTEMS ON THE TARGET, Optics letters, 21(7), 1996, pp. 528-530
STABILIZED 3-WAVELENGTH SOURCE CALIBRATED BY ELECTRONIC MEANS FOR HIGH-ACCURACY ABSOLUTE DISTANCE MEASUREMENT
Authors: ZIMMERMANN E SALVADE Y DANDLIKER R
Citation: E. Zimmermann et al., STABILIZED 3-WAVELENGTH SOURCE CALIBRATED BY ELECTRONIC MEANS FOR HIGH-ACCURACY ABSOLUTE DISTANCE MEASUREMENT, Optics letters, 21(7), 1996, pp. 531-533
MICROLENS ARRAY IMAGING-SYSTEM FOR PHOTOLITHOGRAPHY
Authors: VOLKEL R HERZIG HP NUSSBAUM P DANDLIKER R HUGLE WB
Citation: R. Volkel et al., MICROLENS ARRAY IMAGING-SYSTEM FOR PHOTOLITHOGRAPHY, Optical engineering, 35(11), 1996, pp. 3323-3330
SCATTERING OF AN OFF-AXIS GAUSSIAN-BEAM BY A DIELECTRIC CYLINDER COMPARED WITH A RIGOROUS ELECTROMAGNETIC APPROACH
Authors: ZIMMERMANN E DANDLIKER R SOULI N KRATTIGER B
Citation: E. Zimmermann et al., SCATTERING OF AN OFF-AXIS GAUSSIAN-BEAM BY A DIELECTRIC CYLINDER COMPARED WITH A RIGOROUS ELECTROMAGNETIC APPROACH, Journal of the Optical Society of America. A, Optics, image science,and vision., 12(2), 1995, pp. 398-403
NONCONVENTIONAL TECHNIQUES FOR OPTICAL LITHOGRAPHY
Authors: DANDLIKER R GRAY S CLUBE F HERZIG HP VOLKEL R
Citation: R. Dandliker et al., NONCONVENTIONAL TECHNIQUES FOR OPTICAL LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 205-211
HIGH-ACCURACY DISTANCE MEASUREMENTS WITH MULTIPLE-WAVELENGTH INTERFEROMETRY
Authors: DANDLIKER R HUG K POLITCH J ZIMMERMANN E
Citation: R. Dandliker et al., HIGH-ACCURACY DISTANCE MEASUREMENTS WITH MULTIPLE-WAVELENGTH INTERFEROMETRY, Optical engineering, 34(8), 1995, pp. 2407-2412
MONOLITHICALLY INTEGRATED OPTICAL DISPLACEMENT SENSOR IN GAAS ALGAAS/
Authors: HOFSTETTER D ZAPPE HP DANDLIKER R
Citation: D. Hofstetter et al., MONOLITHICALLY INTEGRATED OPTICAL DISPLACEMENT SENSOR IN GAAS ALGAAS/, Electronics Letters, 31(24), 1995, pp. 2121-2122
IMPROVEMENT OF SPECKLE STATISTICS IN DOUBLE-WAVELENGTH SUPERHETERODYNE INTERFEROMETRY
Authors: DANDLIKER R GEISER M GIUNTI C ZATTI S MARGHERI G
Citation: R. Dandliker et al., IMPROVEMENT OF SPECKLE STATISTICS IN DOUBLE-WAVELENGTH SUPERHETERODYNE INTERFEROMETRY, Applied optics, 34(31), 1995, pp. 7197-7201
INTERFEROMETRIC FABRICATION OF MODULATED SUBMICROMETER GRATINGS IN PHOTORESIST
Authors: EHBETS P HERZIG HP NUSSBAUM P BLATTNER P DANDLIKER R
Citation: P. Ehbets et al., INTERFEROMETRIC FABRICATION OF MODULATED SUBMICROMETER GRATINGS IN PHOTORESIST, Applied optics, 34(14), 1995, pp. 2540-2547
HOLOGRAM-BASED THERMOOPTIC ABSORBENCY DETECTION IN CAPILLARY ELECTROPHORESIS - SEPARATION OF NUCLEOSIDES AND NUCLEOTIDES
Authors: KRATTIGER B BRUNO AE WIDMER HM DANDLIKER R
Citation: B. Krattiger et al., HOLOGRAM-BASED THERMOOPTIC ABSORBENCY DETECTION IN CAPILLARY ELECTROPHORESIS - SEPARATION OF NUCLEOSIDES AND NUCLEOTIDES, Analytical chemistry, 67(1), 1995, pp. 124-130
A TM3-M PUMPED AT 809 NM( SENSITIZED HO3+ SILICA LASER AT 2.04 MU)
Authors: GHISLER C LUTHY W WEBER HP MOREL J WOODTLI A DANDLIKER R NEUMAN V BERTHOU H KOTROTSIOS G
Citation: C. Ghisler et al., A TM3-M PUMPED AT 809 NM( SENSITIZED HO3+ SILICA LASER AT 2.04 MU), Optics communications, 109(3-4), 1994, pp. 279-281
RECIPROCAL REFLECTION INTERFEROMETER FOR A FIBEROPTIC FARADAY CURRENTSENSOR
Authors: FROSIO G DANDLIKER R
Citation: G. Frosio et R. Dandliker, RECIPROCAL REFLECTION INTERFEROMETER FOR A FIBEROPTIC FARADAY CURRENTSENSOR, Applied optics, 33(25), 1994, pp. 6111-6122
BEAM SHAPING OF HIGH-POWER LASER-DIODE ARRAYS BY CONTINUOUS SURFACE-RELIEF ELEMENTS
Authors: EHBETS P HERZIG HP DANDLIKER R REGNAULT P KJELBERG I
Citation: P. Ehbets et al., BEAM SHAPING OF HIGH-POWER LASER-DIODE ARRAYS BY CONTINUOUS SURFACE-RELIEF ELEMENTS, J. mod. opt., 40(4), 1993, pp. 637-645
Risultati: 1-25 | 26-27