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Results: 1-20 |
Results: 20
Tow-dimensional simulation of a pulsed-power electronegative discharge
Authors: Ramamurthi, B Economou, DJ
Citation: B. Ramamurthi et Dj. Economou, Tow-dimensional simulation of a pulsed-power electronegative discharge, J PHYS IV, 11(PR3), 2001, pp. 163-170
Spatiotemporal dynamics of charged species in the afterglow of plasmas containing negative ions - art. no. 036402
Authors: Kaganovich, ID Ramamurthi, BN Economou, DJ
Citation: Id. Kaganovich et al., Spatiotemporal dynamics of charged species in the afterglow of plasmas containing negative ions - art. no. 036402, PHYS REV E, 6403(3), 2001, pp. 6402
Anisotropic etching of polymer films by high energy (similar to 100s of eV) oxygen atom neutral beams
Authors: Panda, S Economou, DJ Chen, L
Citation: S. Panda et al., Anisotropic etching of polymer films by high energy (similar to 100s of eV) oxygen atom neutral beams, J VAC SCI A, 19(2), 2001, pp. 398-404
Dynamics of ion-ion plasmas under radio frequency bias
Authors: Midha, V Economou, DJ
Citation: V. Midha et Dj. Economou, Dynamics of ion-ion plasmas under radio frequency bias, J APPL PHYS, 90(3), 2001, pp. 1102-1114
Spatio-temporal evolution of a pulsed chlorine discharge
Authors: Midha, V Economou, DJ
Citation: V. Midha et Dj. Economou, Spatio-temporal evolution of a pulsed chlorine discharge, PLASMA SOUR, 9(3), 2000, pp. 256-269
SiO2 etching in inductively coupled C2F6 plasmas: surface chemistry and two-dimensional simulations
Authors: Feldsien, J Kim, D Economou, DJ
Citation: J. Feldsien et al., SiO2 etching in inductively coupled C2F6 plasmas: surface chemistry and two-dimensional simulations, THIN SOL FI, 374(2), 2000, pp. 311-325
Proceedings of the 2nd International Workshop on basic aspects of non-equilibrium plasmas interacting with surfaces (BANPIS-2000) - Huis Ten Bosch, Nagasaki, Japan, January 28-30, 2000 - Preface
Authors: Tachibana, K Economou, DJ Graves, DB Kroesen, GMW Ono, K Sugai, H
Citation: K. Tachibana et al., Proceedings of the 2nd International Workshop on basic aspects of non-equilibrium plasmas interacting with surfaces (BANPIS-2000) - Huis Ten Bosch, Nagasaki, Japan, January 28-30, 2000 - Preface, THIN SOL FI, 374(2), 2000, pp. VII-VII
Modeling and simulation of plasma etching reactors for microelectronics
Authors: Economou, DJ
Citation: Dj. Economou, Modeling and simulation of plasma etching reactors for microelectronics, THIN SOL FI, 365(2), 2000, pp. 348-367
Negative ion density fronts during ignition and extinction of plasmas in electronegative gases
Authors: Kaganovich, ID Economou, DJ Ramamurthi, BN Midha, V
Citation: Id. Kaganovich et al., Negative ion density fronts during ignition and extinction of plasmas in electronegative gases, PHYS REV L, 84(9), 2000, pp. 1918-1921
Effect of metastable oxygen molecules in high density power-modulated oxygen discharges
Authors: Panda, S Economou, DJ Meyyappan, M
Citation: S. Panda et al., Effect of metastable oxygen molecules in high density power-modulated oxygen discharges, J APPL PHYS, 87(12), 2000, pp. 8323-8333
Self-trapping of negative ions due to electron detachment in the afterglowof electronegative gas plasmas
Authors: Kaganovich, ID Ramamurthi, BN Economou, DJ
Citation: Id. Kaganovich et al., Self-trapping of negative ions due to electron detachment in the afterglowof electronegative gas plasmas, APPL PHYS L, 76(20), 2000, pp. 2844-2846
Two-dimensional plasma reactor simulation with self-consistent coupling ofgas flow with plasma transport
Authors: Nam, SK Shin, CB Economou, DJ
Citation: Sk. Nam et al., Two-dimensional plasma reactor simulation with self-consistent coupling ofgas flow with plasma transport, MAT SC S PR, 2(3), 1999, pp. 271-279
Special issue on the modeling of collisional or near-collisionless low-temperature plasmas
Authors: Meyyappan, M Economou, DJ Makabe, T
Citation: M. Meyyappan et al., Special issue on the modeling of collisional or near-collisionless low-temperature plasmas, IEEE PLAS S, 27(5), 1999, pp. 1223-1224
A molecular dynamics simulation of ultrathin oxide films on silicon: Growth by thermal O atoms and sputtering by 100 eV Ar+ ions
Authors: Kubota, A Economou, DJ
Citation: A. Kubota et Dj. Economou, A molecular dynamics simulation of ultrathin oxide films on silicon: Growth by thermal O atoms and sputtering by 100 eV Ar+ ions, IEEE PLAS S, 27(5), 1999, pp. 1416-1425
Plasmoid formation and multiple steady states in a low pressure, inductively coupled electronegative plasma
Authors: Economou, DJ Wise, RS Kubota, AA
Citation: Dj. Economou et al., Plasmoid formation and multiple steady states in a low pressure, inductively coupled electronegative plasma, IEEE PLAS S, 27(1), 1999, pp. 60-61
Molecular dynamics simulations of ion-induced rearrangement of ultrathin oxide films on silicon
Authors: Kubota, AA Economou, DJ
Citation: Aa. Kubota et Dj. Economou, Molecular dynamics simulations of ion-induced rearrangement of ultrathin oxide films on silicon, IEEE PLAS S, 27(1), 1999, pp. 106-107
Low temperature chemical vapor deposition of titanium nitride films from tetrakis(ethylmethylamido)titanium and ammonia
Authors: Panda, S Kim, J Weiller, BH Economou, DJ Hoffman, DM
Citation: S. Panda et al., Low temperature chemical vapor deposition of titanium nitride films from tetrakis(ethylmethylamido)titanium and ammonia, THIN SOL FI, 357(2), 1999, pp. 125-131
Molecular dynamics simulation of silicon surface smoothing by low-energy argon cluster impact
Authors: Kim, CK Kubota, A Economou, DJ
Citation: Ck. Kim et al., Molecular dynamics simulation of silicon surface smoothing by low-energy argon cluster impact, J APPL PHYS, 86(12), 1999, pp. 6758-6762
Plasma sheath model and ion energy distribution for all radio frequencies
Authors: Panagopoulos, T Economou, DJ
Citation: T. Panagopoulos et Dj. Economou, Plasma sheath model and ion energy distribution for all radio frequencies, J APPL PHYS, 85(7), 1999, pp. 3435-3443
Bifurcation analysis of thermal runaway in microwave heating of ceramics
Authors: Gupta, N Midha, V Balakotaiah, V Economou, DJ
Citation: N. Gupta et al., Bifurcation analysis of thermal runaway in microwave heating of ceramics, J ELCHEM SO, 146(12), 1999, pp. 4659-4665
Risultati: 1-20 |