ACNP - Italian Periodicals Catalogue

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Results: 1-13 |

Results: 13

Mask blank fabrication, pattern transfer, and mounting distortion simulations for the 8-in. format SCALPEL mask

Authors: Dicks, G Engelstad, R Lovell, E Liddle, J

Citation: G. Dicks et al., Mask blank fabrication, pattern transfer, and mounting distortion simulations for the 8-in. format SCALPEL mask, MICROEL ENG, 57-8, 2001, pp. 433-438

Modeling mask fabrication and pattern transfer distortions for EPL stencilmasks

Authors: Reu, P Engelstad, R Lovell, E Magg, C Lercel, M

Citation: P. Reu et al., Modeling mask fabrication and pattern transfer distortions for EPL stencilmasks, MICROEL ENG, 57-8, 2001, pp. 467-473

Pattern transfer distortions in optical photomasks

Authors: Mikkelson, A Engelstad, R Lovell, E

Citation: A. Mikkelson et al., Pattern transfer distortions in optical photomasks, MICROEL ENG, 57-8, 2001, pp. 489-495

Inter and intramembrane resist critical dimension uniformity across a SCALPEL mask

Authors: Nordquist, K Ainley, E Resnick, DJ Weisbrod, E Martin, C Engelstad, R Masnyj, Z Mangat, P

Citation: K. Nordquist et al., Inter and intramembrane resist critical dimension uniformity across a SCALPEL mask, J VAC SCI B, 18(6), 2000, pp. 3242-3247

Modeling pattern transfer in ion-beam lithography masks

Authors: Frisque, G Tejeda, R Engelstad, R Lovell, E

Citation: G. Frisque et al., Modeling pattern transfer in ion-beam lithography masks, MICROEL ENG, 53(1-4), 2000, pp. 623-626

Comparison of silicon stencil mask distortion measurements with finite element analysis

Authors: Ehrmann, A Struck, T Chalupka, A Haugeneder, E Loschner, H Butschke, J Irmscher, M Letzkus, F Springer, R Degen, A Rangelow, IW Shi, F Sossna, E Volland, B Engelstad, R Lovell, E Tejeda, R

Citation: A. Ehrmann et al., Comparison of silicon stencil mask distortion measurements with finite element analysis, J VAC SCI B, 17(6), 1999, pp. 3107-3111

Modeling and simulation of membrane distortions in Next Generation Lithography (NGL) masks

Authors: Engelstad, R Lovell, E Dicks, G Fisher, A Tejeda, R

Citation: R. Engelstad et al., Modeling and simulation of membrane distortions in Next Generation Lithography (NGL) masks, MICROEL ENG, 46(1-4), 1999, pp. 23-26

Mask membrane distortions due to pattern transfer for electron-beam lithography (SCALPEL) masks

Authors: Dicks, G Engelstad, R Lovell, E Liddle, J

Citation: G. Dicks et al., Mask membrane distortions due to pattern transfer for electron-beam lithography (SCALPEL) masks, MICROEL ENG, 46(1-4), 1999, pp. 259-262

Stress relief structures for ion-beam projection lithography masks

Authors: Tejeda, R Engelstad, R Lovell, E Haugeneder, E Loschner, H

Citation: R. Tejeda et al., Stress relief structures for ion-beam projection lithography masks, MICROEL ENG, 46(1-4), 1999, pp. 481-484

Finite element simulation of ion-beam lithography mask fabrication

Authors: Tejeda, R Frisque, G Engelstad, R Lovell, E Haugeneder, E Loschner, H

Citation: R. Tejeda et al., Finite element simulation of ion-beam lithography mask fabrication, MICROEL ENG, 46(1-4), 1999, pp. 485-488

Assessment of thermal loading-induced distortions in optical photomasks due to e-beam multipass patterning

Authors: Shamoun, B Engelstad, R Trost, D

Citation: B. Shamoun et al., Assessment of thermal loading-induced distortions in optical photomasks due to e-beam multipass patterning, J VAC SCI B, 16(6), 1998, pp. 3558-3562

p-n junction-based wafer flow process for stencil mask fabrication

Authors: Rangelow, IW Shi, F Volland, B Sossna, E Petrashenko, A Hudek, P Sunyk, R Butschke, J Letzkus, F Springer, R Ehrmann, A Gross, G Kaesmaier, R Oelmann, A Struck, T Unger, G Chalupka, A Haugeneder, E Lammer, G Loschner, H Tejeda, R Lovell, E Engelstad, R

Citation: Iw. Rangelow et al., p-n junction-based wafer flow process for stencil mask fabrication, J VAC SCI B, 16(6), 1998, pp. 3592-3598

Optimization of the temperature distribution across stencil mask membranesunder ion beam exposure

Authors: Kim, B Engelstad, R Lovell, E Chalupka, A Haugeneder, E Lammer, G Loschner, H Lutz, J Stengl, G

Citation: B. Kim et al., Optimization of the temperature distribution across stencil mask membranesunder ion beam exposure, J VAC SCI B, 16(6), 1998, pp. 3602-3605

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