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Results: 1-24 |
Results: 24
Gated field emitter arrays
Authors: Debski, T Barth, W Rangelow, IW Biehl, S Grabiec, P Bekh, II Lushkin, AE Il'chenko, LG Kostic, I Hudek, P Mitura, S
Citation: T. Debski et al., Gated field emitter arrays, MICROEL ENG, 57-8, 2001, pp. 813-818
Evaluation and fabrication of AFM array for ESA-Midas /Rosetta space mission
Authors: Barth, W Debski, T Abedinov, N Ivanov, T Heerlein, H Volland, B Gotszalk, T Rangelow, IW Torkar, K Fritzenwallner, K Grabiec, P Studzinska, K Kostic, I Hudek, P
Citation: W. Barth et al., Evaluation and fabrication of AFM array for ESA-Midas /Rosetta space mission, MICROEL ENG, 57-8, 2001, pp. 825-831
Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings
Authors: Mikulik, P Jergel, M Baumbach, T Majkova, E Pincik, E Luby, S Ortega, L Tucoulou, R Hudek, P Kostic, I
Citation: P. Mikulik et al., Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings, J PHYS D, 34(10A), 2001, pp. A188-A192
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment
Authors: Volland, B Shi, F Heerlein, H Rangelow, IW Hudek, P Kostic, I Cekan, E Vonach, H Loeschner, H Horner, C Stengl, G Buschbeck, H Zeininger, M Bleeker, A Benschop, J
Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206
Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography
Authors: Glezos, N Argitis, P Velessiotis, D Raptis, I Hatzakis, M Hudek, P Kostic, I
Citation: N. Glezos et al., Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography, J VAC SCI B, 18(6), 2000, pp. 3431-3434
Progress on nanostructuring with Nanojet
Authors: Voigt, J Shi, F Hudek, P Rangelow, IW Edinger, K
Citation: J. Voigt et al., Progress on nanostructuring with Nanojet, J VAC SCI B, 18(6), 2000, pp. 3525-3529
Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining
Authors: Barth, W Debski, T Shi, F Hudek, P Kostic, I Rangelow, IW Biehl, S Iwert, T Grabiec, P Studzinska, K Mitura, S Bekh, II Lushkin, AE Il'chenko, LG Il'chenko, VV Haindl, G
Citation: W. Barth et al., Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining, J VAC SCI B, 18(6), 2000, pp. 3544-3548
Field emission arrays by silicon micromachining
Authors: Debski, T Volland, B Barth, W Shi, F Hudek, P Rangelow, IW Grabiec, P Studzinska, K Zaborowski, M Mitura, S
Citation: T. Debski et al., Field emission arrays by silicon micromachining, J VAC SCI B, 18(2), 2000, pp. 896-899
Multilayer gratings for X-UV optics
Authors: Jergel, M Mikulik, P Majkova, E Pincik, E Luby, S Brunel, M Hudek, P
Citation: M. Jergel et al., Multilayer gratings for X-UV optics, ACT PHYS SL, 50(4), 2000, pp. 427-438
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
Authors: Dreeskornfeld, L Segler, R Haindl, G Wehmeyer, O Rahn, S Majkova, E Kleineberg, U Heinzmann, U Hudek, P Kostic, I
Citation: L. Dreeskornfeld et al., Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy, MICROEL ENG, 54(3-4), 2000, pp. 303-314
Aqueous base developable epoxy resist for high sensitivity electron beam lithography
Authors: Argitis, P Glezos, N Vasilopoulou, M Raptis, I Hatzakis, M Everett, J Meneghini, G Palumbo, A Ardito, M Hudek, P Kostic, I
Citation: P. Argitis et al., Aqueous base developable epoxy resist for high sensitivity electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 453-456
InGaP/GaAs/InGaP quantum wires grown on pre-patterned substrates by MOVPE
Authors: Novak, J Kicin, S Hasenohrl, S Vavra, I Kucera, M Hudek, P
Citation: J. Novak et al., InGaP/GaAs/InGaP quantum wires grown on pre-patterned substrates by MOVPE, MICROEL ENG, 51-2, 2000, pp. 11-17
Experimental results of the stochastic Coulomb interaction in ion projection lithography
Authors: de Jager, PWH Derksen, G Mertens, B Cekan, E Lammer, G Vonach, H Buschbeck, H Zeininger, M Horner, C Loschner, H Stengl, G Bleeker, AJ Benschop, J Shi, F Volland, B Hudek, P Heerlein, H Rangelow, IW Kaesmaier, R
Citation: Pwh. De Jager et al., Experimental results of the stochastic Coulomb interaction in ion projection lithography, J VAC SCI B, 17(6), 1999, pp. 3098-3106
Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices
Authors: Bruenger, WH Torkler, M Weiss, M Loschner, H Leung, K Lee, Y Hudek, P Rangelow, IW Stangl, G Fallmann, W
Citation: Wh. Bruenger et al., Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices, J VAC SCI B, 17(6), 1999, pp. 3119-3121
Directly sputtered stress-compensated carbon protective layer for silicon stencil masks
Authors: Hudek, P Hrkut, P Drzik, M Kostic, I Belov, M Torres, J Wasson, J Wolfe, JC Degen, A Rangelow, IW Voigt, J Butschke, J Letzkus, F Springer, R Ehrmann, A Kaesmaier, R Kragler, K Mathuni, J Haugeneder, E Loschner, H
Citation: P. Hudek et al., Directly sputtered stress-compensated carbon protective layer for silicon stencil masks, J VAC SCI B, 17(6), 1999, pp. 3127-3131
SEM and AFM characterisation of high-mesa patterned InP substrates prepared by wet etching
Authors: Elias, P Cambel, V Hasenohrl, S Hudek, P Novak, J
Citation: P. Elias et al., SEM and AFM characterisation of high-mesa patterned InP substrates prepared by wet etching, MAT SCI E B, 66(1-3), 1999, pp. 15-20
Preparation of stair-step grooves by wet etching of AlAs/GaAs heterostructures and MOCVD growth of QWR
Authors: Kicin, S Novak, J Kucera, M Hasenohrl, S Elias, P Vavra, I Hudek, P
Citation: S. Kicin et al., Preparation of stair-step grooves by wet etching of AlAs/GaAs heterostructures and MOCVD growth of QWR, MAT SCI E B, 65(2), 1999, pp. 106-110
A design and fabrication of a 3D force sensitive microprobe for surface characterization.
Authors: Grabiec, PB Sunyk, R Shi, F Popovic, G Gotszalk, T Hudek, P Dumania, P Rangelow, IW
Citation: Pb. Grabiec et al., A design and fabrication of a 3D force sensitive microprobe for surface characterization., MICROEL ENG, 46(1-4), 1999, pp. 405-408
Resolution improvement of ion projector with a low energy spread multicuspion source
Authors: Bruenger, WH Torkler, M Leung, KN Lee, Y Williams, MD Loeschner, H Stengl, G Fallmann, W Paschke, F Stangl, G Rangelow, IW Hudek, P
Citation: Wh. Bruenger et al., Resolution improvement of ion projector with a low energy spread multicuspion source, MICROEL ENG, 46(1-4), 1999, pp. 477-480
Structural characterization of lamellar multilayer gratings by x-ray reflectivity and scanning electron microscopy
Authors: Jergel, M Mikulik, P Majkova, E Luby, S Senderak, R Pincik, E Brunel, M Hudek, P Kostic, I Konecnikova, A
Citation: M. Jergel et al., Structural characterization of lamellar multilayer gratings by x-ray reflectivity and scanning electron microscopy, J PHYS D, 32(10A), 1999, pp. A220-A223
Structural characterization of a lamellar W/Si multilayer grating
Authors: Jergel, M Mikulik, P Majkova, E Luby, S Senderak, R Pincik, E Brunel, M Hudek, P Kostic, I Konecnikova, A
Citation: M. Jergel et al., Structural characterization of a lamellar W/Si multilayer grating, J APPL PHYS, 85(2), 1999, pp. 1225-1227
Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness
Authors: Rangelow, IW Shi, F Hudek, P Grabiec, P Volland, B Givargizov, EI Stepanova, AN Obolenskaya, LN Mashkova, ES Molchanov, VA
Citation: Iw. Rangelow et al., Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness, J VAC SCI B, 16(6), 1998, pp. 3185-3191
p-n junction-based wafer flow process for stencil mask fabrication
Authors: Rangelow, IW Shi, F Volland, B Sossna, E Petrashenko, A Hudek, P Sunyk, R Butschke, J Letzkus, F Springer, R Ehrmann, A Gross, G Kaesmaier, R Oelmann, A Struck, T Unger, G Chalupka, A Haugeneder, E Lammer, G Loschner, H Tejeda, R Lovell, E Engelstad, R
Citation: Iw. Rangelow et al., p-n junction-based wafer flow process for stencil mask fabrication, J VAC SCI B, 16(6), 1998, pp. 3592-3598
Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy
Authors: Gotszalk, T Radojewski, J Grabiec, PB Dumania, P Shi, F Hudek, P Rangelow, IW
Citation: T. Gotszalk et al., Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy, J VAC SCI B, 16(6), 1998, pp. 3948-3953
Risultati: 1-24 |