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Results:
1-18
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Results: 18
Authors:
KUSANO E
KITAGAWA M
NANTO H
KINBARA A
Citation: E. Kusano et al., HARDNESS ENHANCEMENT BY COMPOSITIONALLY MODULATED STRUCTURE OF TI TINMULTILAYER FILMS/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1272-1276
Authors:
KUSANO E
KASHIWAGI N
KOBAYASHI T
NANTO H
KINBARA A
Citation: E. Kusano et al., EFFECTS OF IONIZATION POWER ON ION ENERGY-DISTRIBUTION IN IONIZED RF-SPUTTERING MEASURED BY AN ENERGY-RESOLVED MASS-SPECTROMETER, Surface & coatings technology, 109(1-3), 1998, pp. 177-181
Authors:
KINBARA A
KUSANO E
KAMIYA T
KONDO I
TAKENAKA O
Citation: A. Kinbara et al., EVALUATION OF ADHESION STRENGTH OF TI FILMS ON SI(100) BY THE INTERNAL-STRESS METHOD, Thin solid films, 317(1-2), 1998, pp. 165-168
Authors:
KUSANO E
KINBARA A
KONDO I
Citation: E. Kusano et al., FORMATION OF COMPOSITIONALLY GRADED MULTILAYER FILMS BY DISCHARGE GAS-FLOW MODULATION IN MAGNETRON SPUTTERING, Journal of non-crystalline solids, 218, 1997, pp. 58-61
Authors:
NORITAKE C
KONDO I
KONDO K
TAKENAKA O
KINBARA A
Citation: C. Noritake et al., DIFFERENCE OF SI NODULES PRECIPITATING FROM AL-X WT-PERCENT SI (X=0.5-SIMILAR-TO-3.3), Thin solid films, 282(1-2), 1996, pp. 84-89
Authors:
KUSANO E
KINBARA A
Citation: E. Kusano et A. Kinbara, INVESTIGATION OF THE EFFECTS OF PUMPING SPEED AND AR O-2 RATIO ON THETRANSIENT TIME AT MODE TRANSITION IN TI-O-2 REACTIVE SPUTTERING/, Thin solid films, 282(1-2), 1996, pp. 423-426
Authors:
KOBAYASHI A
YOSHITOMI D
YOSHIHARA O
IMAYOSHI T
KINBARA A
FUMOTO T
UENO M
Citation: A. Kobayashi et al., CARBON-FILMS FOR THE PROTECTION OF MAGNETIC RECORDING DISKS, Surface & coatings technology, 72(3), 1995, pp. 152-156
Authors:
NORITAKE C
KONDO I
KONDO K
TAKENAKA O
KINBARA A
Citation: C. Noritake et al., GROWTH-MECHANISM OF SI NODULES ON BPSG, Thin solid films, 270(1-2), 1995, pp. 445-449
Authors:
KONDO I
TAKENAKA O
KAMIYA T
HAYAKAWA K
KINBARA A
Citation: I. Kondo et al., ADHESION MEASUREMENT OF TI THIN-FILMS ON SI SUBSTRATE USING INTERNAL-STRESS IN OVERCOATED NI FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 169-173
Authors:
NIWA T
SAITO T
KINBARA A
Citation: T. Niwa et al., REACTIVE SPUTTERING OF TA UNDER GRADIENT OXYGEN-PRESSURE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(5), 1993, pp. 2790-2795
Authors:
TSUZUKI K
TABUCHI S
BANNO T
KINBARA A
NAKAGAWA Y
TSUKADA T
Citation: K. Tsuzuki et al., INFLUENCE OF MAGNETIC-FIELD ON THE SELF-BIAS POTENTIAL ON A RADIO FREQUENCY-POWERED ELECTRODE IN RADIO-FREQUENCY PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(3), 1993, pp. 672-675
Authors:
YUTANI A
KOBAYASHI A
KINBARA A
Citation: A. Yutani et al., WORK-FUNCTIONS OF THIN LAB6 FILMS, Applied surface science, 70-1, 1993, pp. 737-741
Authors:
KINBARA A
NAKANO T
KOBAYASHI A
BABA S
KAJIWARA T
Citation: A. Kinbara et al., LABX THIN-FILMS PREPARED BY MAGNETRON SPUTTERING, Applied surface science, 70-1, 1993, pp. 742-745
Authors:
KINBARA A
KONDO I
Citation: A. Kinbara et I. Kondo, ADHESION MEASUREMENT OF THIN METAL-FILMS BY SCRATCH, PEEL, AND PULL METHODS, Journal of adhesion science and technology, 7(8), 1993, pp. 767-782
Authors:
KINBARA A
KIKUCHI A
BABA S
ABE T
Citation: A. Kinbara et al., EFFECT OF PLASMA TREATMENT OF PTFE SUBSTRATES ON THE ADHESION CHARACTERISTICS OF VACUUM-DEPOSITED AU FILMS, Journal of adhesion science and technology, 7(5), 1993, pp. 457-466
Authors:
KONDO I
YONEYAMA T
KONDO K
TAKENAKA O
KINBARA A
Citation: I. Kondo et al., INTERFACE STRUCTURE AND ADHESION OF SPUTTERED TI LAYERS ON SI - THE EFFECT OF HEAT-TREATMENT, Thin solid films, 236(1-2), 1993, pp. 236-239
Authors:
TSUZUKI K
BANNO T
KINBARA A
NAKAGAWA Y
TSUKADA T
Citation: K. Tsuzuki et al., MEASUREMENTS OF DISTRIBUTION OF SELF-BIAS POTENTIAL ON AN RF-PLANE ELECTRODE IN PLASMA-ETCHING DEVICES, Journal of nuclear materials, 200(3), 1993, pp. 291-295
Authors:
MICHIZONO S
SAITO Y
YAMAGUCHI S
ANAMI S
MATUDA N
KINBARA A
Citation: S. Michizono et al., DIELECTRIC MATERIALS FOR USE AS OUTPUT WINDOW IN HIGH-POWER KLYSTRONS, IEEE transactions on electrical insulation, 28(4), 1993, pp. 692-699
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