Authors:
Chiba, A
Takahashi, M
Yamanashi, H
Hoko, H
Hoshino, E
Hirano, N
Lee, BT
Ogawa, T
Ito, M
Okazaki, S
Citation: A. Chiba et al., Theoretical analysis of placement error due to absorber pattern on extremeultraviolet lithography mask, JPN J A P 1, 40(6A), 2001, pp. 3947-3952
Citation: Jl. Lee et al., AlGaAs/InGaAs pseudomorphic high electron mobility transistor using Pd/Ge ohmic contact, JPN J A P 1, 40(3A), 2001, pp. 1188-1193
Authors:
Shim, KH
Paek, MC
Lee, BT
Kim, C
Kang, JY
Citation: Kh. Shim et al., Preferential regrowth of indium-tin oxide (ITO) films deposited on GaN (0001) by rf-magnetron sputter, APPL PHYS A, 72(4), 2001, pp. 471-474
Authors:
Moon, CK
Song, HJ
Kim, JK
Park, JH
Jang, SJ
Yoo, JB
Park, HR
Lee, BT
Citation: Ck. Moon et al., Chemical-vapor-deposition growth and characterization of epitaxial 3C-SiC films on SOI substrates with thin silicon top layers, J MATER RES, 16(1), 2001, pp. 24-27
Citation: Hr. Park et al., Characterization of the hole capacitance of hydrogenated amorphous siliconmetal-insulator-semiconductor structures, J APPL PHYS, 90(12), 2001, pp. 6226-6229
Citation: Bt. Lee et al., Fabrication of polymeric large-core waveguides for optical interconnects using a rubber molding process, IEEE PHOTON, 12(1), 2000, pp. 62-64
Citation: Bt. Lee et al., High-temperature interfacial reaction of an Al thin film with single-crystal 6H-SiC, J MATER RES, 15(11), 2000, pp. 2284-2287
Citation: Bt. Lee et Cs. Hwang, Influences of interfacial intrinsic low-dielectric layers on the dielectric properties of sputtered (Ba,Sr)TiO3 thin films, APPL PHYS L, 77(1), 2000, pp. 124-126
Authors:
Lee, BT
Kim, DK
Moon, CK
Kim, JK
Seo, YH
Nahm, KS
Lee, HJ
Lee, KW
Yu, KS
Kim, Y
Jang, SJ
Citation: Bt. Lee et al., Microstructural investigation of low temperature chemical vapor deposited 3C-SiC/Si thin films using single-source precursors, J MATER RES, 14(1), 1999, pp. 24-28
Authors:
Lee, BT
Kim, WD
Lee, KH
Lim, HJ
Kang, CS
Hideki, H
Joo, SH
Park, HB
Yoo, CY
Lee, SI
Lee, MY
Citation: Bt. Lee et al., Electrical properties of sputtered (Ba,Sr)TiO3 thin films prepared by two-step deposition method, J ELEC MAT, 28(4), 1999, pp. L9-L12
Citation: Bt. Lee et al., Characterization of heavy deposits on InP mesa sidewalls reactive ion etched using CH4/H-2 plasma, SEMIC SCI T, 14(4), 1999, pp. 345-349
Citation: Bt. Lee et Hd. Kim, In situ synthesis of TiN-reinforced Si3N4 matrix composites using Si and sponge Ti powders, J MATER SCI, 34(24), 1999, pp. 6169-6176
Authors:
Hwang, CS
Lee, BT
Kang, CS
Lee, KH
Cho, HJ
Hideki, H
Kim, WD
Lee, SI
Lee, MY
Citation: Cs. Hwang et al., Depletion layer thickness and Schottky type carrier injection at the interface between Pt electrodes and (Ba, Sr)TiO3 thin films, J APPL PHYS, 85(1), 1999, pp. 287-295
Authors:
Park, JW
Park, KS
Lee, BT
Lee, CH
Lee, SD
Choi, JB
Yoo, KH
Kim, J
Oh, SC
Park, SI
Kim, KT
Kim, JJ
Citation: Jw. Park et al., Enhancement of Coulomb blockade and tunability by multidot coupling in a silicon-on-insulator-based single-electron transistor, APPL PHYS L, 75(4), 1999, pp. 566-568
Authors:
Lee, BT
Park, JW
Park, KS
Lee, CH
Paik, SW
Lee, SD
Choi, JB
Min, KS
Park, JS
Hahn, SY
Park, TJ
Shin, H
Hong, SC
Lee, K
Kwon, HC
Park, SI
Kim, KT
Yoo, KH
Citation: Bt. Lee et al., Fabrication of a dual-gate-controlled Coulomb blockade transistor based ona silicon-on-insulator structure, SEMIC SCI T, 13(12), 1998, pp. 1463-1467