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Results:
1-11
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Results: 11
Authors:
MARRIAN CRK
PERKINS FK
PARK D
DOBISZ EA
PECKERAR MC
RHEE KW
BASS R
Citation: Crk. Marrian et al., MODELING OF ELECTRON ELASTIC AND INELASTIC-SCATTERING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3864-3869
Authors:
BURKHARDT M
SILVERMAN S
SMITH HI
ANTONIADIS DA
RHEE KW
PECKERAR MC
Citation: M. Burkhardt et al., GAP CONTROL IN THE FABRICATION OF QUANTUM-EFFECT DEVICES USING X-RAY NANOLITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 307-310
Authors:
EDDY CR
KOSAKOWSKI J
SHIREY LM
DOBISZ EA
RHEE KW
CHU W
FOSTER KW
MARRIAN CRK
PECKERAR MC
Citation: Cr. Eddy et al., EFFECTS OF ETCH CHEMISTRY ON SF6-BASED TUNGSTEN ETCHING BY ELECTRON-CYCLOTRON-RESONANCE REACTIVE ION ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3351-3355
Authors:
BURKHARDT M
SMITH HI
ANTONIADIS DA
ORLANDO TP
MELLOCH MR
RHEE KW
PECKERAR MC
Citation: M. Burkhardt et al., FABRICATION USING X-RAY NANOLITHOGRAPHY AND MEASUREMENT OF COULOMB-BLOCKADE IN A VARIABLE-SIZED QUANTUM-DOT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3611-3613
Authors:
PERKINS FK
DOBISZ EA
BRANDOW SL
KOLOSKI TS
CALVERT JM
RHEE KW
KOSAKOWSKI JE
MARRIAN CRK
Citation: Fk. Perkins et al., PROXIMAL PROBE STUDY OF SELF-ASSEMBLED MONOLAYER RESIST MATERIALS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3725-3730
Authors:
CALVERT JM
CALABRESE GS
BOHLAND JF
CHEN MS
DRESSICK WJ
DULCEY CS
GEORGER JH
KOSAKOWSKI J
PAVELCHECK EK
RHEE KW
SHIREY LM
Citation: Jm. Calvert et al., PHOTORESIST CHANNEL-CONSTRAINED DEPOSITION OF ELECTROLESS METALLIZATION ON LIGATING SELF-ASSEMBLED FILMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3884-3887
Authors:
HECTOR SD
WONG VV
SMITH HI
MCCORD MA
RHEE KW
Citation: Sd. Hector et al., PRINTABILITY OF SUB-150 NM FEATURES IN X-RAY-LITHOGRAPHY - THEORY ANDEXPERIMENTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3965-3969
Authors:
YANG IY
HU H
SU LT
WONG VV
BURKHARDT M
MOON EE
CARTER JM
ANTONIADIS DA
SMITH HI
RHEE KW
CHU W
Citation: Iy. Yang et al., HIGH-PERFORMANCE SELF-ALIGNED SUB-100 NM METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS USING X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 4051-4054
Authors:
CHU W
FOSTER KW
SHIREY LM
RHEE KW
KOSAKOWSKI J
ISAACSON IP
MCCARTHY D
EDDY CR
DOBISZ EA
MARRIAN CRK
PECKERAR MC
Citation: W. Chu et al., REACTIVE ION ETCHING OF HIGH-ASPECT-RATIO 100 NM LINEWIDTH FEATURES IN TUNGSTEN, Applied physics letters, 64(16), 1994, pp. 2172-2174
Authors:
GUPTA N
HECTOR SD
RHEE KW
SMITH HI
Citation: N. Gupta et al., FABRICATION OF 100-NM T-GATES FOR MONOLITHIC MICROWAVE INTEGRATED-CIRCUITS USING X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2625-2628
Authors:
DOBISZ EA
MARRIAN CRK
SALVINO RE
ANCONA MA
RHEE KW
PECKERAR MC
Citation: Ea. Dobisz et al., THIN SILICON-NITRIDE FILMS TO INCREASE RESOLUTION IN E-BEAM LITHOGRAPHY, Optical engineering, 32(10), 1993, pp. 2452-2458
Risultati:
1-11
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