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Results: 1-11 |
Results: 11
IN-SITU STUDY OF ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O
Authors: KUKLI K AARIK J AIDLA A SIIMON H RITALA M LESKELA M
Citation: K. Kukli et al., IN-SITU STUDY OF ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O, Applied surface science, 112, 1997, pp. 236-242
THICKNESS PROFILES OF THIN-FILMS CAUSED BY SECONDARY REACTIONS IN FLOW-TYPE ATOMIC LAYER DEPOSITION REACTORS
Authors: SIIMON H AARIK J
Citation: H. Siimon et J. Aarik, THICKNESS PROFILES OF THIN-FILMS CAUSED BY SECONDARY REACTIONS IN FLOW-TYPE ATOMIC LAYER DEPOSITION REACTORS, Journal of physics. D, Applied physics, 30(12), 1997, pp. 1725-1728
CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2
Authors: AARIK J AIDLA A SAMMELSELG V SIIMON H UUSTARE T
Citation: J. Aarik et al., CONTROL OF THIN-FILM STRUCTURE BY REACTANT PRESSURE IN ATOMIC LAYER DEPOSITION OF TIO2, Journal of crystal growth, 169(3), 1996, pp. 496-502
MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR
Authors: SIIMON H AARIK J
Citation: H. Siimon et J. Aarik, MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR, Journal de physique. IV, 5(C5), 1995, pp. 245-252
REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION
Authors: SIIMON H AARIK J
Citation: H. Siimon et J. Aarik, REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION, Journal de physique. IV, 5(C5), 1995, pp. 277-282
MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR
Authors: SIIMON H AARIK J
Citation: H. Siimon et J. Aarik, MODELING OF PRECURSOR FLOW AND DEPOSITION IN ATOMIC LAYER DEPOSITION REACTOR, Journal de physique. IV, 5(C5), 1995, pp. 245-252
REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION
Authors: SIIMON H AARIK J
Citation: H. Siimon et J. Aarik, REACTIVITIES OF TACL5 AND H2O AS PRECURSORS FOR ATOMIC LAYER DEPOSITION, Journal de physique. IV, 5(C5), 1995, pp. 277-282
CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR (VOL 81, PG 281, 1994)
Authors: AARIK J SIIMON H
Citation: J. Aarik et H. Siimon, CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR (VOL 81, PG 281, 1994), Applied surface science, 90(1), 1995, pp. 109-109
CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR
Authors: AARIK J SIIMON H
Citation: J. Aarik et H. Siimon, CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR, Applied surface science, 81(3), 1994, pp. 281-287
CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR
Authors: AARIK J SIIMON H
Citation: J. Aarik et H. Siimon, CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR, Applied surface science, 81(3), 1994, pp. 281-287
DESORPTION ENERGIES AVERAGED OVER THE DESORPTION PROCESS BY MODEL-CALCULATIONS
Authors: SIIMON H UUSTARE T
Citation: H. Siimon et T. Uustare, DESORPTION ENERGIES AVERAGED OVER THE DESORPTION PROCESS BY MODEL-CALCULATIONS, Applied surface science, 75, 1994, pp. 83-86
Risultati: 1-11 |