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Results: 1-7 |
Results: 7
THEORETICAL AND EXPERIMENTAL-ANALYSIS OF WIRE SEGMENT HOLOGRAMS FOR STATISTICAL INTERCONNECT METROLOGY
Authors: ABUGHAZALEH SA STEVENSON JTM CHRISTIE P WALTON AJ
Citation: Sa. Abughazaleh et al., THEORETICAL AND EXPERIMENTAL-ANALYSIS OF WIRE SEGMENT HOLOGRAMS FOR STATISTICAL INTERCONNECT METROLOGY, IEEE transactions on semiconductor manufacturing, 11(2), 1998, pp. 225-231
X-RAY MICROFABRICATION AND NANOFABRICATION USING A LASER-PLASMA SOURCE AT 1 NM WAVELENGTH
Authors: TURCU ICE ALLOT RM MANN CM REEVES C ROSS IN LISI N MADDISON BJ MOON SW PREWETT P STEVENSON JTM ROSS AWS GUNDLACH AM KOEK B MITCHELL P ANASTASI P MCCOARD C KIM NS
Citation: Ice. Turcu et al., X-RAY MICROFABRICATION AND NANOFABRICATION USING A LASER-PLASMA SOURCE AT 1 NM WAVELENGTH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2495-2502
AN ELECTRICAL TEST STRUCTURE FOR THE MEASUREMENT OF PLANARIZATION
Authors: ELLIOTT JP FALLON M WALTON AJ STEVENSON JTM OHARA A GUNDLACH AM
Citation: Jp. Elliott et al., AN ELECTRICAL TEST STRUCTURE FOR THE MEASUREMENT OF PLANARIZATION, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 242-249
FABRICATION OF 200NM FIELD-EFFECT TRANSISTORS BY X-RAY-LITHOGRAPHY USING A LASER-PLASMA X-RAY SOURCE
Authors: REEVES CM TURCU ICE STEVENSON JTM ROSS AWS GUNDLACH AM PREWETT P LAWES RA ANASTASI P BURGE R MICHELL P
Citation: Cm. Reeves et al., FABRICATION OF 200NM FIELD-EFFECT TRANSISTORS BY X-RAY-LITHOGRAPHY USING A LASER-PLASMA X-RAY SOURCE, Microelectronic engineering, 30(1-4), 1996, pp. 187-190
180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE
Authors: TURCU ICE REEVES CM STEVENSON JTM ROSS AWS GUNDLACH AM PREWETT P ANASTASI P KOEK B MITCHELL P LAKE P
Citation: Ice. Turcu et al., 180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE, Microelectronic engineering, 27(1-4), 1995, pp. 295-298
DESIGN CONSIDERATIONS FOR A GAUDI TEST STRUCTURE WHICH CAN BE USED TODETERMINE THE OPTIMUM FOCUS
Authors: FALLON M WALTON AJ STEVENSON JTM ROSS AWS
Citation: M. Fallon et al., DESIGN CONSIDERATIONS FOR A GAUDI TEST STRUCTURE WHICH CAN BE USED TODETERMINE THE OPTIMUM FOCUS, IEEE transactions on semiconductor manufacturing, 7(3), 1994, pp. 272-278
IMPROVED STRUCTURE FOR OPTIMIZATION OF FOCUS AND EXPOSURE FOR IC PRODUCTION
Authors: WALTON AJ FALLON M STEVENSON JTM ROSS AWS REEVES CM
Citation: Aj. Walton et al., IMPROVED STRUCTURE FOR OPTIMIZATION OF FOCUS AND EXPOSURE FOR IC PRODUCTION, Electronics Letters, 29(17), 1993, pp. 1573-1574
Risultati: 1-7 |