Authors:
WIELAND U
SUHR H
SALZBERGER B
EGGERS HJ
BRAUN RW
KUHN JE
Citation: U. Wieland et al., QUANTIFICATION OF HIV-1 PROVIRAL DNA AND ANALYSIS OF GENOMIC DIVERSITY BY POLYMERASE CHAIN-REACTION AND TEMPERATURE-GRADIENT GEL-ELECTROPHORESIS, Journal of virological methods, 57(2), 1996, pp. 127-139
Authors:
RAMIREZ J
SUHR H
SZEPES L
ZANATHY L
NAGY A
Citation: J. Ramirez et al., DEPOSITION OF SILICON-CARBIDE FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Journal of organometallic chemistry, 514(1-2), 1996, pp. 23-28
Citation: P. Spatenka et al., FORMATION OF HAFNIUM CARBIDE THIN-FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FROM BIS(ETA-CYCLOPENTADIENYL)DIMETHYLHAFNIUM AS PRECURSOR, Applied physics A: Materials science & processing, 60(3), 1995, pp. 285-288
Citation: P. Spatenka et al., LANGMUIR PROBE MEASUREMENTS DURING PLASMA-ACTIVATED CHEMICAL-VAPOR-DEPOSITION IN THE SYSTEM ARGON HYDROGEN/DICYCLOPENTADIENYLDIMETHYLHAFIUM/, Plasma chemistry and plasma processing, 15(3), 1995, pp. 371-381
Authors:
SUHR H
WEHNERT G
SCHNEIDER K
BITTNER C
SCHOLZ T
GEISSLER P
JAHNE B
SCHEPER T
Citation: H. Suhr et al., IN-SITU MICROSCOPY FOR ONLINE CHARACTERIZATION OF CELL-POPULATIONS INBIOREACTORS, INCLUDING CELL-CONCENTRATION MEASUREMENTS BY DEPTH FROM FOCUS, Biotechnology and bioengineering, 47(1), 1995, pp. 106-116
Authors:
REICH S
MESSELHAUSER J
SUHR H
ERKER G
FRITZE C
Citation: S. Reich et al., PLASMA-INDUCED CHEMICAL-VAPOR-DEPOSITION OF ZR(C,B) FROM CPZR(BH4)3 (CP = C5H5-CIRCLE-MINUS), Advanced materials, 6(9), 1994, pp. 674-676
Authors:
DEUTSCHMANN L
MESSELHAUSER J
SUHR H
HERRMANN WA
HARTER P
Citation: L. Deutschmann et al., PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF VANADIUM CARBIDE VC1-X AND VOX FROM VANADOCENE CP2V, Advanced materials, 6(5), 1994, pp. 392-395
Citation: P. Spatenka et H. Suhr, USE OF LANGMUIR PROBES FOR MONITORING OF PRECURSOR CONCENTRATIONS DURING PLASMA ACTIVATED CHEMICAL-VAPOR DEPOSITION OF HARD COATINGS, Applied physics. A, Solids and surfaces, 56(5), 1993, pp. 443-444
Citation: P. Spatenka et H. Suhr, LANGMUIR PROBE MEASUREMENTS DURING PLASMA-ACTIVATED CHEMICAL-VAPOR-DEPOSITION IN THE SYSTEM ARGON OXYGEN ALUMINUM ISOPROPOXIDE, Plasma chemistry and plasma processing, 13(3), 1993, pp. 555-566
Citation: Fw. Breitbarth et al., ON MASS-SPECTROSCOPIC AND EMISSION-SPECTROSCOPIC CVD PROCESS MONITORING OF ORGANOMETALLICS O-2 DISCHARGES/, Plasma chemistry and plasma processing, 13(2), 1993, pp. 289-309
Citation: H. Suhr et Tw. Guettinger, ERROR REDUCTION IN EDDY-CURRENT CONDUCTIVITY MEASUREMENTS, British Journal of Non-Destructive Testing, 35(11), 1993, pp. 634-638