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Results: 1-16 |
Results: 16
SPACE-CHARGE LIMITATIONS TO THROUGHPUT IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL)
Authors: LIDDLE JA BLAKEY MI KNUREK CS MKRTCHYAN MM NOVEMBRE AE OCOLA L SAUNDERS T WASKIEWICZ WK
Citation: Ja. Liddle et al., SPACE-CHARGE LIMITATIONS TO THROUGHPUT IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL), Microelectronic engineering, 42, 1998, pp. 155-158
ELECTRON-OPTICS METHOD FOR HIGH-THROUGHPUT IN A SCALPEL SYSTEM - PRELIMINARY-ANALYSIS
Authors: WASKIEWICZ WK HARRIOTT LR LIDDLE JA STANTON ST BERGER SD MUNRO E ZHU X
Citation: Wk. Waskiewicz et al., ELECTRON-OPTICS METHOD FOR HIGH-THROUGHPUT IN A SCALPEL SYSTEM - PRELIMINARY-ANALYSIS, Microelectronic engineering, 42, 1998, pp. 215-218
THE SCALPEL PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DEMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., THE SCALPEL PROOF-OF-CONCEPT SYSTEM, Microelectronic engineering, 35(1-4), 1997, pp. 477-480
PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DIMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3825-3828
THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM
Authors: LIDDLE JA BERGER SD BIDDICK CJ BLAKEY MI BOLAN KJ BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J FARROW RC FELKER JA FETTER LA FREEMAN B HARRIOTT LR HOPKINS L HUGGINS HA KNUREK CS KRAUS JS MIXON DA MKRTCHYAN MM NOVEMBRE AE PEABODY ML SIMPSON WM TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WILLIAMS JK WINDT DL
Citation: Ja. Liddle et al., THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM, JPN J A P 1, 34(12B), 1995, pp. 6663-6671
A BACKGROUND DOSE PROXIMITY EFFECT CORRECTION TECHNIQUE FOR SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY IMPLEMENTED IN HARDWARE
Authors: WATSON GP BERGER SD LIDDLE JA WASKIEWICZ WK
Citation: Gp. Watson et al., A BACKGROUND DOSE PROXIMITY EFFECT CORRECTION TECHNIQUE FOR SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY IMPLEMENTED IN HARDWARE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2504-2507
AT-WAVELENGTH METROLOGY OF 13-NM LITHOGRAPHY IMAGING OPTICS
Authors: TAN ZQ MACDOWELL AA LAFONTAINE B BJORKHOLM JE TENNANT D TAYLOR D HIMEL M FREEMAN RR WASKIEWICZ WK WINDT DL SPECTOR S RAYCHAUDHURI AK STULEN RH NG W CERRINA F
Citation: Zq. Tan et al., AT-WAVELENGTH METROLOGY OF 13-NM LITHOGRAPHY IMAGING OPTICS, Review of scientific instruments, 66(2), 1995, pp. 2241-2243
VARIATION IN STRESS WITH BACKGROUND PRESSURE IN SPUTTERED MO SI MULTILAYER FILMS/
Authors: WINDT DL BROWN WL VOLKERT CA WASKIEWICZ WK
Citation: Dl. Windt et al., VARIATION IN STRESS WITH BACKGROUND PRESSURE IN SPUTTERED MO SI MULTILAYER FILMS/, Journal of applied physics, 78(4), 1995, pp. 2423-2430
CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY
Authors: KUBIAK GD TICHENOR DA RAYCHAUDHURI AK MALINOWSKI ME STULEN RH HANEY SJ BERGER KW NISSEN RP WILKERSON GA PAUL PH BJORKHOLM JE FETTER LA FREEMAN RR HIMEL MD MACDOWELL AA TENNANT DM WOOD OR WASKIEWICZ WK WHITE DL WINDT DL JEWELL TE
Citation: Gd. Kubiak et al., CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3820-3825
MULTILAYER FACILITIES REQUIRED FOR EXTREME-ULTRAVIOLET LITHOGRAPHY
Authors: WINDT DL WASKIEWICZ WK
Citation: Dl. Windt et Wk. Waskiewicz, MULTILAYER FACILITIES REQUIRED FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3826-3832
WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY
Authors: WOOD OR BJORKHOLM JE FETTER L HIMEL MD TENNANT DM MACDOWELL AA LAFONTAINE B GRIFFITH JE TAYLOR GN WASKIEWICZ WK WINDT DL KORTRIGHT JB GULLIKSON EK NGUYEN K
Citation: Or. Wood et al., WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3841-3845
SURFACE FINISH REQUIREMENTS FOR SOFT-X-RAY MIRRORS
Authors: WINDT DL WASKIEWICZ WK GRIFFITH JE
Citation: Dl. Windt et al., SURFACE FINISH REQUIREMENTS FOR SOFT-X-RAY MIRRORS, Applied optics, 33(10), 1994, pp. 2025-2031
REPAIR OF SOFT-X-RAY OPTICAL-ELEMENTS BY STRIPPING AND REDEPOSITION OF MO SI REFLECTIVE COATINGS/
Authors: EARLY K WINDT DL WASKIEWICZ WK WOOD OR TENNANT DM
Citation: K. Early et al., REPAIR OF SOFT-X-RAY OPTICAL-ELEMENTS BY STRIPPING AND REDEPOSITION OF MO SI REFLECTIVE COATINGS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2926-2929
MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM
Authors: TENNANT DM FETTER LA HARRIOTT LR MACDOWELL AA MULGREW PP PASTALAN JZ WASKIEWICZ WK WINDT DL WOOD OR
Citation: Dm. Tennant et al., MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM, Applied optics, 32(34), 1993, pp. 7007-7011
SOFT-X-RAY PROJECTION LITHOGRAPHY EXPERIMENTS USING SCHWARZSCHILD IMAGING OPTICS
Authors: TICHENOR DA KUBIAK GD MALINOWSKI ME STULEN RH HANEY SJ BERGER KW BROWN LA SWEATT WC BJORKHOLM JE FREEMAN RR HIMEL MD MACDOWELL AA TENNANT DM WOOD OR BOKOR J JEWELL TE MANSFIELD WM WASKIEWICZ WK WHITE DL WINDT DL
Citation: Da. Tichenor et al., SOFT-X-RAY PROJECTION LITHOGRAPHY EXPERIMENTS USING SCHWARZSCHILD IMAGING OPTICS, Applied optics, 32(34), 1993, pp. 7068-7071
SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/
Authors: MACDOWELL AA BJORKHOLM JE EARLY K FREEMAN RR HIMEL MD MULGREW PP SZETO LH TAYLOR DW TENNANT DM WOOD OR BOKOR J EICHNER L JEWELL TE WASKIEWICZ WK WHITE DL WINDT DL DSOUZA RM SILFVAST WT ZERNIKE F
Citation: Aa. Macdowell et al., SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/, Applied optics, 32(34), 1993, pp. 7072-7078
Risultati: 1-16 |