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Results: 1-20 |
Results: 20

Authors: Bradby, JE Williams, JS Wong-Leung, J Swain, MV Munroe, P
Citation: Je. Bradby et al., Mechanical deformation in silicon by micro-indentation, J MATER RES, 16(5), 2001, pp. 1500-1507

Authors: Liu, ACY McCallum, JC Wong-Leung, J
Citation: Acy. Liu et al., Defect formation due to the crystallization of deep amorphous volumes formed in silicon by mega electron volt (MeV) ion implantation, J MATER RES, 16(11), 2001, pp. 3229-3237

Authors: Williams, JS Ridgway, MC Conway, MJ Wong-Leung, J Zhu, XF Petravic, M Fortuna, F Ruault, MO Bernas, H Kinomura, A Nakano, Y Hayashi, Y
Citation: Js. Williams et al., Interaction of defects and metals with nanocavities in silicon, NUCL INST B, 178, 2001, pp. 33-43

Authors: Stritzker, B Petravic, M Wong-Leung, J Williams, JS
Citation: B. Stritzker et al., Efficiency of dislocations and cavities for gettering of Cu and Fe in silicon, NUCL INST B, 175, 2001, pp. 154-158

Authors: Liu, ACY McCallum, JC Wong-Leung, J
Citation: Acy. Liu et al., The crystallisation of deep amorphous wells in silicon produced by ion implantation, NUCL INST B, 175, 2001, pp. 164-168

Authors: Wong-Leung, J Jagadish, C Conway, MJ Fitz Gerald, JD
Citation: J. Wong-leung et al., Effect of implant temperature on secondary defects created by MeV Sn implantation in silicon, J APPL PHYS, 89(5), 2001, pp. 2556-2559

Authors: Macdonald, D Cuevas, A Wong-Leung, J
Citation: D. Macdonald et al., Capture cross sections of the acceptor level of iron-boron pairs in p-typesilicon by injection-level dependent lifetime measurements, J APPL PHYS, 89(12), 2001, pp. 7932-7939

Authors: Linnarsson, MK Janson, MS Zimmermann, U Svensson, BG Persson, POA Hultman, L Wong-Leung, J Karlsson, S Schoner, A Bleichner, H Olsson, E
Citation: Mk. Linnarsson et al., Solubility limit and precipitate formation in Al-doped 4H-SiC epitaxial material, APPL PHYS L, 79(13), 2001, pp. 2016-2018

Authors: Pellegrino, P Leveque, P Wong-Leung, J Jagadish, C Svensson, BG
Citation: P. Pellegrino et al., Separation of vacancy and interstitial depth profiles in ion-implanted silicon: Experimental observation, APPL PHYS L, 78(22), 2001, pp. 3442-3444

Authors: Bradby, JE Williams, JS Wong-Leung, J Swain, MV Munroe, P
Citation: Je. Bradby et al., Mechanical deformation of InP and GaAs by spherical indentation, APPL PHYS L, 78(21), 2001, pp. 3235-3237

Authors: Williams, JS Conway, MJ Williams, BC Wong-Leung, J
Citation: Js. Williams et al., Direct observation of voids in the vacancy excess region of ion bombarded silicon, APPL PHYS L, 78(19), 2001, pp. 2867-2869

Authors: Stritzker, B Petravic, M Wong-Leung, J Williams, JS
Citation: B. Stritzker et al., Selectivity of nanocavities and dislocations for gettering of Cu and Fe insilicon, APPL PHYS L, 78(18), 2001, pp. 2682-2684

Authors: Wong-Leung, J Fatima, S Jagadish, C FitzGerald, JD
Citation: J. Wong-leung et al., Effect of implant temperature on extended defects created by ion implantation in silicon, DEFECT DIFF, 183-1, 2000, pp. 163-169

Authors: Wong-Leung, J Fatima, S Jagadish, C Fitz Gerald, JD Chou, CT Zou, J Cockayne, DJH
Citation: J. Wong-leung et al., Transmission electron microscopy characterization of secondary defects created by MeV Si, Ge, and Sn implantation in silicon, J APPL PHYS, 88(3), 2000, pp. 1312-1318

Authors: Bradby, JE Williams, JS Wong-Leung, J Swain, MV Munroe, P
Citation: Je. Bradby et al., Transmission electron microscopy observation of deformation microstructureunder spherical indentation in silicon, APPL PHYS L, 77(23), 2000, pp. 3749-3751

Authors: Williams, JS Chen, Y Wong-Leung, J Kerr, A Swain, MV
Citation: Js. Williams et al., Ultra-micro-indentation of silicon and compound semiconductors with spherical indenters, J MATER RES, 14(6), 1999, pp. 2338-2343

Authors: Li, ZL Wong-Leung, J Deenapanray, PNK Conway, M Chivers, DJ FitzGerald, JD Williams, JS
Citation: Zl. Li et al., The role of Fe on the crystallisation of alpha-Si3N4 from amorphous Si-N formed by ion implantation, NUCL INST B, 148(1-4), 1999, pp. 534-539

Authors: Wong-Leung, J Williams, JS Kinomura, A Nakano, Y Hayashi, Y Eaglesham, DJ
Citation: J. Wong-leung et al., Diffusion and transient trapping of metals in silicon, PHYS REV B, 59(12), 1999, pp. 7990-7998

Authors: Williams, JS Conway, MJ Wong-Leung, J Deenapanray, PNK Petravic, M Brown, RA Eaglesham, DJ Jacobson, DC
Citation: Js. Williams et al., The role of oxygen on the stability of gettering of metals to cavities in silicon, APPL PHYS L, 75(16), 1999, pp. 2424-2426

Authors: Fatima, S Wong-Leung, J Gerald, JF Jagadish, C
Citation: S. Fatima et al., Effect of ion mass on the evolution of extended defects during annealing of MeV ion-implanted p-type Si, APPL PHYS L, 74(8), 1999, pp. 1141-1143
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