Authors:
SOOLE JBD
AMERSFOORT MR
LEBLANC HP
ANDREADAKIS NC
RAJHEL A
CANEAU C
BHAT R
KOZA MA
YOUTSEY C
ADESIDA I
Citation: Jbd. Soole et al., USE OF MULTIMODE INTERFERENCE COUPLERS TO BROADEN THE PASSBAND OF WAVELENGTH-DISPERSIVE INTEGRATED WDM FILTERS, IEEE photonics technology letters, 8(10), 1996, pp. 1340-1342
Authors:
PANEPUCCI R
OSOWSKI ML
TURNBULL DA
GU SQ
BISHOP SG
COLEMAN JJ
ADESIDA I
Citation: R. Panepucci et al., INHOMOGENEITY IN THE FABRICATION OF INGAAS GAAS QUANTUM-WIRE ARRAYS BY SELECTIVE-AREA METALORGANIC CHEMICAL-VAPOR-DEPOSITION/, Superlattices and microstructures, 20(1), 1996, pp. 111-116
Authors:
XIANG A
WOHLMUTH W
FAY P
KANG SM
ADESIDA I
Citation: A. Xiang et al., MODELING OF INGAAS MSM PHOTODETECTOR FOR CIRCUIT-LEVEL SIMULATION, Journal of lightwave technology, 14(5), 1996, pp. 716-723
Citation: At. Ping et al., DRY-ETCHING OF GAN USING CHEMICALLY ASSISTED ION-BEAM ETCHING WITH HCL AND H-2 CL-2/, Journal of electronic materials, 25(5), 1996, pp. 825-829
Authors:
SCHMITZ AC
PING AT
KHAN MA
CHEN Q
YANG JW
ADESIDA I
Citation: Ac. Schmitz et al., SCHOTTKY-BARRIER PROPERTIES OF VARIOUS METALS ON N-TYPE GAN, Semiconductor science and technology, 11(10), 1996, pp. 1464-1467
Citation: A. Mahajan et al., HIGH-PERFORMANCE ENHANCEMENT-MODE HIGH-ELECTRON-MOBILITY TRANSISTORS (E-HEMTS) LATTICE-MATCHED TO INP, Electronics Letters, 32(11), 1996, pp. 1037-1038
Authors:
WOHLMUTH WA
ARAFA M
MAHAJAN A
FAY P
ADESIDA I
Citation: Wa. Wohlmuth et al., INGAAS METAL-SEMICONDUCTOR-METAL PHOTODETECTORS WITH ENGINEERED SCHOTTKY-BARRIER HEIGHTS, Applied physics letters, 69(23), 1996, pp. 3578-3580
Citation: C. Youtsey et I. Adesida, A COMPARATIVE-STUDY OF CL-2 AND HCL GASES FOR THE CHEMICALLY ASSISTEDION-BEAM ETCHING OF INP, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2360-2365
Authors:
PANEPUCCI R
YOUTSEY C
TURNBULL DA
GU SQ
CANEAU C
BISHOP SG
ADESIDA I
Citation: R. Panepucci et al., FABRICATION OF INP INGAAS QUANTUM WIRES BY FREE CL-2/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2752-2756
Authors:
MASLAR JE
DORSTEN JF
BOHN PW
AGARWALA S
ADESIDA I
CANEAU C
BHAT R
Citation: Je. Maslar et al., STRUCTURAL AND ELECTRONIC EFFECTS OF ARGON SPUTTERING AND REACTIVE ION ETCHING ON IN0.53GA0.47AS AND IN0.52AL0.48AS STUDIED BY INELASTIC LIGHT-SCATTERING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(3), 1995, pp. 988-994