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Authors: VAZQUEZ L SALVAREZZA RC ALBANO E ARVIA AJ CREUS AH LEVY RA ALBELLA JM
Citation: L. Vazquez et al., SURFACE-MORPHOLOGY EVOLUTION OF CHEMICAL-VAPOR-DEPOSITED TUNGSTEN FILMS ON SI(100), CHEMICAL VAPOR DEPOSITION, 4(3), 1998, pp. 89

Authors: OJEDA F CASTROGARCIA A GOMEZALEIXANDRE C ALBELLA JM
Citation: F. Ojeda et al., GROWTH-KINETICS OF CHEMICALLY VAPOR-DEPOSITED SIO2-FILMS FROM SILANE OXIDATION, Journal of materials research, 13(8), 1998, pp. 2308-2314

Authors: LOPEZ JM BABAEV VG KHVOSTOV VV ALBELLA JM
Citation: Jm. Lopez et al., HIGHLY ADHERENT DIAMOND COATINGS DEPOSITED ONTO WC-CO CEMENTED CARBIDES VIA BARRIER INTERLAYERS, Journal of materials research, 13(10), 1998, pp. 2841-2846

Authors: OLIVARESROZA J SANCHEZ O ALBELLA JM
Citation: J. Olivaresroza et al., PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION SILICON OXYNITRIDE FILMS GROWN FROM SIH4-2 GAS-MIXTURES(NH3+O), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(5), 1998, pp. 2757-2761

Authors: JIMENEZ I GARCIA MM ALBELLA JM TERMINELLO LJ
Citation: I. Jimenez et al., ORIENTATION OF GRAPHITIC PLANES DURING THE BIAS-ENHANCED NUCLEATION OF DIAMOND ON SILICON - AN X-RAY-ABSORPTION NEAR-EDGE STUDY, Applied physics letters, 73(20), 1998, pp. 2911-2913

Authors: GARCIA MM JIMENEZ I VAZQUEZ L GOMEZALEIXANDRE C ALBELLA JM SANCHEZ O TERMINELLO LJ HIMPSEL FJ
Citation: Mm. Garcia et al., X-RAY-ABSORPTION SPECTROSCOPY AND ATOMIC-FORCE MICROSCOPY STUDY OF BIAS-ENHANCED NUCLEATION OF DIAMOND FILMS, Applied physics letters, 72(17), 1998, pp. 2105-2107

Authors: NAJMI O MONTERO I GALAN L ALBELLA JM
Citation: O. Najmi et al., CARBON INCORPORATION DURING THE DIELECTRIC-BREAKDOWN PROCESS OF SILICON-OXIDE, Surface and interface analysis, 25(2), 1997, pp. 94-98

Authors: GOMEZALEIXANDRE C GARCIA MM SANCHEZ O ALBELLA JM
Citation: C. Gomezaleixandre et al., INFLUENCE OF OXYGEN ON THE NUCLEATION AND GROWTH OF DIAMOND FILMS, Thin solid films, 303(1-2), 1997, pp. 34-38

Authors: SANCHEZGARRIDO O GOMEZALEIXANDRE C OLIAS JS ALBELLA JM HERNANDEZVELEZ M GUTIERREZ FF
Citation: O. Sanchezgarrido et al., DIELECTRIC AND RAMAN-SPECTROSCOPY OF MWCVD DIAMOND THIN-FILMS, Journal of materials science. Materials in electronics, 7(4), 1996, pp. 297-303

Authors: ESSAFTI A GOMEZALEIXANDRE C ALBELLA JM
Citation: A. Essafti et al., PREPARATION OF SI-N-B FILMS BY CVD TECHNIQUES - EFFECT OF SIH4 ADDITION TO B2H6 AND NH3 GAS-MIXTURES, DIAMOND AND RELATED MATERIALS, 5(3-5), 1996, pp. 580-583

Authors: ESSAFTI A GOMEZALEIXANDRE C FIERRO JLG FERNANDEZ M ALBELLA JM
Citation: A. Essafti et al., CHEMICAL-VAPOR-DEPOSITION SYNTHESIS AND CHARACTERIZATION OF CO-DEPOSITED SILICON-NITROGEN-BORON MATERIALS, Journal of materials research, 11(10), 1996, pp. 2565-2574

Authors: SANCHEZ O AGUILAR MA FALCONY C MARTINEZDUART JM ALBELLA JM
Citation: O. Sanchez et al., SIOXNY FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING SICL4, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2088-2093

Authors: POZA MMG VELEZ MH JIMENEZ J GOMEZALEIXANDRE C OLIAS JS MONTES AB ALBELLA JM
Citation: Mmg. Poza et al., CHARACTERIZATION OF BIAS ENHANCED MWCVD DIAMOND THIN-FILMS, Materials letters, 29(1-3), 1996, pp. 111-115

Authors: GOMEZALEIXANDRE C SANCHEZ O VAZQUEZ L GARCIA MM ALBELLA JM
Citation: C. Gomezaleixandre et al., INFLUENCE OF METHANE CONCENTRATION ON THE NUCLEATION AND GROWTH-STAGES IN DIAMOND FILM DEPOSITION, Physica status solidi. a, Applied research, 154(1), 1996, pp. 23-32

Authors: GOMEZALEIXANDRE C ESSAFTI A FERNANDEZ M FIERRO JLG ALBELLA JM
Citation: C. Gomezaleixandre et al., INFLUENCE OF DIBORANE FLOW RATE ON THE STRUCTURE AND STABILITY OF CVDBORON-NITRIDE FILMS, Journal of physical chemistry, 100(6), 1996, pp. 2148-2153

Authors: VASQUEZ L ALBELLA JM SALVAREZZA RC ARVIA AJ LEVY RA PERESE D
Citation: L. Vasquez et al., ROUGHENING KINETICS OF CHEMICAL-VAPOR-DEPOSITED COPPER-FILMS ON SI(100), Applied physics letters, 68(9), 1996, pp. 1285-1287

Authors: GOMEZALEIXANDRE C SANCHEZ O ALBELLA JM SANTISO J FIGUERAS A
Citation: C. Gomezaleixandre et al., CVD OF COVALENT COMPOUNDS AND HIGH-T-C SUPERCONDUCTORS, Advanced materials, 7(2), 1995, pp. 111-119

Authors: VAZQUEZ L MONTERO I ALBELLA JM
Citation: L. Vazquez et al., AFM STUDY OF THE DIELECTRIC-BREAKDOWN IN TA2O5 FILMS, Chemistry of materials, 7(9), 1995, pp. 1680-1685

Authors: ALBELLA JM GOMEZALEIXANDRE C SANCHEZGARRIDO O VAZQUEZ L MARTINEZDUART JM
Citation: Jm. Albella et al., DEPOSITION OF DIAMOND AND BORON-NITRIDE FILMS BY PLASMA CHEMICAL-VAPOR-DEPOSITION, Surface & coatings technology, 70(2-3), 1995, pp. 163-174

Authors: VAZQUEZ L SANCHEZ O ALBELLA JM
Citation: L. Vazquez et al., SCANNING-TUNNELING-MICROSCOPY MORPHOLOGICAL-STUDY OF THE 1ST STAGES OF GROWTH OF MICROWAVE CHEMICAL-VAPOR-DEPOSITED THIN DIAMOND FILMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 1-7

Authors: VAZQUEZ L ALBELLA JM SANCHEZ O GOMEZALEIXANDRE C MARTINEZDUART JM
Citation: L. Vazquez et al., NUCLEATION AND INITIAL-STAGES OF GROWTH OF DIAMOND FILMS ON SILICON, Scripta metallurgica et materialia, 31(8), 1994, pp. 1103-1108

Authors: SANCHEZ O GOMEZALEIXANDRE C AGULLO F ALBELLA JM
Citation: O. Sanchez et al., STUDY OF THE PLASMA DISCHARGES IN DIAMOND DEPOSITION WITH DIFFERENT O2 CONCENTRATIONS, DIAMOND AND RELATED MATERIALS, 3(9), 1994, pp. 1183-1187

Authors: VAZQUEZ L SANCHEZ O MESSEGUER F ALBELLA JM
Citation: L. Vazquez et al., STM NANOMETRIC STUDY OF THE INITIAL-STAGES OF DIAMOND FILM GROWTH - QUANTITATIVE MEASUREMENT OF )111( AND )100( SURFACE-ROUGHNESS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 715-719

Authors: MONTERO I GALAN L NAJMI O ALBELLA JM
Citation: I. Montero et al., DISORDER-INDUCED VIBRATION-MODE COUPLING IN SIO2-FILMS OBSERVED UNDERNORMAL-INCIDENCE INFRARED RADIATION, Physical review. B, Condensed matter, 50(7), 1994, pp. 4881-4884

Authors: PARKHUTIK VP MARTINEZDUART JM MORENO D ALBELLA JM GONZALEZVELASCO J MARCOS ML
Citation: Vp. Parkhutik et al., IN-DEPTH INHOMOGENEOUS PHOTOLUMINESCENT PROPERTIES OF POROUS SILICON LAYERS, Surface and interface analysis, 22(1-12), 1994, pp. 358-362
Risultati: 1-25 | 26-33