AAAAAA

   
Results: 1-24 |
Results: 24
Annealing study of InGaP/GaAs heterojunction bipolar transistor and carbon-doped p(+)GaAs base layers
Authors: Moriarty, GR Murtagh, M Cherkaoui, K Gouez, G Kelly, PV Crean, GM Bland, SW
Citation: Gr. Moriarty et al., Annealing study of InGaP/GaAs heterojunction bipolar transistor and carbon-doped p(+)GaAs base layers, MAT SCI E B, 80(1-3), 2001, pp. 284-288
Scanning Acoustic Microscopy and SIMS investigation of CdTe detectors
Authors: Barton, J Randles, T Hearne, S Barrett, J Kelly, PV Crean, GM Siffert, P Koebel, JM
Citation: J. Barton et al., Scanning Acoustic Microscopy and SIMS investigation of CdTe detectors, NUCL INST A, 458(1-2), 2001, pp. 431-436
Si/SiGe electron resonant tunneling diodes with graded spacer wells
Authors: Paul, DJ See, P Bates, R Griffin, N Coonan, BP Redmond, G Crean, GM Zozoulenko, IV Berggren, KF Hollander, B Mantl, S
Citation: Dj. Paul et al., Si/SiGe electron resonant tunneling diodes with graded spacer wells, APPL PHYS L, 78(26), 2001, pp. 4184-4186
Papers presented at the European Materials Research Society 1999 Spring Meeting. Symposium K: Materials, Technologies and Applications for Optical Interconnect - Preface
Authors: Crean, GM Amitai, Y Paineau, S Kelly, PV
Citation: Gm. Crean et al., Papers presented at the European Materials Research Society 1999 Spring Meeting. Symposium K: Materials, Technologies and Applications for Optical Interconnect - Preface, MAT SC S PR, 3(5-6), 2000, pp. 329-329
Low-stress hybridisation of emitters, detectors and driver circuitry on a silicon motherboard for optoelectronic interconnect architecture
Authors: Corbett, B Rodgers, K Stam, FA O'Connell, D Kelly, PV Crean, GM
Citation: B. Corbett et al., Low-stress hybridisation of emitters, detectors and driver circuitry on a silicon motherboard for optoelectronic interconnect architecture, MAT SC S PR, 3(5-6), 2000, pp. 449-453
Excimer laser fabrication of diffractive optical elements
Authors: Winfield, RJ Meister, M Crean, GM Paineau, S
Citation: Rj. Winfield et al., Excimer laser fabrication of diffractive optical elements, MAT SC S PR, 3(5-6), 2000, pp. 481-486
Fabrication of low-threshold red VCSELs
Authors: Calvert, TM Lambkin, JD Corbett, B Phillips, AF Crean, GM
Citation: Tm. Calvert et al., Fabrication of low-threshold red VCSELs, MAT SC S PR, 3(5-6), 2000, pp. 517-521
Ultraviolet assisted injection liquid source chemical vapour deposition (UVILS-CVD) of tantalum pentoxide
Authors: Kelly, PV Mooney, MB Beechinor, JT O'Sullivan, BJ Hurley, PK Crean, GM Zhang, JY Boyd, IW Paillous, M Jimenez, C Senateur, JP
Citation: Pv. Kelly et al., Ultraviolet assisted injection liquid source chemical vapour deposition (UVILS-CVD) of tantalum pentoxide, ADV MAT OPT, 10(3-5), 2000, pp. 115-122
Thin tantalum pentoxide films deposited by photo-induced chemical vapor deposition using an injection liquid source
Authors: Zhang, JY Boyd, IW Mooney, MB Hurley, PK Beechinor, JT O'Sullivan, BJ Kelly, PV Crean, GM Senateur, JP Jimenez, C Paillous, M
Citation: Jy. Zhang et al., Thin tantalum pentoxide films deposited by photo-induced chemical vapor deposition using an injection liquid source, APPL PHYS A, 70(6), 2000, pp. 647-649
Surface charge analysis characterisation of ultraviolet-induced damage in silicon nitride dielectrics
Authors: Korowicz, DH Kelly, PV Mongey, KF Crean, GM
Citation: Dh. Korowicz et al., Surface charge analysis characterisation of ultraviolet-induced damage in silicon nitride dielectrics, APPL SURF S, 168(1-4), 2000, pp. 304-306
Excimer-laser induced chemical etching of transition metals
Authors: O'Driscoll, C Winfield, R Khalfi, K Kelly, PV Crean, GM
Citation: C. O'Driscoll et al., Excimer-laser induced chemical etching of transition metals, APPL SURF S, 168(1-4), 2000, pp. 320-323
Si/Si1-xGex heterostructure field effect transistors fabricated using a low thermal budget CMOS process
Authors: Dunford, RB Paul, DJ Pepper, M Coonan, B Griffin, N Redmond, G Crean, GM Hollander, B Mantl, S
Citation: Rb. Dunford et al., Si/Si1-xGex heterostructure field effect transistors fabricated using a low thermal budget CMOS process, MICROEL ENG, 53(1-4), 2000, pp. 209-212
Room temperature electroless plating copper seed layer process for damascene interlevel metal structures
Authors: O'Kelly, JP Mongey, KF Gobil, Y Torres, J Kelly, PV Crean, GM
Citation: Jp. O'Kelly et al., Room temperature electroless plating copper seed layer process for damascene interlevel metal structures, MICROEL ENG, 50(1-4), 2000, pp. 473-479
Laser ultrasonic surface wave inspection of alumina ceramics of varying density
Authors: Kehoe, L Coyle, G Murray, S Flannery, CM Crean, GM
Citation: L. Kehoe et al., Laser ultrasonic surface wave inspection of alumina ceramics of varying density, ULTRASONICS, 38(1-8), 2000, pp. 508-512
InGaP/GaAs heterojunction bipolar transistor optical and electronic band structure characterization
Authors: Murtagh, M Beechinor, JT Cordero, N Kelly, PV Crean, GM Farrell, IL O'Connor, GM Bland, SW
Citation: M. Murtagh et al., InGaP/GaAs heterojunction bipolar transistor optical and electronic band structure characterization, THIN SOL FI, 364(1-2), 2000, pp. 58-63
Investigation of Si/SiGe heterostructure material using non-destructive optical techniques
Authors: Coonan, BP Griffin, N Beechinor, JT Murtagh, M Redmond, G Crean, GM Hollander, B Mantl, S Bozzo, S Lazzari, JL d'Avitaya, FA Derrien, J Paul, DJ
Citation: Bp. Coonan et al., Investigation of Si/SiGe heterostructure material using non-destructive optical techniques, THIN SOL FI, 364(1-2), 2000, pp. 75-79
Optical and structural properties of InGaP heterostructures
Authors: Moriarty, GR Kildemo, M Beechinor, JT Murtagh, M Kelly, PV Crean, GM Bland, SW
Citation: Gr. Moriarty et al., Optical and structural properties of InGaP heterostructures, THIN SOL FI, 364(1-2), 2000, pp. 244-248
Characterization of acoustic Lamb wave propagation in polycrystalline diamond films by laser ultrasonics
Authors: Whitfield, MD Audic, B Flannery, CM Kehoe, LP Crean, GM Jackman, RB
Citation: Md. Whitfield et al., Characterization of acoustic Lamb wave propagation in polycrystalline diamond films by laser ultrasonics, J APPL PHYS, 88(5), 2000, pp. 2984-2993
Acoustic wave propagation in free standing CVD diamond: Influence of film quality and temperature
Authors: Whitfield, MD Audic, B Flannery, CM Kehoe, LP Crean, GM Jackman, RB
Citation: Md. Whitfield et al., Acoustic wave propagation in free standing CVD diamond: Influence of film quality and temperature, DIAM RELAT, 8(2-5), 1999, pp. 732-737
InGaP/GaAs based heterojunction bipolar transistor characterisation using non-contact optical spectroscopy
Authors: Murtagh, M Beechinor, JT Cordero, N Kelly, PV Crean, GM Bland, SW
Citation: M. Murtagh et al., InGaP/GaAs based heterojunction bipolar transistor characterisation using non-contact optical spectroscopy, MAT SCI E B, 66(1-3), 1999, pp. 185-188
Effects of plasma on excimer lamp based selective activation processes forelectroless plating
Authors: Macauley, DJ Kelly, PV Mongey, KF Crean, GM
Citation: Dj. Macauley et al., Effects of plasma on excimer lamp based selective activation processes forelectroless plating, APPL SURF S, 139, 1999, pp. 62-67
Atmospheric pressure excimer lamp-assisted photoselective activation process for electroless plating
Authors: Macauley, DJ Kelly, PV Mongey, KF Crean, GM
Citation: Dj. Macauley et al., Atmospheric pressure excimer lamp-assisted photoselective activation process for electroless plating, APPL SURF S, 139, 1999, pp. 622-626
Characteristics of tantalum pentoxide dielectric films deposited on silicon by excimer-lamp assisted photo-induced CVD using an injection liquid source.
Authors: Mooney, MB Hurley, PK O'Sullivan, BJ Beechinor, JT Zhang, JY Boyd, IW Kelly, PV Senateur, JP Crean, GM Jimenez, C Paillous, M
Citation: Mb. Mooney et al., Characteristics of tantalum pentoxide dielectric films deposited on silicon by excimer-lamp assisted photo-induced CVD using an injection liquid source., MICROEL ENG, 48(1-4), 1999, pp. 283-286
Silicon quantum integrated circuits - an attempt to fabricate silicon-based quantum devices using CMOS fabrication techniques
Authors: Paul, DJ Coonan, B Redmond, G O'Neill, BJ Crean, GM Hollander, B Mantl, S Zozoulenko, I Berggren, KF Lazzari, JL d'Avitaya, FA Derrien, J
Citation: Dj. Paul et al., Silicon quantum integrated circuits - an attempt to fabricate silicon-based quantum devices using CMOS fabrication techniques, THIN SOL FI, 336(1-2), 1998, pp. 130-136
Risultati: 1-24 |