AAAAAA

   
Results: 1-19 |
Results: 19
EFFECT OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF RUO2 FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING
Authors: MENG LJ FORTUNATO E NUNOS R DOSSANTOS MP
Citation: Lj. Meng et al., EFFECT OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF RUO2 FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING, Journal of the Korean Physical Society, 32, 1998, pp. 1835-1838
ARTIFICIAL ANIMALS IN VIRTUAL ECOSYSTEMS
Authors: HELENO P DOSSANTOS MP
Citation: P. Heleno et Mp. Dossantos, ARTIFICIAL ANIMALS IN VIRTUAL ECOSYSTEMS, Computer networks and ISDN systems, 30(20-21), 1998, pp. 1923-1932
PROPERTIES OF INDIUM TIN OXIDE-FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING AT DIFFERENT SUBSTRATE-TEMPERATURE
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, PROPERTIES OF INDIUM TIN OXIDE-FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING AT DIFFERENT SUBSTRATE-TEMPERATURE, Thin solid films, 322(1-2), 1998, pp. 56-62
GROWTH AND CHARACTERIZATION OF CADMIUM-SULFIDE NANOCRYSTALS EMBEDDED IN SILICON DIOXIDE FILMS
Authors: ROLO AG VIEIRA LG GOMES MJM RIBEIRO JL BELSLEY MS DOSSANTOS MP
Citation: Ag. Rolo et al., GROWTH AND CHARACTERIZATION OF CADMIUM-SULFIDE NANOCRYSTALS EMBEDDED IN SILICON DIOXIDE FILMS, Thin solid films, 312(1-2), 1998, pp. 348-353
BRAZILIAN CONCEPTS OF SPECIAL-EDUCATION
Authors: DOSSANTOS MP
Citation: Mp. Dossantos, BRAZILIAN CONCEPTS OF SPECIAL-EDUCATION, Disability & society, 12(3), 1997, pp. 407-415
CHARACTERIZATION OF TITANIUM NITRIDE FILMS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING AT DIFFERENT NITROGEN PRESSURES
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, CHARACTERIZATION OF TITANIUM NITRIDE FILMS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING AT DIFFERENT NITROGEN PRESSURES, Surface & coatings technology, 90(1-2), 1997, pp. 64-70
STUDY OF THE EFFECT OF THE OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF RF REACTIVE MAGNETRON-SPUTTERED TIN-DOPED INDIUM OXIDE-FILMS
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, STUDY OF THE EFFECT OF THE OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF RF REACTIVE MAGNETRON-SPUTTERED TIN-DOPED INDIUM OXIDE-FILMS, Applied surface science, 120(3-4), 1997, pp. 243-249
PROPERTIES OF INDIUM TIN OXIDE (ITO) FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING AT DIFFERENT PRESSURES
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, PROPERTIES OF INDIUM TIN OXIDE (ITO) FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING AT DIFFERENT PRESSURES, Thin solid films, 303(1-2), 1997, pp. 151-155
STRUCTURE EFFECT ON ELECTRICAL-PROPERTIES OF ITO FILMS PREPARED BY RFREACTIVE MAGNETRON SPUTTERING
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, STRUCTURE EFFECT ON ELECTRICAL-PROPERTIES OF ITO FILMS PREPARED BY RFREACTIVE MAGNETRON SPUTTERING, Thin solid films, 289(1-2), 1996, pp. 65-69
CHARACTERIZATION OF ZNO FILMS PREPARED BY DE REACTIVE MAGNETRON SPUTTERING AT DIFFERENT OXYGEN PARTIAL PRESSURES
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, CHARACTERIZATION OF ZNO FILMS PREPARED BY DE REACTIVE MAGNETRON SPUTTERING AT DIFFERENT OXYGEN PARTIAL PRESSURES, Vacuum, 46(8-10), 1995, pp. 1001-1004
DEPOSITION AND PROPERTIES OF TITANIUM NITRIDE FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING
Authors: MENG LJ AZEVEDO A DOSSANTOS MP
Citation: Lj. Meng et al., DEPOSITION AND PROPERTIES OF TITANIUM NITRIDE FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING, Vacuum, 46(3), 1995, pp. 233-239
STUDY OF THE STRUCTURAL-PROPERTIES OF ZNO THIN-FILMS BY X-RAY PHOTOELECTRON-SPECTROSCOPY
Authors: MENG LJ DESA CPM DOSSANTOS MP
Citation: Lj. Meng et al., STUDY OF THE STRUCTURAL-PROPERTIES OF ZNO THIN-FILMS BY X-RAY PHOTOELECTRON-SPECTROSCOPY, Applied surface science, 78(1), 1994, pp. 57-61
THE INFLUENCE OF OXYGEN PARTIAL-PRESSURE AND TOTAL PRESSURE (O2-FILMSPREPARED BY DC SPUTTERING(AR) ON THE PROPERTIES OF TIN OXIDE)
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, THE INFLUENCE OF OXYGEN PARTIAL-PRESSURE AND TOTAL PRESSURE (O2-FILMSPREPARED BY DC SPUTTERING(AR) ON THE PROPERTIES OF TIN OXIDE), Vacuum, 45(12), 1994, pp. 1191-1195
ZINC-OXIDE FILMS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING AT DIFFERENT SUBSTRATE TEMPERATURES
Authors: MENG LJ ANDRITSCHKY M DOSSANTOS MP
Citation: Lj. Meng et al., ZINC-OXIDE FILMS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING AT DIFFERENT SUBSTRATE TEMPERATURES, Vacuum, 45(1), 1994, pp. 19-22
DIRECT-CURRENT REACTIVE MAGNETRON-SPUTTERED ZINC-OXIDE THIN-FILMS - THE EFFECT OF THE SPUTTERING PRESSURE
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, DIRECT-CURRENT REACTIVE MAGNETRON-SPUTTERED ZINC-OXIDE THIN-FILMS - THE EFFECT OF THE SPUTTERING PRESSURE, Thin solid films, 250(1-2), 1994, pp. 26-32
STUDY OF POROSITY OF TITANIUM-OXIDE FILMS BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND IR TRANSMITTANCE
Authors: MENG LJ DESA CPM DOSSANTOS MP
Citation: Lj. Meng et al., STUDY OF POROSITY OF TITANIUM-OXIDE FILMS BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND IR TRANSMITTANCE, Thin solid films, 239(1), 1994, pp. 117-122
THE EFFECT OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF SPUTTERED TIN OXIDE-FILMS
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, THE EFFECT OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF SPUTTERED TIN OXIDE-FILMS, Thin solid films, 237(1-2), 1994, pp. 112-117
INTERFEROMETRIC DETECTION OF CROSS-PHASE MODULATION IN CDS
Authors: HIRLIMANN C WASSMUTH E KLING E PETIT S DOSSANTOS MP
Citation: C. Hirlimann et al., INTERFEROMETRIC DETECTION OF CROSS-PHASE MODULATION IN CDS, Applied physics letters, 65(8), 1994, pp. 959-961
THE INFLUENCE OF OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC REACTIVE MAGNETRON-SPUTTERED TITANIUM-OXIDE FILMS
Authors: MENG LJ DOSSANTOS MP
Citation: Lj. Meng et Mp. Dossantos, THE INFLUENCE OF OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC REACTIVE MAGNETRON-SPUTTERED TITANIUM-OXIDE FILMS, Applied surface science, 68(3), 1993, pp. 319-325
Risultati: 1-19 |